Patents by Inventor Dae-Guen Choi
Dae-Guen Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12329819Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.Type: GrantFiled: May 18, 2021Date of Patent: June 17, 2025Assignee: Korea Institute of Machinery & MaterialsInventors: Jun-ho Jeong, Yun Woo Lee, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung
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Patent number: 12327661Abstract: A transparent conductor according to an exemplary embodiment of the present invention includes a transparent substrate, and a transparent conductive pattern formed on the transparent substrate, and the transparent conductor includes a nanostructure on an upper surface of at least one of the transparent substrate and the transparent conductive pattern.Type: GrantFiled: March 17, 2021Date of Patent: June 10, 2025Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Dae-Guen Choi, Hyuk Jun Kang, Ji Hye Lee, Junhyuk Choi, Won Seok Chang, Joo Yun Jung, Jun-ho Jeong
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Publication number: 20240145118Abstract: A transparent conductor according to an exemplary embodiment of the present invention includes a transparent substrate, and a transparent conductive pattern formed on the transparent substrate, and the transparent conductor includes a nanostructure on an upper surface of at least one of the transparent substrate and the transparent conductive pattern.Type: ApplicationFiled: March 17, 2021Publication date: May 2, 2024Inventors: Dae-Guen CHOI, Hyuk Jun KANG, Ji Hye LEE, Junhyuk CHOI, Won Seok CHANG, Joo Yun JUNG, Jun-ho JEONG
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Publication number: 20210268111Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.Type: ApplicationFiled: May 18, 2021Publication date: September 2, 2021Applicant: ADMBIOSCIENCE INC.Inventors: Jun-ho JEONG, Yun Woo LEE, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG
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Patent number: 11040103Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.Type: GrantFiled: April 14, 2017Date of Patent: June 22, 2021Assignee: ADMBIOSCIENCE INC.Inventors: Jun-ho Jeong, Yun Woo Lee, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung
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Patent number: 10730233Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.Type: GrantFiled: April 14, 2017Date of Patent: August 4, 2020Assignee: ADMBIOSCIENCE INC.Inventors: Jun-ho Jeong, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung, Eung-Sug Lee
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Publication number: 20190125876Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.Type: ApplicationFiled: April 14, 2017Publication date: May 2, 2019Applicant: ADMBIOSCIENCE INC.Inventors: Jun-ho JEONG, Yun Woo LEE, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG
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Publication number: 20190070775Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.Type: ApplicationFiled: April 14, 2017Publication date: March 7, 2019Applicant: ADMBIOSCIENCE INC.Inventors: Jun-ho JEONG, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG, Eung-Sug LEE
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Patent number: 9791601Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.Type: GrantFiled: February 28, 2014Date of Patent: October 17, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Hyuk Choi, Eung-Sug Lee, Ji-Hye Lee, Jun-ho Jeong, Joo-Yun Jung, Dae-Guen Choi, Cheol-Hyeon Kim
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Patent number: 9638851Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.Type: GrantFiled: December 4, 2015Date of Patent: May 2, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Ho Jeong, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
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Patent number: 9598617Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl (meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl (meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.Type: GrantFiled: December 1, 2015Date of Patent: March 21, 2017Assignees: Samsung Display Co., Ltd., NITTA CORPORATIONInventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta Irie, Satoshi Yamaguchi
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Publication number: 20170075051Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.Type: ApplicationFiled: December 4, 2015Publication date: March 16, 2017Inventors: Jun-Ho JEONG, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
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Patent number: 9581746Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.Type: GrantFiled: December 4, 2015Date of Patent: February 28, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Ho Jeong, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
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Publication number: 20160145474Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl (meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl (meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.Type: ApplicationFiled: December 1, 2015Publication date: May 26, 2016Inventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta lrie, Satoshi Yamaguchi
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Patent number: 9221231Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl (meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl (meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.Type: GrantFiled: September 6, 2012Date of Patent: December 29, 2015Assignees: Samsung Display Co., Ltd., NITTA CORPORATIONInventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta Irie, Satoshi Yamaguchi
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Publication number: 20140311662Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.Type: ApplicationFiled: February 28, 2014Publication date: October 23, 2014Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Hyuk CHOI, Eung-Sug LEE, Ji-Hye LEE, Jun-ho JEONG, Joo-Yun JUNG, Dae-Guen CHOI, Cheol-Hyeon KIM
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Patent number: 8551353Abstract: Provided are a shape of a hierarchical structure, an engineering effect of the hierarchical structure according to the shape, an increasing method of the engineering effect, an application method of the hierarchical structure for novel material or parts, and a mass-manufacturing method of the hierarchical structure. The present invention relates to a hierarchical structure and a manufacturing method thereof, and includes a hierarchical structure in which at least one nano-object that has a characteristic length of a nanoscale region in an internal matrix is arranged in a predetermined pattern. According to the exemplary embodiments of the present invention, an excellent characteristic that is generated in a nanoscale region may be used in a structure of a macroscopic scale region, and structures that have different scales may be simply interconnected or interfaced regardless of the different scales.Type: GrantFiled: August 24, 2009Date of Patent: October 8, 2013Assignee: Korea Institute of Machinery & MaterialsInventors: Jae-Hyun Kim, Hak-Joo Lee, Seung-Min Hyun, Hyun-Ju Choi, Byung-Ik Choi, Ki-Don Kim, Dae-Guen Choi
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Publication number: 20130126079Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl(meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl(meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.Type: ApplicationFiled: September 6, 2012Publication date: May 23, 2013Applicants: NITTA CORPORATION, SAMSUNG DISPLAY CO, LTD.Inventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta Irie, Satoshi Yamaguchi
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Publication number: 20110081521Abstract: Provided are a shape of a hierarchical structure, an engineering effect of the hierarchical structure according to the shape, an increasing method of the engineering effect, an application method of the hierarchical structure for novel material or parts, and a mass-manufacturing method of the hierarchical structure. The present invention relates to a hierarchical structure and a manufacturing method thereof, and includes a hierarchical structure in which at least one nano-object that has a characteristic length of a nanoscale region in an internal matrix is arranged in a predetermined pattern. According to the exemplary embodiments of the present invention, an excellent characteristic that is generated in a nanoscale region may be used in a structure of a macroscopic scale region, and structures that have different scales may be simply interconnected or interfaced regardless of the different scales.Type: ApplicationFiled: August 24, 2009Publication date: April 7, 2011Inventors: Jae-Hyun Kim, Hak-Joo Lee, Seung-Min Hyun, Hyun-Ju Choi, Byung-Ik Choi, Ki-Don Kim, Dae-Guen Choi