Abstract: A carbon byproduct removal module includes: a vaporizer configured to produce vapor including oxygen atoms; a carrier gas supplier connected to the vaporizer and configured to supply carrier gas to the vaporizer, wherein the carrier gas carries the vapor to a UV-ray irradiator; and the UV-ray irradiator configured to emit ultraviolet rays to the vapor, wherein a first end of the UV-ray irradiator is connected to a first end of the vaporizer, wherein a second end of the UV-ray irradiator is attached to an exhaust module connected to a chamber in which a semiconductor manufacturing process is performed.

Abstract: A shower head may include a lower shower head part including a lower plate. The lower plate includes a lower plate, the lower plate includes a plurality of gas holes, the plurality of gas holes includes: a vertical hole vertically penetrating the lower plate in a first direction; and an inclined hole penetrating the lower plate in a second direction, which is inclined at an acute angle with respect to the first direction of the vertical hole, the vertical hole has a first diameter and the inclined hole has a second diameter which is different than the first diameter.

Abstract: An apparatus for manufacturing a semiconductor device and a method of manufacturing the apparatus, the apparatus including a heater configured to heat a target, and a coating layer, the coating layer including a ternary material of transition metal(M)-aluminum(Al)-nitrogen(N) represented by the following Chemical Formula: [Chemical Formula] MxAl1?xNy, wherein x and y satisfy the following relations: 0<x<1 and y?1.

Abstract: A valve apparatus includes a valve block with a main flow path, a first valve installed on the valve block and connected to the main flow path so that when the first valve turns on, a first fluid is supplied from the main flow path to a process chamber via the first valve, and a second valve installed on the valve block and connected to the main flow path so that when the first valve turns off and the second valve turns on, a second fluid is supplied from the main flow path to a waste gas treatment system via the second valve. The main flow path is disposed parallel to a central axis passing through a center of the valve block and two opposing surfaces of the valve block perpendicularly thereto. The main flow path is disposed to be offset from the central axis toward the first valve.

Abstract: A valve apparatus includes a valve block with a main flow path, a first valve installed on the valve block and connected to the main flow path so that when the first valve turns on, a first fluid is supplied from the main flow path to a process chamber via the first valve, and a second valve installed on the valve block and connected to the main flow path so that when the first valve turns off and the second valve turns on, a second fluid is supplied from the main flow path to a waste gas treatment system via the second valve. The main flow path is disposed parallel to a central axis passing through a center of the valve block and two opposing surfaces of the valve block perpendicularly thereto. The main flow path is disposed to be offset from the central axis toward the first valve.

Abstract: A substrate transfer apparatus includes: a chamber including a lower surface, an upper surface opposing the lower surface, and a side surface extending between the lower surface and the upper surface; and a fan filter unit disposed on the upper surface of the chamber and configured to introduce air into the chamber. The chamber includes an inclined surface extending from the upper surface to the side surface and positioned to a side of the fan filter unit.

Abstract: A substrate transfer apparatus includes: a chamber including a lower surface, an upper surface opposing the lower surface, and a side surface extending between the lower surface and the upper surface; and a fan filter unit disposed on the upper surface of the chamber and configured to introduce air into the chamber. The chamber includes an inclined surface extending from the upper surface to the side surface and positioned to a side of the fan filter unit.

Abstract: A hard disk drive includes a base on which at least one disk recording and storing data is provided, a filter provided in an area around a corner of the base with a predetermined air flow space interposed between the corner and the filter to collect contaminant particles in air flowing due to rotation of the disk, and an air exhaust prevention unit provided in an area of the air flow space to prevent the air input to the air flow space through an inlet portion between the filter and a first corner side wall connected to the corner from being exhausted through an outlet portion between the filter and a second corner side wall connected to the corner without passing through the filter. The hard disk drive is manufactured in a simple method without changing the media of the filter and a contaminant particle collection effect is improved.

Abstract: A gimbal head assembly and an actuator having the same, the gimbal head assembly and the actuator being included in a hard disk drive (HDD). The actuator can include a swing arm rotatably installed on a base member, the head gimbal assembly elastically biasing a read/write head towards a surface of a disk, and a voice coil motor rotating the swing arm. The head gimbal assembly can include a load beam attached to the swing arm, a flexure attached to the load beam, a slider mounted on a slider mounting portion of the flexure and comprising a read/write head installed on the slider, and an air foil disposed in front of the slider and guiding air flow generated due to rotations of the disk along both sides of the slider.