Patents by Inventor Daijo Tomihisa

Daijo Tomihisa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6498231
    Abstract: The present invention provides: a vinylpyrrolidone polymer which exhibits good heat resistance and storage stability; a composition containing the vinylpyrrolidone polymer; a stabilization process for the vinylpyrrolidone polymer, and a preservation process for a vinylpyrrolidone polymer by which: even when the vinylpyrrolidone polymer is preserved for a long time or at high temperature, the physical properties such as molecular weight (K value) of the vinylpyrrolidone polymer can be prevented from changing, therefore the vinylpyrrolidone polymer can stably be preserved. To enhance the heat resistance and the storage stability, a vinylpyrrolidone polymer is mixed with a certain amount of antioxidant, and the oxygen concentration is suppressed to not higher than 50,000 ppm in a gas phase that contacts with the vinylpyrrolidone polymer when preserving.
    Type: Grant
    Filed: December 3, 2001
    Date of Patent: December 24, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Daijo Tomihisa, Toshiaki Kuriyama, Tomiyasu Ueta, Akio Naka, Hideyuki Nishibayashi, Yoshitomo Nakata
  • Patent number: 6391994
    Abstract: The present invention provides a production process for a vinylpyrrolidone polymer which process prevents the polymerization reaction of N-vinylpyrrolidone from being hindered by by-products (as formed by nucleomethylation of N-vinylpyrrolidone) or &ggr;-butyrolactone, and therefore enables to obtain a vinylpyrrolidone polymer that has a desired molecular weight and involves only a small amount of residual monomers, wherein the vinylpyrrolidone polymer can display excellent properties even if the vinylpyrrolidone polymer is, for example, crosslinked to convert it into a water-absorbent resin. The production process for a vinylpyrrolidone polymer comprises the step of polymerizing a polymerizable monomer component or components which include N-vinylpyrrolidone, wherein: the N-vinylpyrrolidone as used is N-vinylpyrrolidone having a &ggr;-butyrolactone content of not more than 500 ppm; and/or the N-vinylpyrrolidone as used is N-vinylpyrrolidone obtained without using acetylene as a raw material.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: May 21, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Daijo Tomihisa, Nobuyuki Harada, Akio Naka, Toshiaki Kuriyama, Yuuji Shimasaki, Hideyuki Nishibayashi
  • Publication number: 20020058782
    Abstract: The present invention provides: a vinylpyrrolidone polymer which exhibits good heat resistance and storage stability; a composition containing the vinylpyrrolidone polymer; a stabilization process for the vinylpyrrolidone polymer, and a preservation process for a vinylpyrrolidone polymer by which: even when the vinylpyrrolidone polymer is preserved for a long time or at high temperature, the physical properties such as molecular weight (K value) of the vinylpyrrolidone polymer can be prevented from changing, therefore the vinylpyrrolidone polymer can stably be preserved. To enhance the heat resistance and the storage stability, a vinylpyrrolidone polymer is mixed with a certain amount of antioxidant, and the oxygen concentration is suppressed to not higher than 50,000 ppm in a gas phase that contacts with the vinylpyrrolidone polymer when preserving.
    Type: Application
    Filed: December 3, 2001
    Publication date: May 16, 2002
    Inventors: Daijo Tomihisa, Toshiaki Kuriyama, Tomiyasu Ueta, Akio Naka, Hideyuki Nishibayashi, Yoshitomo Nakata
  • Patent number: 6346600
    Abstract: The present invention provides: a vinylpyrrolidone polymer which exhibits good heat resistance and storage stability; a composition containing the vinylpyrrolidone polymer; a stabilization process for the vinylpyrrolidone polymer, and a preservation process for a vinylpyrrolidone polymer by which: even when the vinylpyrrolidone polymer is preserved for a long time or at high temperature, the physical properties such as molecular weight (K value) of the vinylpyrrolidone polymer can be prevented from changing, therefore the vinylpyrrolidone polymer can stably be preserved. To enhance the heat resistance and the storage stability, a vinylpyrrolidone polymer is mixed with a certain amount of antioxidant, and the oxygen concentration is suppressed to not higher than 50,000 ppm in a gas phase that contacts with the vinylpyrrolidone polymer when preserving.
    Type: Grant
    Filed: April 6, 2000
    Date of Patent: February 12, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Daijo Tomihisa, Toshiaki Kuriyama, Tomiyasu Ueta, Akio Naka, Hideyuki Nishibayashi, Yoshitomo Nakata
  • Publication number: 20010020078
    Abstract: The present invention provides a production process for a vinylpyrrolidone polymer which process prevents the polymerization reaction of N-vinylpyrrolidone from being hindered by by-products (as formed by nucleomethylation of N-vinylpyrrolidone) or &ggr;-butyrolactone, and therefore enables to obtain a vinylpyrrolidone polymer that has a desired molecular weight and involves only a small amount of residual monomers, wherein the vinylpyrrolidone polymer can display excellent properties even if the vinylpyrrolidone polymer is, for example, crosslinked to convert it into a water-absorbent resin. The production process for a vinylpyrrolidone polymer comprises the step of polymerizing a polymerizable monomer component or components which include N-vinylpyrrolidone, wherein: the N-vinylpyrrolidone as used is N-vinylpyrrolidone having a &ggr;-butyrolactone content of not more than 500 ppm; and/or the N-vinylpyrrolidone as used is N-vinylpyrrolidone obtained without using acetylene as a raw material.
    Type: Application
    Filed: January 31, 2001
    Publication date: September 6, 2001
    Inventors: Daijo Tomihisa, Nobuyuki Harada, Akio Naka, Toshiaki Kuriyama, Yuuji Shimasaki, Hideyuki Nishibayashi
  • Patent number: 5728770
    Abstract: A surface treatment composition which can form a coating having excellent gas barrier properties, transparency and flexibility, contains at least one silane compound component selected from the group consisting of a silane compound (A) having amino groups and hydrolytic condensation groups in their molecules, a hydrolytic condensation product (B) of the silane compound (A), and a co-hydrolytic condensation product (D) of the silane compound (A) and an organometallic compound (C); a compound (E) having at least two functional groups which can react with an amino group in its molecule; and solvent (F).
    Type: Grant
    Filed: January 28, 1997
    Date of Patent: March 17, 1998
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Tetsuya Yamamoto, Akio Naka, Yukiko Hori, Daijo Tomihisa, Tadahiro Yoneda
  • Patent number: 5683501
    Abstract: Compound fine particles include inorganic fine particles and an organic polymer bound to surfaces of the inorganic fine particles, and have an average particle diameter of 5 to 200 nm and a particle diameter variation coefficient of 50% or less. The compound fine particles are obtainable by hydrolyzing and condensing an organic polymer, wherein the organic polymer has, per molecule, at least one polysiloxane group containing at least one Si--OR.sup.1 group, wherein R.sup.1 denotes a hydrogen atom, an unsubstituted or substituted alkyl group, or an unsubstituted or substituted acyl group. A compound fine particle dispersion includes the compound fine particles and a dispersion medium. A composition for forming a film includes this dispersion.
    Type: Grant
    Filed: November 4, 1994
    Date of Patent: November 4, 1997
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Daijo Tomihisa, Shigefumi Kuramoto, Satoshi Ishida, Tadahiro Yoneda, Masaya Yoshida, Ichiro Namura