Patents by Inventor Dae Chul JUNG

Dae Chul JUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Distillation method
    Patent number: 10556191
    Abstract: By using the distillation device of the present application, energy loss occurring in a purification process of a solution including a waste stripper and a stripped photoresist resin used in a stripping process of a photoresist can be minimized and the installation cost of the distillation device can be reduced compared to the case in which dual distillation columns are used, thereby increasing the economic feasibility of a process.
    Type: Grant
    Filed: April 1, 2016
    Date of Patent: February 11, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Si Nae Lee, Sung Kyu Lee, Sang Beom Lee, Sung Ho Lee, Jeong Seok Kim, Joon Ho Shin, Dae Chul Jung, Yong Hee Jang, Tae Moon Park, Hyun Jik Yi
  • DISTILLATION DEVICE
    Publication number: 20180178141
    Abstract: By using the distillation device of the present application, energy loss occurring in a purification process of a solution including a waste stripper and a stripped photoresist resin used in a stripping process of a photoresist can be minimized and the installation cost of the distillation device can be reduced compared to the case in which dual distillation columns are used, thereby increasing the economic feasibility of a process.
    Type: Application
    Filed: April 1, 2016
    Publication date: June 28, 2018
    Inventors: Si Nae LEE, Sung Kyu LEE, Sang Beom LEE, Sung Ho LEE, Jeong Seok KIM, Joon Ho SHIN, Dae Chul JUNG, Yong Hee JANG, Tae Moon PARK, Hyun Jik YI
  • Stripper composition for removing photoresists and method for stripping photoresists using the same
    Patent number: 9983481
    Abstract: The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same.
    Type: Grant
    Filed: August 18, 2015
    Date of Patent: May 29, 2018
    Assignee: LG CHEM, LTD.
    Inventors: Tae Moon Park, Dae Chul Jung, Dong Hoon Lee, Woo Ram Lee, Hyun Jun Lee, Ju Young Kim
  • STRIPPER COMPOSITION FOR REMOVING PHOTORESISTS AND METHOD FOR STRIPPING PHOTORESISTS USING THE SAME
    Publication number: 20170115573
    Abstract: The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same.
    Type: Application
    Filed: August 18, 2015
    Publication date: April 27, 2017
    Applicant: LG CHEM, LTD.
    Inventors: Tae Moon PARK, Dae Chul JUNG, Dong Hoon LEE, Woo Ram LEE, Hyun Jun LEE, Ju Young KIM