Patents by Inventor Dae-Chul Park

Dae-Chul Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7755263
    Abstract: An external light-shielding layer capable of enhancing a visible light transmittance and a contrast ratio and preventing Moire fringe and Newton ring phenomena, a display filter including the external light-shielding layer, and a display device including the display filter. The external light-shielding layer includes a transparent resin matrix, and a plurality of light-shielding patterns formed on the transparent resin matrix and spaced apart from each other in a predetermined interval, wherein a bias angle (?) formed between a traveling direction of the light-shielding patterns and the longer side of the matrix is in a range of about 5 to 80 degrees.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: July 13, 2010
    Assignee: Samsung Corning Precision Glass Co., Ltd.
    Inventors: Dae-chul Park, Jae-young Choi, Tae-soon Park, Sang-cheol Jung, Jin-Woo Yeo, Jin Seo
  • Patent number: 7679275
    Abstract: A display filter capable of enhancing the visible light transmittance and contrast ratio for a bright room condition and a display device including the same. The display filter includes a filter base, and an external light-shielding layer, disposed on a surface of the filter base, including a matrix made of a transparent resin and a plurality of wedge-shaped black stripes arranged parallel to each other at a surface of the matrix.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: March 16, 2010
    Assignee: Samsung Corning Co., Ltd.
    Inventors: Dae-chul Park, Jae-young Choi, Tae-soon Park, Sang-cheol Jung
  • Patent number: 7612489
    Abstract: A display filter for use with a plurality of microlenses in a display system includes an external light and electromagnetic (EM)-shielding portion having a photosensitive transparent resin layer with a photocatalyst, and an external light and EM-shielding pattern formed on regions of the photosensitive transparent resin layer to prevent external light from entering the display system and to prevent EM waves generated in the display device from exiting the display device, the regions corresponding to boundaries between the plurality of microlenses.
    Type: Grant
    Filed: May 16, 2005
    Date of Patent: November 3, 2009
    Assignee: Samsung Corning Precision Glass Co., Ltd.
    Inventors: Dae-chul Park, Yong-won Choi, Sang-cheol Jung, Wang-kyu Choi
  • Publication number: 20090058250
    Abstract: A filter for a display apparatus is placed in front of a display panel, wherein CIE chromaticity coordinates of the filter under a standard of a D65 light source have values of ?2.0?a*?2.0 and ?2.0?b*?2.0. The CIE chromaticity coordinates of the filter under the standard of the D65 light source have a value of 60?L*?80. The colorants include a first colorant absorbing 380 nm to 480 nm wavelength light, a second colorant absorbing 450 nm to 550 nm wavelength light, and a third colorant absorbing 560 nm to 620 nm wavelength light. The first to third colorants can be contained in at least one of a color compensating layer, a low-refraction layer having a refractive index of 1.5 or less, an external light shielding layer, a hard coating layer and an adhesive layer.
    Type: Application
    Filed: August 28, 2008
    Publication date: March 5, 2009
    Applicant: Samsung Corning Precision Glass Co., Ltd.
    Inventors: Dong-Keun Sin, Ji-Yoon Seo, Sung-Nim Jo, Ji-Young Kim, Mi-Young Lim, Kyeong-Keun Woo, Dae-Chul Park, Sang-Yoon Oh, Kun-Yong Jang, Hwa-Yeon Lee, Moon-Jin Choi, Shin-Wook Kim, Seok-Won Kim, Dong-Hwal Lee
  • Patent number: 7456557
    Abstract: An external light-shielding layer capable of enhancing a visible light transmittance and a contrast ratio and preventing Moiré fringe and Newton ring phenomena, a display filter including the external light-shielding layer, and a display device including the display filter. The external light-shielding layer includes a transparent resin matrix, and a plurality of light-shielding patterns formed on the transparent resin matrix and spaced apart from each other in a predetermined interval, wherein a bias angle (?) formed between a traveling direction of the light-shielding patterns and the longer side of the matrix is in a range of about 5 to 80 degrees.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: November 25, 2008
    Assignee: Samsung Corning Precision Glass Co., Ltd.
    Inventors: Dae-Chul Park, Jae-Young Choi, Tae-Soon Park, Sang-Cheol Jung, Jin-Woo Yeo, Jin Seo
  • Publication number: 20060250064
    Abstract: An external light-shielding layer capable of enhancing a visible light transmittance and a contrast ratio and preventing Moire fringe and Newton ring phenomena, a display filter including the external light-shielding layer, and a display device including the display filter. The external light-shielding layer includes a transparent resin matrix, and a plurality of light-shielding patterns formed on the transparent resin matrix and spaced apart from each other in a predetermined interval, wherein a bias angle (?) formed between a traveling direction of the light-shielding patterns and the longer side of the matrix is in a range of about 5 to 80 degrees.
    Type: Application
    Filed: December 28, 2005
    Publication date: November 9, 2006
    Applicant: Samsung Corning Co., Ltd.
    Inventors: Dae-chul Park, Jae-young Choi, Tae-soon Park, Sang-cheol Jung, Jin-woo Yeo, Jin Seo
  • Publication number: 20060145578
    Abstract: A display filter capable of enhancing the visible light transmittance and contrast ratio for a bright room condition and a display device including the same. The display filter includes a filter base, and an external light-shielding layer, disposed on a surface of the filter base, including a matrix made of a transparent resin and a plurality of wedge-shaped black stripes arranged parallel to each other at a surface of the matrix.
    Type: Application
    Filed: December 28, 2005
    Publication date: July 6, 2006
    Applicant: Samsung Corning Co., Ltd.
