Patents by Inventor Daichi YOSHITOMI

Daichi YOSHITOMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing device and substrate processing method
    Patent number: 11804387
    Abstract: A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: October 31, 2023
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Daichi Yoshitomi, Kazuki Inoue, Masaki Iwami, Hiroaki Ishii
  • SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
    Publication number: 20210217637
    Abstract: A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.
    Type: Application
    Filed: April 1, 2021
    Publication date: July 15, 2021
    Inventors: Daichi YOSHITOMI, Kazuki INOUE, Masaki IWAMI, Hiroaki ISHII
  • Substrate processing device and substrate processing method
    Patent number: 10998203
    Abstract: A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: May 4, 2021
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Daichi Yoshitomi, Kazuki Inoue, Masaki Iwami, Hiroaki Ishii
  • SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
    Publication number: 20180294172
    Abstract: A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.
    Type: Application
    Filed: June 11, 2018
    Publication date: October 11, 2018
    Inventors: Daichi YOSHITOMI, Kazuki INOUE, Masaki IWAMI, Hiroaki ISHII
  • Substrate processing device and substrate processing method
    Patent number: 10037902
    Abstract: A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: July 31, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Daichi Yoshitomi, Kazuki Inoue, Masaki Iwami, Hiroaki Ishii
  • SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
    Publication number: 20160279678
    Abstract: A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.
    Type: Application
    Filed: March 7, 2016
    Publication date: September 29, 2016
    Inventors: Daichi YOSHITOMI, Kazuki INOUE, Masaki IWAMI, Hiroaki ISHII