Patents by Inventor DAEHOON MIN

DAEHOON MIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask inspection apparatus and method of inspecting photomask using the same
    Patent number: 12460991
    Abstract: A photomask inspection apparatus includes a stage which supports an inspection substrate, a first optical system having a first numerical aperture and disposed at one side of the inspection substrate, a second optical system having a second numerical aperture, spaced apart from the first optical system, and disposed at the one side of the inspection substrate, an imaging optical system including a first objective lens aligned with the first optical system with the inspection substrate disposed therebetween, a second objective lens aligned with the second optical system with the inspection substrate disposed therebetween, and disposed at another side of the inspection substrate, which is opposite to the one side of the inspection substrate, and a camera which captures an image passed through the imaging optical system. The first numerical aperture is greater than the second numerical aperture.
    Type: Grant
    Filed: July 24, 2023
    Date of Patent: November 4, 2025
    Assignees: SAMSUNG DISPLAY CO., LTD., HIMS CO., LTD.
    Inventors: Chanhyeong Cho, Tae Joon Kim, Jeongmin Park, Hyeonguk Yeo, Juil Kim, Daehoon Min
  • PHOTOMASK INSPECTION APPARATUS AND METHOD OF INSPECTING PHOTOMASK USING THE SAME
    Publication number: 20240044741
    Abstract: A photomask inspection apparatus includes a stage which supports an inspection substrate, a first optical system having a first numerical aperture and disposed at one side of the inspection substrate, a second optical system having a second numerical aperture, spaced apart from the first optical system, and disposed at the one side of the inspection substrate, an imaging optical system including a first objective lens aligned with the first optical system with the inspection substrate disposed therebetween, a second objective lens aligned with the second optical system with the inspection substrate disposed therebetween, and disposed at another side of the inspection substrate, which is opposite to the one side of the inspection substrate, and a camera which captures an image passed through the imaging optical system. The first numerical aperture is greater than the second numerical aperture.
    Type: Application
    Filed: July 24, 2023
    Publication date: February 8, 2024
    Inventors: CHANHYEONG CHO, TAE JOON KIM, JEONGMIN PARK, HYEONGUK YEO, JUIL KIM, DAEHOON MIN