    Inventors: Dae-chul Park, Jae-young Choi, Tae-soon Park, Sang-cheol Jung
  • Publication number: 20050253493
    Abstract: A display filter for use with a plurality of microlenses in a display system includes an external light and electromagnetic (EM)-shielding portion having a photosensitive transparent resin layer with a photocatalyst, and an external light and EM-shielding pattern formed on regions of the photosensitive transparent resin layer to prevent external light from entering the display system and to prevent EM waves generated in the display device from exiting the display device, the regions corresponding to boundaries between the plurality of microlenses.
    Type: Application
    Filed: May 16, 2005
    Publication date: November 17, 2005
    Inventors: Dae-chul Park, Yong-won Choi, Sang-cheol Jung, Wang-kyu Choi
  • Patent number: 6517806
    Abstract: Present invention relates to a CdZnMS photocatalyst for producing hydrogen from water and a method for preparing thereof and a method for producing hydrogen by using said photocatalyst. Said photocatalyst is characterized by the following general formula VII: m(a)/CdxZnyMzS  (VII) wherein ‘m’ represents at least one doped metal element as an electron acceptor selected from the group consisting of Ni, Pt, Ru and the oxidized compound of these metals; ‘a’ represents a % by weight of m, ranging from 0.10 to 5.00; ‘M’ is a catalyst element selected from the group consisting of Mo, V, Al, Cs, Mn, Fe, Pd, Pt, P, Cu, Ag, Ir, Sb, Pb, Ga and Re. ‘z’ represents an atom % of M/(Cd+Zn+M), ranging from 0.05 to 20.00 and ‘x’ and ‘y’ represent an atom % of Cd/(Cd+Zn+M) and an atom % of Zn/(Cd+Zn+M), ranging from 10.00 to 90.00, respectively.
    Type: Grant
    Filed: December 14, 2000
    Date of Patent: February 11, 2003
    Assignees: Korea Research Institute of Chemical Technology, Chonggu Co., Ltd.
    Inventors: Dae-Chul Park, Jin-Ook Baeg
  • Patent number: 6447650
    Abstract: A method for preparing a CdS photocatalyst represented by general formula (I): m(a)/Cd[M(b)]S, comprising the steps of: dissolving Cd-containing and M-containing compounds in water in such an amount that the mol % of M ranges from 0.001 to. 20.00; adding one H2S or Na2S as a reactant in the solution with stirring to precipitate Cd[M]S; washing the precipitate with water and vacuum-drying the precipitate in a nitrogen environment at a temperature of 105˜150° C. for 1.5˜3.0 hours; doping a liquid m-containing compound to this precipitate in such an amount that the % by weight of m ranges from 0.10 to 5.00. In the formula, m represents a doped metal element as an electron acceptor selected from the group of Ni, Pd, Pt, Fe, Ru, Co or an oxidized compound of these metals; a represents a percentage by weight of m, ranging from 0.10 to 5.00; M is a promoter selected from the group consisting of V, Cr, Al, P, As, Sb and Pb; b represents mol % of M/(M+Cd), ranging from 0.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: September 10, 2002
    Assignees: Korea Research Institute of Chemical Technology, Chonggu Co., Ltd.
    Inventors: Dae-Chul Park, Jin-Wook Baeg
  • Publication number: 20020045538
    Abstract: Present invention relates to a CdZnMS photocatalyst for producing hydrogen from water and a method for preparing thereof and a method for producing hydrogen by using said photocatalyst.
    Type: Application
    Filed: December 14, 2000
    Publication date: April 18, 2002
    Inventors: Dae-Chul Park, Jin-ook Baeg
  • Patent number: 6300274
    Abstract: The present invention relates to a novel CdS photocatalyst for producing hydrogen from water by photoreaction and preparation therefor, and method for producing hydrogen by using of the CdS photocatalyst. The CdS photocatalyst is characterized by the following general formula V: m(A)/Cd[M(B)]S  V wherein m represents a doped metal element as an electron acceptor, such as Pt, Ru, Ir, Co, Rh, Cu, Pd, Ni, or the oxidized compound of one of these metals; A represents a percentage by weight of m, ranging from 0.10 to 2.50; M is catalyst element, e.g. V, Cr, Al and P; and B represents a mole % of M(M+Cd), ranging from 0.05 to 20.00.
    Type: Grant
    Filed: February 23, 2000
    Date of Patent: October 9, 2001
    Assignees: Korea Research Institute of Chemical Technology, Chunggu Co., Ltd.
    Inventors: Dae-Chul Park, Jin-Ook Baeg
  • Patent number: 6297190
    Abstract: The present invention relates to a novel photocatalyst, to preparing the photocatalyst and to a method for producing hydrogen in the presence of the photocatalyst. The novel photocatalyst of this present invention is characterized by the following formula IV: Pt(x)/Zn[M(y)]S  IV wherein “x” represents a percentage by weight of Pt in the photocatalyst ranging from 0.05 to 2.50; “M” is a promoter selected from the group consisting of V, Cr, Mo, Mn, Re, Ru, Os, Rh, Ir, Cu, Al and Ga; and “y” represents a mole % of M/(M+Zn) ranging from 0.01 to 20.00. The method for preparing the photocatalyst comprises the steps of dissolving Zn-containing and M-containing compounds in water in such a way that M/(M+Zn) ranges, in mole %, from 0.01 to 20.
    Type: Grant
    Filed: February 23, 2000
    Date of Patent: October 2, 2001
    Assignees: Korea Research Institute of Chemical Technology, Chunggu Co., Ltd.
    Inventors: Dae-Chul Park, Jin-Ook Baeg