Abstract: A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.

Abstract: A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.

Abstract: A fly eye integrator satisfying the following expression (1) is used for an illumination system: ?×?/f>M×DL×NAL (1) wherein ? is a diameter of a circle inscribed to a fly-eye integrator injection end surface; ? is a diameter of a circle inscribed to an end surface of each of lens elements constituting the fly-eye integrator; f is a focal distance of each of lens elements constituting the fly-eye integrator; M is a zoom multiplication ratio of the image formation optical system; DL is field-of-view diameter required for the zoom low multiplication unit of the DL image formation optical system; and NAL is a numerical aperture required for the zoom low multiplication side of the image formation optical system. Thus, it is possible to provide an image measuring apparatus which can prevent insufficient NA from the low multiplication to the high multiplication of zoom and irregularities of the field-of-view.

Abstract: A surface inspection apparatus includes an illuminating part illuminating an edge part of a substrate from a direction deviated from a direction of normal line of the edge part by an angle being predetermined, the edge part being inclined and the substrate being an inspection target, an imaging optics forming an image from a diffracted light from a captured area of the edge part as a dark field image, an imaging part capturing the dark field image obtained by the imaging optics, and a detecting part detecting a defect based on whether or not a striated image appears on the dark field image corresponding to the edge part obtained by the imaging part.

Abstract: A fly eye integrator satisfying the following Expression (1) is used for an illumination system: ?×?/f>M×DL×NAL . . . (1) Wherein ? is a diameter of a circle inscribed to a fly-eye integrator injection end surface; ? is a diameter of a circuit inscribed to an end surface of each of lens elements constituting the fly-eye integrator; f is a focal distance of each of lens elements constituting the fly-eye integrator; M is a zoom multiplication ratio of the image formation optical system; DL is field-of-view diameter required for the zoom low multiplication unit of the DL image formation optical system; and NAL is a numerical aperture required for the zoom low multiplication side of the image formation optical system. Thus, it is possible to provide an image measuring apparatus which can prevent insufficient NA from the low multiplication to the high multiplication of zoom and irregularities of the field-of-view.

Abstract: A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.

Abstract: An object is to constitute a mark position detection device with high measurement accuracy. Further, another object is to provide an evaluation method capable of evaluating characteristics of an image formation optical system with high sensitivity. Accordingly, the mark position detection device has the image formation optical system that causes the imaging of light reflected from a mark constituted of a plurality of steps formed on a substrate; an image pickup part that fetches an image formed by the image formation optical system; and a detection part that detects positions of the steps based on an output signal from the image pickup part wherein, when wavefront aberration of the image formation optical system is expressed by Zernike polynomials, an amount of change of Z4 among the polynomials due to an object height amounts to a prescribed range according to a position detection precision of the mark position detection device.