Patents by Inventor Dae-Guen Choi

Dae-Guen Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12329819
    Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.
    Type: Grant
    Filed: May 18, 2021
    Date of Patent: June 17, 2025
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Jun-ho Jeong, Yun Woo Lee, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung
  • Patent number: 12327661
    Abstract: A transparent conductor according to an exemplary embodiment of the present invention includes a transparent substrate, and a transparent conductive pattern formed on the transparent substrate, and the transparent conductor includes a nanostructure on an upper surface of at least one of the transparent substrate and the transparent conductive pattern.
    Type: Grant
    Filed: March 17, 2021
    Date of Patent: June 10, 2025
    Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Dae-Guen Choi, Hyuk Jun Kang, Ji Hye Lee, Junhyuk Choi, Won Seok Chang, Joo Yun Jung, Jun-ho Jeong
  • Publication number: 20240145118
    Abstract: A transparent conductor according to an exemplary embodiment of the present invention includes a transparent substrate, and a transparent conductive pattern formed on the transparent substrate, and the transparent conductor includes a nanostructure on an upper surface of at least one of the transparent substrate and the transparent conductive pattern.
    Type: Application
    Filed: March 17, 2021
    Publication date: May 2, 2024
    Inventors: Dae-Guen CHOI, Hyuk Jun KANG, Ji Hye LEE, Junhyuk CHOI, Won Seok CHANG, Joo Yun JUNG, Jun-ho JEONG
  • Publication number: 20210268111
    Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.
    Type: Application
    Filed: May 18, 2021
    Publication date: September 2, 2021
    Applicant: ADMBIOSCIENCE INC.
    Inventors: Jun-ho JEONG, Yun Woo LEE, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG
  • Patent number: 11040103
    Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: June 22, 2021
    Assignee: ADMBIOSCIENCE INC.
    Inventors: Jun-ho Jeong, Yun Woo Lee, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung
  • Patent number: 10730233
    Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: August 4, 2020
    Assignee: ADMBIOSCIENCE INC.
    Inventors: Jun-ho Jeong, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung, Eung-Sug Lee
  • Publication number: 20190125876
    Abstract: A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.
    Type: Application
    Filed: April 14, 2017
    Publication date: May 2, 2019
    Applicant: ADMBIOSCIENCE INC.
    Inventors: Jun-ho JEONG, Yun Woo LEE, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG
  • Publication number: 20190070775
    Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.
    Type: Application
    Filed: April 14, 2017
    Publication date: March 7, 2019
    Applicant: ADMBIOSCIENCE INC.
    Inventors: Jun-ho JEONG, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG, Eung-Sug LEE
  • Patent number: 9791601
    Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: October 17, 2017
    Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Jun-Hyuk Choi, Eung-Sug Lee, Ji-Hye Lee, Jun-ho Jeong, Joo-Yun Jung, Dae-Guen Choi, Cheol-Hyeon Kim
  • Patent number: 9638851
    Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: May 2, 2017
    Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Jun-Ho Jeong, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
  • Patent number: 9598617
    Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl (meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl (meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: March 21, 2017
    Assignees: Samsung Display Co., Ltd., NITTA CORPORATION
    Inventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta Irie, Satoshi Yamaguchi
  • Publication number: 20170075051
    Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.
    Type: Application
    Filed: December 4, 2015
    Publication date: March 16, 2017
    Inventors: Jun-Ho JEONG, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
  • Patent number: 9581746
    Abstract: A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: February 28, 2017
    Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Jun-Ho Jeong, Junhyuk Choi, Dae-Guen Choi, So Hee Jeon, Ji Hye Lee, Joo Yun Jung, Soon-Hyoung Hwang, Sang Keun Sung
  • Publication number: 20160145474
    Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl (meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl (meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.
    Type: Application
    Filed: December 1, 2015
    Publication date: May 26, 2016
    Inventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta lrie, Satoshi Yamaguchi
  • Patent number: 9221231
    Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl (meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl (meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.
    Type: Grant
    Filed: September 6, 2012
    Date of Patent: December 29, 2015
    Assignees: Samsung Display Co., Ltd., NITTA CORPORATION
    Inventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta Irie, Satoshi Yamaguchi
  • Publication number: 20140311662
    Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.
    Type: Application
    Filed: February 28, 2014
    Publication date: October 23, 2014
    Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Jun-Hyuk CHOI, Eung-Sug LEE, Ji-Hye LEE, Jun-ho JEONG, Joo-Yun JUNG, Dae-Guen CHOI, Cheol-Hyeon KIM
  • Patent number: 8551353
    Abstract: Provided are a shape of a hierarchical structure, an engineering effect of the hierarchical structure according to the shape, an increasing method of the engineering effect, an application method of the hierarchical structure for novel material or parts, and a mass-manufacturing method of the hierarchical structure. The present invention relates to a hierarchical structure and a manufacturing method thereof, and includes a hierarchical structure in which at least one nano-object that has a characteristic length of a nanoscale region in an internal matrix is arranged in a predetermined pattern. According to the exemplary embodiments of the present invention, an excellent characteristic that is generated in a nanoscale region may be used in a structure of a macroscopic scale region, and structures that have different scales may be simply interconnected or interfaced regardless of the different scales.
    Type: Grant
    Filed: August 24, 2009
    Date of Patent: October 8, 2013
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Jae-Hyun Kim, Hak-Joo Lee, Seung-Min Hyun, Hyun-Ju Choi, Byung-Ik Choi, Ki-Don Kim, Dae-Guen Choi
  • Publication number: 20130126079
    Abstract: Disclosed is an acrylate based adhesive composition for optical use that includes: a copolymer prepared by polymerizing an alkyl(meth)acrylate (wherein the alkyl is a C16 to C22 linear alkyl group) in an amount of about 1 to about 10 parts by weight, an alkyl(meth)acrylate (wherein the alkyl is a C1 to C12 alkyl group) in an amount of about 70 to about 98 parts by weight, and a polar monomer in an amount of about 1 to about 20 parts by weight; and a cross-linking agent. The cross-linking agent is included in an amount of about 0.5 to 5 parts by weight based on 100 parts by weight of the copolymer.
    Type: Application
    Filed: September 6, 2012
    Publication date: May 23, 2013
    Applicants: NITTA CORPORATION, SAMSUNG DISPLAY CO, LTD.
    Inventors: Dong-Sun Lee, Sang-Hyun Lim, Dae-Guen Choi, Hak-Sun Kim, Shinichiro Kawahara, Minoru Nanchi, Keisuke Sako, Yuta Irie, Satoshi Yamaguchi
  • Publication number: 20110081521
    Abstract: Provided are a shape of a hierarchical structure, an engineering effect of the hierarchical structure according to the shape, an increasing method of the engineering effect, an application method of the hierarchical structure for novel material or parts, and a mass-manufacturing method of the hierarchical structure. The present invention relates to a hierarchical structure and a manufacturing method thereof, and includes a hierarchical structure in which at least one nano-object that has a characteristic length of a nanoscale region in an internal matrix is arranged in a predetermined pattern. According to the exemplary embodiments of the present invention, an excellent characteristic that is generated in a nanoscale region may be used in a structure of a macroscopic scale region, and structures that have different scales may be simply interconnected or interfaced regardless of the different scales.
    Type: Application
    Filed: August 24, 2009
    Publication date: April 7, 2011
    Inventors: Jae-Hyun Kim, Hak-Joo Lee, Seung-Min Hyun, Hyun-Ju Choi, Byung-Ik Choi, Ki-Don Kim, Dae-Guen Choi