Patents by Inventor Daijitsu Harada
Daijitsu Harada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240393699Abstract: A mask blank substrate has first and second main surfaces of 152 mm×152 mm-square and 6.35 mm-thick, in which in a pseudo TTV map obtained by adding up maps of the first and second main surfaces, a difference between highest and lowest heights of a TTV1 map, is ?35 nm, excluding a primary component when a plane function is derived, and a difference between highest and lowest heights of a TTV2 map, is ?25 nm, excluding primary and secondary components when a curved-surface function is derived, in fitting of the pseudo TTV map within a cross-shaped region formed in a case where a first rectangular region is overlapped with a second rectangular region, the first and second rectangular regions of 132 mm×104 mm being orthogonal to each other, and parallel to four sides of the main surfaces centered at intersections of diagonal lines of the main surfaces.Type: ApplicationFiled: May 23, 2024Publication date: November 28, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Tomoaki SUGIYAMA, Daijitsu HARADA, Harunobu MATSUI, Masaki TAKEUCHI
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Patent number: 12117724Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.Type: GrantFiled: October 26, 2023Date of Patent: October 15, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki Yarita, Daijitsu Harada, Masaki Takeuchi
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Publication number: 20240250223Abstract: A window material for an optical element, including: a synthetic quartz glass substrate having a flat plate shape and having main surfaces through which light is transmitted, at least one of the main surfaces being a rough surface; and an antireflection film formed on the at least one main surface of the synthetic quartz glass substrate, the main surface being the rough surface. The window material for an optical element of the present invention is easy in shape processing, undergoes little temporal change in a wide wavelength region and is stable over a long period of time, and has high total light transmittance of distributed light.Type: ApplicationFiled: January 9, 2024Publication date: July 25, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Harunobu MATSUI, Daijitsu HARADA, Masaki TAKEUCHI
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Publication number: 20240053675Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.Type: ApplicationFiled: October 26, 2023Publication date: February 15, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Naoki YARITA, Daijitsu HARADA, Masaki TAKEUCHI
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Publication number: 20230418149Abstract: A substrate for mask blanks having first and second main surfaces of 152 mm×152 mm square and a thickness of 6.35 mm, wherein: when a range of 132 mm×132 mm square centered on an intersection of diagonal lines is defined as a calculation region in each of the first and second main surfaces, on a substrate surface of the calculation region of at least one of the first and second main surfaces, flatness of the substrate surface of the calculation region based on a least square plane is 100 nm or less, and a difference (PV) between a highest value and a lowest value of a height of a calculation surface represented by a difference between shapes of the substrate surfaces before and after smoothing processing with a Gaussian filter (10 mm×10 mm) based on the least square plane is 20 nm or less.Type: ApplicationFiled: June 1, 2023Publication date: December 28, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Tomoaki SUGIYAMA, Daijitsu HARADA, Harunobu MATSUI, Naoki YARITA, Masaki TAKEUCHI
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Publication number: 20230398655Abstract: Proposed herein is a method for producing a substrate suitable for mask blanks for EUVL and the method being capable of suppressing a concave defect having a depth of less than 5 nm. The present invention provides a method for producing a substrate in which final polishing is performed by a polishing apparatus having an upper polishing plate equipped with a polishing pad, the method comprising the steps of placing a substrate stock in the polishing apparatus so that the main surface of the substrate stock face toward the upper polishing plate; rotating the upper polishing plate and polishing the substrate stock concomitantly with a polishing slurry on the main surface of the substrate stock; and raising the upper polishing plate which is kept being rotated to separate it from the main surface of the polished substrate stock.Type: ApplicationFiled: June 12, 2023Publication date: December 14, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Naoki Yarita, Daijitsu HARADA, Harunobu MATSUI, Masaki TAKEUCHI
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Patent number: 11835853Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.Type: GrantFiled: May 28, 2021Date of Patent: December 5, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki Yarita, Daijitsu Harada, Masaki Takeuchi
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Patent number: 11757067Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.Type: GrantFiled: July 15, 2022Date of Patent: September 12, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
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Publication number: 20230148016Abstract: The window material for an optical element of the present invention is formed of synthetic quartz glass that is likely to be subjected to shape processing, can be manufactured at low cost, and has a flat plate shape. Even if the window material for an optical element has a flat plate shape, for example, in a window material of a UV-LED such as a UVC-LED sealed with a surface mount package (SMD PKG), light emitted from the optical element, in particular, light having a light distribution angle can be efficiently collected when passing through the window material, and light collection equal to that of a window material having a lens shape such as a conventional convex shape can be achieved. Furthermore, light distribution without irradiation unevenness such as Lambertian reflection can also be achieved.Type: ApplicationFiled: October 19, 2022Publication date: May 11, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Harunobu MATSUI, Daijitsu HARADA, Masao ANDO, Masaki TAKEUCHI
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Patent number: 11591260Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.Type: GrantFiled: July 20, 2020Date of Patent: February 28, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Yoko Ishitsuka, Atsushi Watabe, Daijitsu Harada, Masaki Takeuchi
