Patents by Inventor Daiki Shono

Daiki Shono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SPUTTERING TARGET, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SPUTTERING FILM USING SPUTTERING TARGET
    Publication number: 20240410049
    Abstract: A sputtering target includes crystal grains, has a content of an amorphous phase of 3% by volume or less, and contains at least one metal selected from the group consisting of chromium, molybdenum, and chromium-molybdenum alloys.
    Type: Application
    Filed: October 5, 2022
    Publication date: December 12, 2024
    Inventors: Daiki SHONO, Taiga KONDO, Masami MESUDA, Kenichi ITOH, Koichi HANAWA
  • METHOD FOR PRODUCING CHROMIUM SINTERED BODY, METHOD FOR PRODUCING SPUTTERING TARGET, AND METHOD FOR PRODUCING SUBSTRATE WITH CHROMIUM FILM
    Publication number: 20230287560
    Abstract: A method for producing a chromium sintered body includes a heat treatment step of heat-treating electrolytic chromium flakes at 1,200° C. or higher and 1,400° C. or lower, and a firing step of, after the heat treatment step, filling a container with the electrolytic chromium flakes and firing a resulting filling product by hot isostatic pressing.
    Type: Application
    Filed: March 8, 2023
    Publication date: September 14, 2023
    Inventors: Masami MESUDA, Daiki SHONO, Kenichi ITOH, Koichi HANAWA
  • Titanium Sputtering Target, Production Method Therefor, And Method For Producing Titanium-Containing Thin Film
    Publication number: 20220162743
    Abstract: Provided is a titanium sputtering target having a recrystallized structure having an average crystal grain diameter of 1 ?m or less. Also provided is a method for producing a titanium sputtering target, the method comprising the steps of: subjecting a cut titanium ingot to large strain processing to provide a processed sheet; subjecting the processed sheet to cold rolling at a rolling ratio of 30% or more to provide a rolled sheet; and subjecting the rolled sheet to a heat treatment at a temperature of 320° C. or less.
    Type: Application
    Filed: February 8, 2022
    Publication date: May 26, 2022
    Inventors: Shuhei Murata, Daiki Shono
  • Sputtering Target and Method for Producing Same
    Publication number: 20220049346
    Abstract: Provided is a cylindrical sputtering target made of a metal material, which has reduced particles. The sputtering target includes at least a target material, wherein the target material includes one or more metal elements, and has a crystal grain size of 10 ?m or less.
    Type: Application
    Filed: September 20, 2019
    Publication date: February 17, 2022
    Inventors: Daiki Shono, Shuhei Murata, Takeo Okabe
  • Sputtering Target and Method for Producing Same
    Publication number: 20220033960
    Abstract: Provided is a cylindrical sputtering target made of a metal material, which has reduced particles. The sputtering target includes at least a target material, wherein the target material comprises one or more metal elements, the target material has a crystal grain size of 50 ?m or less, and the target material has an oxygen concentration of 1000 ppm by mass or less.
    Type: Application
    Filed: September 20, 2019
    Publication date: February 3, 2022
    Inventors: Daiki Shono, Shuhei Murata, Takeo Okabe
  • Titanium Sputtering Target, Production Method Therefor, And Method For Producing Titanium-Containing Thin Film
    Publication number: 20200240005
    Abstract: Provided is a titanium sputtering target having a recrystallized structure having an average crystal grain diameter of 1 ?m or less. Also provided is a method for producing a titanium sputtering target, the method comprising the steps of: subjecting a cut titanium ingot to large strain processing to provide a processed sheet; subjecting the processed sheet to cold rolling at a rolling ratio of 30% or more to provide a rolled sheet; and subjecting the rolled sheet to a heat treatment at a temperature of 320° C. or less.
    Type: Application
    Filed: July 13, 2018
    Publication date: July 30, 2020
    Inventors: Shuhei Murata, Daiki Shono