Patents by Inventor Daiki Ito

Daiki Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230380678
    Abstract: An information processing device including a calculation unit that calculates an evaluation function using a visibility threshold of a test subject obtained by performing a visual acuity examination on the test subject and using a parameter related to a visual object, and a spectral transmittance optimization unit that optimizes a spectral transmittance of a filter having a spectral transmittance to light from the visual object using the evaluation function when passed through the filter.
    Type: Application
    Filed: October 18, 2021
    Publication date: November 30, 2023
    Applicants: MITSUI CHEMICALS, INC., VISUAL TECHNOLOGY LABORATORY INC.
    Inventors: Daiki ITO, Taizo NISHIMOTO, Kenji SUZUKI, Shoko MATSUMURA, Noriaki ASADA, Yoshiki NAKAMURA, Minao YAMAMOTO
  • Patent number: 11718768
    Abstract: A polishing composition according to the present invention contains silica, a nitrogen-containing alkaline compound, and hydrogen peroxide, in which a content of the hydrogen peroxide is more than 0% by mass and less than 0.03% by mass with respect to the total mass of the polishing composition, and a pH exceeds 9.
    Type: Grant
    Filed: February 9, 2021
    Date of Patent: August 8, 2023
    Inventor: Daiki Ito
  • Publication number: 20230219777
    Abstract: A conveying belt has a cylindrical base layer, and a surface layer that is formed on the outer peripheral surface of the base layer. The base layer contains polyimide or polyamide-imide, and has an elastic modulus from 3-7 GPa, inclusive. The surface layer is configured as a cured object from a resin composition that contains a fluororesin having a hydroxy group, an isocyanate curing agent, and a silicone copolymer. The silicone copolymer is a copolymer containing a silicone unit and another kind of unit not having a siloxane skeleton, has a hydroxy group, and contains siloxane units in a proportion of at least 95 mol% and less than 100 mol%, or from 40-70 mol%, inclusive. The silicone copolymer content in the resin composition is 1-5 parts by mass, inclusive, relative to a total 100 parts by mass of the fluororesin and the isocyanate curing agent.
    Type: Application
    Filed: March 7, 2023
    Publication date: July 13, 2023
    Applicant: Sumitomo Riko Company Limited
    Inventors: Hironari Nishioka, Daisuke Inoue, Yasuyuki Hayasaki, Sho Sakamoto, Yasuhide Watanabe, Fumio Misumi, Daiki Ito, Isamu Maruyama, Shingo Nakaichi
  • Publication number: 20230041239
    Abstract: A grafting device including a rootstock holding unit and a scion holding unit both provided in a main body and relatively movable in a predetermined direction, at least one of the rootstock holding unit and the scion holding unit includes: a hand module including: a grip portion configured to be openable and closable for gripping a stem of a plant; reciprocating portions an operating rod and a slide plate provided between the grip portion and the main body and capable of reciprocating; a motion converting portion configured to convert reciprocation of the reciprocating portion into an opening/closing motion of the grip portion; and a biasing means configured to bias the reciprocating portion in any one direction of the reciprocating movement; and a drive means provided in the main body and configured to drive the reciprocating portion in a direction opposite to a biasing direction by the biasing means.
    Type: Application
    Filed: November 9, 2020
    Publication date: February 9, 2023
    Applicant: ELM INC.
    Inventors: Takakazu MIYAHARA, Kengo WADA, John Cedric Villanueva OBAG, Daiki ITO
  • Publication number: 20220275246
    Abstract: There is provided a polishing composition capable of improving the polishing removal rate of silicon nitride to polish silicon oxide and silicon nitride at the same polishing removal rate and polishing silicon nitride with a small number of defects. A polishing composition contains: abrasives having a positive zeta potential; and a cyclic compound having a mother nucleus with a ring structure and two or more anionic functional groups bonded to the mother nucleus, in which the abrasives contain silica. This polishing composition is used for polishing objects to be polished containing silicon oxide and silicon nitride.
    Type: Application
    Filed: February 24, 2022
    Publication date: September 1, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Daiki ITO, Toshio SHINODA
  • Patent number: 11430796
    Abstract: A semiconductor device is provided. The semiconductor can apply different voltages to sources and bases (bulks, N-type well) of pull-up transistors and improves write margin of memory cells. An SRAM of the invention includes P-well regions PW_1 and PW_2, an N-well region NW, a first metal wire M1, and a second metal wire M2. The P-well regions PW_1 and PW_2 extend in a first direction, and pull-down transistors and accessing transistors are formed therein. The N-well region NW extends in first direction, and pull-up transistors are formed therein. The first metal wire M1 extends in the first direction on the N-well region NW and is electrically connected to the N-well region NW. The second metal wire M2 extends in a second direction orthogonal to the first direction and electrically connected to a common S/D region of a pair of pull-up transistors that are formed in the N-well region NW.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: August 30, 2022
    Assignee: Winbond Electronics Corp.
    Inventors: Junichi Hirotsu, Daiki Ito
  • Publication number: 20220220339
    Abstract: There are provided a polishing composition capable of improving the polishing removal rate of a TEOS film, a method for manufacturing the polishing composition, and a polishing method. A polishing composition contains cationized colloidal silica chemically surface-modified with an amino silane coupling agent and an anionic surfactant, in which the pH value is larger than 3 and smaller than 6.
    Type: Application
    Filed: January 5, 2022
    Publication date: July 14, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Daiki ITO, Toshio SHINODA
  • Publication number: 20210364954
    Abstract: A fixing member 10 for an electrophotographic device includes a base layer 12, a metal layer 14 formed on the based layer 12, and a protective layer 16 formed on the metal layer 14. The metal layer 14 is configured to form a predetermined pattern. The base layer 12 has a surface 12a which is covered with the metal layer 14 and a surface 12b which is not covered with the metal layer 14. The protective layer 16 continuously covers the surface 12b of the base layer 12 not covered with the metal layer 14 and a surface of the metal layer 14, and is bonded to the surface 12b of the base layer 12 not covered with the metal layers 14. The base layer 12 and the protective layer 16 contain a resin that includes an imide bond in a repeating unit.
    Type: Application
    Filed: August 9, 2021
    Publication date: November 25, 2021
    Applicant: Sumitomo Riko Company Limited
    Inventors: Kazunori TAKAKI, Hirotoshi MATSUDA, Daiki ITO, Yasuhide WATANABE, Isamu MARUYAMA, Shingo NAKAICHI, Yasuyuki HAYASAKI
  • Publication number: 20210253905
    Abstract: A polishing composition according to the present invention contains silica, a nitrogen-containing alkaline compound, and hydrogen peroxide, in which a content of the hydrogen peroxide is more than 0% by mass and less than 0.03% by mass with respect to the total mass of the polishing composition, and a pH exceeds 9.
    Type: Application
    Filed: February 9, 2021
    Publication date: August 19, 2021
    Inventor: Daiki ITO
  • Patent number: 11037649
    Abstract: A test device capable of measuring characteristics of respective transistors constituting a memory cell is provided. The test device for testing a SRAM connects a resistor to a bit line on one side of a memory cell selected by a word line selection circuit and a bit line selection circuit of the SRAM. In a manner that a selected transistor and a resistor of the memory cell constitute a source follower circuit, the test device applies a voltage to each portion of the memory cell, applies an input voltage to a gate of the transistor constituting the source follower circuit, and inputs an output voltage outputted from a source of the transistor constituting the source follower circuit.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: June 15, 2021
    Assignee: Winbond Electronics Corp.
    Inventors: Junichi Hirotsu, Daiki Ito
  • Publication number: 20200321343
    Abstract: A semiconductor device is provided. The semiconductor can apply different voltages to sources and bases (bulks, N-type well) of pull-up transistors and improves write margin of memory cells. An SRAM of the invention includes P-well regions PW_1 and PW_2, an N-well region NW, a first metal wire M1, and a second metal wire M2. The P-well regions PW_1 and PW_2 extend in a first direction, and pull-down transistors and accessing transistors are formed therein. The N-well region NW extends in first direction, and pull-up transistors are formed therein. The first metal wire M1 extends in the first direction on the N-well region NW and is electrically connected to the N-well region NW. The second metal wire M2 extends in a second direction orthogonal to the first direction and electrically connected to a common S/D region of a pair of pull-up transistors that are formed in the N-well region NW.
    Type: Application
    Filed: March 26, 2020
    Publication date: October 8, 2020
    Applicant: Winbond Electronics Corp.
    Inventors: Junichi HIROTSU, Daiki ITO
  • Publication number: 20200308450
    Abstract: The object of the present invention is to provide a novel polishing composition capable of polishing two or more kinds of objects to be polished at a similar speed and at a high speed. A polishing composition used for polishing an object to be polished, the polishing composition including: abrasive grains; an organic compound; and a liquid carrier, in which the number of silanol groups per unit surface area of the abrasive grains is more than 0/nm2 and equal to or less than 2.5/nm2, and the organic compound has a phosphonic acid group or a salt group thereof.
    Type: Application
    Filed: March 19, 2020
    Publication date: October 1, 2020
    Applicant: FUJIMI INCORPORATED
    Inventors: Toshio SHINODA, Daiki ITO
  • Publication number: 20200303032
    Abstract: A test device capable of measuring characteristics of respective transistors constituting a memory cell is provided. The test device for testing a SRAM connects a resistor to a bit line on one side of a memory cell selected by a word line selection circuit and a bit line selection circuit of the SRAM. In a manner that a selected transistor and a resistor of the memory cell constitute a source follower circuit, the test device applies a voltage to each portion of the memory cell, applies an input voltage to a gate of the transistor constituting the source follower circuit, and inputs an output voltage outputted from a source of the transistor constituting the source follower circuit.
    Type: Application
    Filed: March 10, 2020
    Publication date: September 24, 2020
    Applicant: Winbond Electronics Corp.