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Publication number: 20230037856Abstract: A mask blanks substrate having a flatness of a calculation surface of 100 nm or less when a calculation region passing through central portions of first and second main surfaces and extending in a horizontal direction is set, a first region surface is cut out, a second region surface is cut out by setting a reference plane and a rotation axis and rotating the substrate by 180°, least square planes are calculated, the first and second region surfaces are converted into height maps to positions on the least square planes, the height map of the to second region surface is set as a reverse height map by symmetrically moving the height map, and a map of a calculated height obtained by adding heights of the height map of the first region surface and the reverse height map of the second region surface is set as the calculation surface.Type: ApplicationFiled: July 1, 2022Publication date: February 9, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Tomoaki SUGIYAMA, Daijitsu HARADA, Harunobu MATSUI, Naoki YARITA, Masaki TAKEUCHI
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Publication number: 20220372331Abstract: A polishing composition including a colloidal silica containing colloidal silica particles, a pH adjusting agent, and a chelating agent provides a substrate that has a surface having a high flatness, low defects and a low surface roughness with low cost and high productivity, and a substrate having high surface quality suitable as a substrate for mask blanks such as a glass substrate containing SiO2 as a main component, particularly, as a substrate for mask blanks used in EUVL.Type: ApplicationFiled: April 28, 2022Publication date: November 24, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Naoki YARITA, Daijitsu HARADA, Harunobu MATSUI, Masaki TAKEUCHI
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Publication number: 20220352427Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.Type: ApplicationFiled: July 15, 2022Publication date: November 3, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu OKAFUJI, Hiroyuki YAMAZAKI, Masaki TAKEUCHI
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Patent number: 11424389Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.Type: GrantFiled: July 22, 2019Date of Patent: August 23, 2022Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
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Publication number: 20220149247Abstract: A bonding and sealing material includes, as the essential ingredients, a solder powder, silver nanoparticles coated with a coating material and a solvent, and additionally includes at least one ingredient selected from the group consisting of selenium metal, oxide film inhibitors and oxide film removers. This bonding and sealing material can easily form under mild conditions a metallic adhesive layer having good hermetic sealability and UV resistance of the sort desired when sealing a short-wavelength light-emitting device such as a UV-LED, and can be stably used over a long period of time.Type: ApplicationFiled: November 1, 2021Publication date: May 12, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Harunobu MATSUI, Daijitsu HARADA, Masaki TAKEUCHI
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Publication number: 20210382386Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.Type: ApplicationFiled: May 28, 2021Publication date: December 9, 2021Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Naoki YARITA, Daijitsu HARADA, Masaki TAKEUCHI
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Publication number: 20210351326Abstract: A lid for an optical element package, comprising: a window material provided in front of the light emitting direction of an optical element of a housing member, inside of which the optical element is housed; and a metal-based adhesive layer formed on a part at which the window material contacts the housing member, wherein with the lid for an optical element package, the metal-based adhesive layer is formed by an adhesive composition including metal nanoparticles, a solder powder, and a dispersion medium coated by a coating agent. It is possible to address deterioration and cracking due to light of short wavelengths, distortion or decay of the adhesive agent due to heat generation of the light emitting element, and the problem of long-term reliability accompanying these. Specifically, it is possible to provide the lid for an optical element package and the optical element package with excellent heat resistance, ultraviolet resistance, etc.Type: ApplicationFiled: September 2, 2019Publication date: November 11, 2021Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Harunobu MATSUI, Daijitsu HARADA, Masaki TAKEUCHI
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Publication number: 20210316405Abstract: A sealing composition which can be handled in a semi-cured state and can obtain a sintered body having excellent joining strength and sealing performance is provided. A sealing composition including a solder powder, coated silver particles including silver core particles and a coating agent arranged on a surface of the silver core particles, and a solvent is provided. Further, a sintering temperature (T2) of the coated silver particles and a boiling point (T3) of the solvent satisfy T2?T3.Type: ApplicationFiled: August 30, 2019Publication date: October 14, 2021Inventors: Yu OYAMA, Hidefumi KINDA, Daisuke KURITA, Harunobu MATSUI, Daijitsu HARADA, Masaki TAKEUCHI
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Publication number: 20210293994Abstract: A synthetic quartz glass substrate with an antireflection film, including: a synthetic quartz glass substrate; and an antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer containing Al2O3, a second layer containing HfO2, and a third layer containing MgF2 or SiO2 sequentially laminated on the main surface of the synthetic quartz glass substrate.Type: ApplicationFiled: March 10, 2021Publication date: September 23, 2021Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Harunobu MATSUI, Daijitsu HARADA, Masaki TAKEUCHI
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Patent number: 10948817Abstract: A circular mold-forming substrate of 125-300 mm diameter having a surface on which a topological pattern is to be formed is provided wherein the thickness of the substrate has a variation of up to 2 ?m within a circle having a diameter of 125 mm.Type: GrantFiled: February 9, 2012Date of Patent: March 16, 2021Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daijitsu Harada, Masaki Takeuchi