Patents by Inventor Dae-won Chung

Dae-won Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antistatic monomer cast nylon
    Patent number: 6265529
    Abstract: Disclosed is an antistatic monomer-cast nylon (MC nylon) polymer. The MC nylon polymer includes graphite particles nonuniformly distributed in an MC nylon polymer structure. The graphite particles are partially agglomerated and form a micro-domain phase. The antistatic MC nylon has volume specific resistance of about 105 &OHgr;·cm to about 109&OHgr;·cm. Also disclosed is a method of producing antistatic MC nylon. A mixture comprising a monomer of the nylon and graphite is prepared and cast in a mold. The mixture is stirred to disperse the graphite and the monomer polymerizes to form an antistatic MC polymer.
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: July 24, 2001
    Assignee: Polypenco Korea Company Limited
    Inventors: Dae-won Chung, Chang-Hoon Kim
  • Convenient process for the preparation of chiral or racemic phenylalaninols and their N-blocked derivatives
    Patent number: 5367094
    Abstract: This invention pertains to an improved process for preparing chiral or racemic phenylalaninol (PAO) by hydrogenation of L(+)- or racemic 2-amino-1-phenyl-1,3-propanediol (APPD) in the presence of a strong volatile acid. Furthermore, a more valuable form of PAO such like N-blocked PAO was found to be directly produceable from the hydrogenation mixture without isolation of PAO, when a volatile acid was used as the medium of the hydrogenation reaction.
    Type: Grant
    Filed: June 4, 1993
    Date of Patent: November 22, 1994
    Assignee: Yukong, Ltd.
    Inventor: Dae-won Chung