    Inventors: Junichi Hirotsu, Daiki Ito
  • Patent number: 10678167
    Abstract: Provided is an endless belt which can improve rotational durability when compared to a conventional endless belt. This endless belt is formed in a tubular shape and is used for electronic photographing apparatuses. The endless belt has an edge part which is formed on at least one belt edge in the belt width direction and which has an end that is tapered toward the outside of the belt width direction. The edge part can be configured by a first edge part formed by intersecting an outer inclined surface with a belt inner circumferential surface, a second edge part configured by intersecting an inner inclined surface with a belt outer circumferential surface, or a third edge part configured by intersecting the outer inclined surface with the inner inclined surface.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: June 9, 2020
    Assignee: Sumitomo Riko Company Limited
    Inventors: Daiki Ito, Teruyoshi Kimpara, Tsukasa Fujita, Satoshi Endo
  • Publication number: 20200071567
    Abstract: The polishing composition according to the present invention is used to polish an object to be polished having a silicon oxide film, contains an abrasive grain, a compound having a logarithmic value (Log P) of partition coefficient of 1.0 or more, and a dispersing medium, and has a pH of less than 7.
    Type: Application
    Filed: August 30, 2019
    Publication date: March 5, 2020
    Applicant: Fujimi Incorporated
    Inventors: Toshio Shinoda, Yoshihiro Izawa, Daiki Ito
  • Publication number: 20190339636
    Abstract: Provided is an endless belt which can improve rotational durability when compared to a conventional endless belt. This endless belt is formed in a tubular shape and is used for electronic photographing apparatuses. The endless belt has an edge part which is formed on at least one belt edge in the belt width direction and which has an end that is tapered toward the outside of the belt width direction. The edge part can be configured by a first edge part formed by intersecting an outer inclined surface with a belt inner circumferential surface, a second edge part configured by intersecting an inner inclined surface with a belt outer circumferential surface, or a third edge part configured by intersecting the outer inclined surface with the inner inclined surface.
    Type: Application
    Filed: July 11, 2019
    Publication date: November 7, 2019
    Applicant: Sumitomo Riko Company Limited
    Inventors: Daiki ITO, Teruyoshi KIMPARA, Tsukasa FUJITA, Satoshi ENDO
  • Patent number: 10282408
    Abstract: An information processing apparatus includes a storage section and a control section. The storage section stores a plurality of templates having different predetermined designs with template attribute information, the plurality of templates each being applied to a display of a content including at least one of a document and an image with the content being laid out on the template. The control section performs a matching processing of component information, as a search key, of the content with the template attribute information, and selects, as a template corresponding to the content to be applied to the display of the content, a template whose template attribute information has a higher match rate than others.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: May 7, 2019
    Assignee: Sony Corporation
    Inventors: Tsunayuki Ohwa, Satoru Inoue, Nariaki Satoh, Shinji Yuhara, Daiki Ito, Takayuki Usami
  • Publication number: 20180046116
    Abstract: Provided is an endless belt in which surface cracks due to ozone deterioration, and a belt deformation tendency can be inhibited. The endless belt is intended for use in an electrophotographic image forming device. The endless belt includes a tubular base layer and an elastic layer laminated on the outer circumference of the base layer. The elastic layer includes a cured material of a composition containing a polycarbonate polyol, a polyisocyanate, and a rubber polymer having a double bond. A mass ratio of the polycarbonate polyol and the rubber polymer in the composition may be in a range of 5:95 to 95:5. The rubber polymer preferably contains at least one of an acrylonitrile-butadiene rubber and an epichlorohydrin rubber.
    Type: Application
    Filed: October 10, 2017
    Publication date: February 15, 2018
    Applicant: SUMITOMO RIKO COMPANY LIMITED
    Inventors: Kadai Takeyama, Teruyoshi Kimpara, Daiki Ito
  • Publication number: 20170139896
    Abstract: An information processing apparatus includes a storage section and a control section. The storage section stores a plurality of templates having different predetermined designs with template attribute information, the plurality of templates each being applied to a display of a content including at least one of a document and an image with the content being laid out on the template. The control section performs a matching processing of component information, as a search key, of the content with the template attribute information, and selects, as a template corresponding to the content to be applied to the display of the content, a template whose template attribute information has a higher match rate than others.
    Type: Application
    Filed: January 27, 2017
    Publication date: May 18, 2017
    Applicants: SONY CORPORATION, SONY MOBILE COMMUNICATIONS INC.
    Inventors: Tsunayuki OHWA, Satoru Inoue, Nariaki Satoh, Shinji Yuhara, Daiki Ito, Takayuki Usami
  • Patent number: 9600498
    Abstract: An information processing apparatus includes a storage section and a control section. The storage section stores a plurality of templates having different predetermined designs with template attribute information, the plurality of templates each being applied to a display of a content including at least one of a document and an image with the content being laid out on the template. The control section performs a matching processing of component information, as a search key, of the content with the template attribute information, and selects, as a template corresponding to the content to be applied to the display of the content, a template whose template attribute information has a higher match rate than others.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: March 21, 2017
    Assignees: Sony Corporation, Sony Mobile Communications Inc.
    Inventors: Tsunayuki Ohwa, Satoru Inoue, Nariaki Satoh, Shinji Yuhara, Daiki Ito, Takayuki Usami