Patents by Inventor Dai Junyan

Dai Junyan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etch improved resist systems containing acrylate (or methacrylate) silane monomers
    Patent number: 6586156
    Abstract: A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for lithographic treatment of a substrate by means of ketal/phenolic/silicon based compositions and corresponding processes for the production of an object, particularly an electronic component are provided.
    Type: Grant
    Filed: July 17, 2001
    Date of Patent: July 1, 2003
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang, Arpan P. Mahorowala, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo
  • Etch improved resist systems containing acrylate (or methacrylate) silane monomers
    Publication number: 20030049561
    Abstract: A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for lithographic treatment of a substrate by means of ketal/phenolic/silicon based compositions and corresponding processes for the production of an object, particularly an electronic component are provided.
    Type: Application
    Filed: July 17, 2001
    Publication date: March 13, 2003
    Applicant: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang, Arpan P. Mahorowala, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo