Patents by Inventor Dai-Kyu CHOI

Dai-Kyu CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230260762
    Abstract: Provided are a cooling block that can be easily manufactured by forming vertical or horizontal flow paths in an integrated single block body through drilling, and a plasma reaction device having same, and may include: an integrated block body; a first vertical flow path formed in a vertical shape by passing through the inside of the block body from one surface of the block body; a first horizontal flow path passing through one portion of the first vertical flow path; a second horizontal flow path passing through the other portion of the first vertical flow path; a second vertical flow path passing through the first horizontal flow path and the second horizontal flow path; a first sealing stopper provided at a first point so that a refrigerant, having passed through the first vertical flow path, can branch in two ways and then merge into the second vertical flow path; and a second sealing stopper provided at a second point.
    Type: Application
    Filed: July 29, 2020
    Publication date: August 17, 2023
    Inventors: Dai Kyu CHOI, Eun Seok LIM
  • Publication number: 20230260761
    Abstract: Provided are a plasma reaction device capable of cooling a reactor body and a magnetic core by circulating cooling water, and a cooling method thereof, the plasma reaction device including an annular loop space therein, and a body cooling channel therein, a magnetic core having a primary coil to generate plasma by exciting a gas in the annular loop space, a cooling block being in thermal contact with the reactor body or the magnetic core, and having a block cooling channel therein, a connecting block having a first water inlet pipe and a first water outlet pipe at a side thereof to supply cooling water at a first temperature, and having a second water inlet pipe and a second water outlet pipe at another side thereof to collect the cooling water at a second temperature higher than the first temperature, and a cooling water circulation line mounted between the connecting block, the cooling block, and the reactor body.
    Type: Application
    Filed: July 29, 2020
    Publication date: August 17, 2023
    Inventors: Dai Kyu CHOI, Eun Seok LIM
  • Publication number: 20230245861
    Abstract: Disclosed is a plasma generating device which includes a reactor body having a gas injection hole on one side thereof, and a collector connected to an opposite side of the reactor body and having a collection space in an interior thereof. The reactor body and the collector provide a reaction space having a plasma channel in an interior thereof.
    Type: Application
    Filed: August 17, 2021
    Publication date: August 3, 2023
    Inventor: Dai Kyu CHOI
  • Publication number: 20230245857
    Abstract: Provided is a plasma reaction device which can reduce a heating value through installation of a dual-coil type inductor in a resonant network circuit part, and a cooling method thereof. The plasma reaction device may include: a reactor part for exciting an input gas to be in a plasma state by using transformer coupled plasma; a resonant network circuit part electrically connected to the reactor part and including at least one inductor and at least one condenser; and a power supply part for applying power to the resonant network circuit part, wherein the inductor may comprise: a first coil which is formed between a first terminal and a second terminal and at least a portion of which is spirally wound to form a first cylindrical reception space inward; and a second coil which is formed between the first terminal and the second terminal to be connected to the first coil in series, and spirally wound in the first cylindrical reception space.
    Type: Application
    Filed: July 29, 2020
    Publication date: August 3, 2023
    Inventors: Dai Kyu CHOI, Eun Seok LIM
  • Publication number: 20230245866
    Abstract: Provided is a plasma reaction apparatus capable of preventing edge cracks of a magnetic core by dividing the core, the plasma reaction apparatus including a reactor body having a gas inlet at a side thereof, a plasma outlet at another side thereof, and an annular loop space therein, and a magnetic core provided in a shape surrounding at least a part of the reactor body, and having a primary coil to generate plasma by exciting a gas in the annular loop space, wherein the magnetic core includes a middle core layer, an upper core layer mounted on the middle core layer, and a lower core layer mounted under the middle core layer, wherein the upper core layer is divided into a first core layer and a second core layer to prevent edge cracks of the upper core layer by reducing an upper thermal deviation, and wherein the lower core layer is divided into a third core layer and a fourth core layer to prevent edge cracks of the lower core layer by reducing a lower thermal deviation.
    Type: Application
    Filed: July 29, 2020
    Publication date: August 3, 2023
    Inventors: Dai Kyu CHOI, Eun Seok LIM
  • Publication number: 20220238304
    Abstract: Proposed is a reactor that is formed by assembling a plurality of components. The reactor includes a body, in which a plurality of components are assemble, and that has a plasma forming space in an interior thereof, and an assembly line for the components is formed in an area that deviates from an area that is closest to an area of the plasma forming space of the body, in which plasma is concentrated, by a specific range.
    Type: Application
    Filed: January 19, 2022
    Publication date: July 28, 2022
    Inventor: Dai Kyu CHOI
  • Publication number: 20180308729
    Abstract: The substrate can be selectively transferred by a vacuum or edge grip method according to the process characteristics, using a single substrate transfer robot equipped in the front end module. Additionally, after the process, the substrate can be loaded using the buffer chamber, for the cooling process and transfer of the substrate.
    Type: Application
    Filed: May 27, 2016
    Publication date: October 25, 2018
    Inventors: Dai Kyu CHOI, Hui WANG, Xi WANG, Xiaoyan ZHANG, Shena JIA
  • Patent number: 9349575
    Abstract: A remote plasma system having a self-management function measures an operating state of a remote plasma generator while a remote plasma generator operates, which generates plasma and remotely supplies the generated plasma to a process chamber, thereby allowing a process manager to check the measured operating state and performing a required process control depending on an operating state. According to the remote plasma system having the self-management function, it is possible to check operating state information of the remote plasma generator and plasma treatment process progress state information in the process chamber in real time so as to determine whether the remote plasma generator normally operates and immediately sense occurrence of an error during the operation.
    Type: Grant
    Filed: August 27, 2013
    Date of Patent: May 24, 2016
    Inventor: Dai Kyu Choi
  • Patent number: 8902199
    Abstract: An infrared touch screen device capable of smoothly sensing contact positions of a plurality of touch points and sensing multi-touch points, when a plurality of touch points are produced, are provided. The infrared touch screen comprises a screen provided with a display panel on which an image is projected and a reinforced glass plate formed on a front surface of the display panel, an reinforced glass plate formed on a front surface of the screen to protect the screen and on which a touch is made, an optical scanner formed on one side of the screen and scanning the screen with the infrared, a light guide bar formed on a border of the reinforced glass plate, a light receiving portion provided on a distal end of the light guide bar, and a position detector for detecting the touch position with a scanning angle of the optical scanner.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: December 2, 2014
    Assignee: AFO Co., Ltd.
    Inventor: Dai-Kyu Choi
  • Publication number: 20140346952
    Abstract: A remote plasma system having a self-management function measures an operating state of a remote plasma generator while a remote plasma generator operates, which generates plasma and remotely supplies the generated plasma to a process chamber, thereby allowing a process manager to check the measured operating state and performing a required process control depending on an operating state. According to the remote plasma system having the self-management function, it is possible to check operating state information of the remote plasma generator and plasma treatment process progress state information in the process chamber in real time so as to determine whether the remote plasma generator normally operates and immediately sense occurrence of an error during the operation.
    Type: Application
    Filed: August 27, 2013
    Publication date: November 27, 2014
    Inventor: Dai Kyu CHOI
  • Patent number: 8853948
    Abstract: A plasma reactor having multi discharging tubes is disclosed, through which activated gas containing ion, free radical, atom and molecule is generated through plasma discharging, and different process gases are injected into multi discharging tubes in which solid, power and gas, etc., are plasma-treated with the activated gas to perform processes including cleaning process for semiconductor, and a plasma state can be maintained even at low power.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: October 7, 2014
    Inventor: Dai-Kyu Choi
  • Publication number: 20130278135
    Abstract: A plasma reactor having multi discharging tubes is disclosed, through which activated gas containing ion, free radical, atom and molecule is generated through plasma discharging, and different process gases are injected into multi discharging tubes in which solid, power and gas, etc., are plasma-treated with the activated gas to perform processes including cleaning process for semiconductor, and a plasma state can be maintained even at low power.
    Type: Application
    Filed: December 28, 2012
    Publication date: October 24, 2013
    Inventor: Dai-Kyu CHOI
  • Publication number: 20120293461
    Abstract: An infrared touch screen device capable of smoothly sensing contact positions of a plurality of touch points and sensing multi-touch points, when a plurality of touch points are produced, are provided. The infrared touch screen comprises a screen provided with a display panel on which an image is projected and a reinforced glass plate formed on a front surface of the display panel, an reinforced glass plate formed on a front surface of the screen to protect the screen and on which a touch is made, an optical scanner formed on one side of the screen and scanning the screen with the infrared, a light guide bar formed on a border of the reinforced glass plate, a light receiving portion provided on a distal end of the light guide bar, and a position detector for detecting the touch position with a scanning angle of the optical scanner.
    Type: Application
    Filed: February 27, 2012
    Publication date: November 22, 2012
    Applicant: AFO CO., LTD.
    Inventor: Dai-Kyu CHOI