Abstract: Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.

Abstract: Water treatment apparatuses for removing impurities from supplied water and an information processing device are provided. The information processing device, based on the removal rates for removing impurities in the water treatment apparatuses, calculates a predicted value of the concentration of impurities contained in the water supplied from the water to be treatment apparatuses when water currently being supplied is treated by the water treatment apparatuses.

Abstract: A management system includes: a database that stores a first cleanliness indicating the liquid quality of the cleaning solution after the cleaning unit that cleans a container to which unique identification information is assigned cleans the container, in association with the identification information assigned to the container, and a management device that searches the database for the identification information associated with the first cleanliness that corresponds with a second cleanliness requested from the outside, and outputs the identification information that was retrieved.

Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 ?g/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 M?·cm.

Abstract: Provided are a method and system for measuring hydrogen peroxide concentration in sample water collected from a prescribed position in a water treatment process and includes: collecting the sample water; measuring a concentration of a dissolved oxygen in the sample water or a treated water obtained by treating the sample water with the hydrogen peroxide decomposing device by first and second dissolved oxygen concentration measuring analyzers to obtain a corrected value that is a difference between the two dissolved oxygen concentration values; measuring the concentration of the dissolved oxygen in the sample and treated water by the first and second dissolved oxygen concentration measuring analyzers, respectively, and obtaining a measured value that is a difference between the dissolved oxygen concentration values; and calculating a corrected concentration of hydrogen peroxide from the measured value obtained during the measured value obtaining and the corrected value obtained during the corrected value obtai

Abstract: A water quality management method for managing the concentration of impurity ions contained in the water to be analyzed includes connecting the ion adsorption device in which the ion adsorbent and the accumulated flow rate meter are provided to the blanch pipe, passing the water being analyzed from the blanch pipe to the ion adsorbent for a predetermined period of time to the ion adsorption device and adsorbing ions contained in the water being analyzed an ion adsorbent sample. In the ion adsorption device, an accumulated flow rate meter is provided on the downstream side of the flow direction of the water being analyzed of the ion adsorbent.

Abstract: Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.

Abstract: Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.

Abstract: Provided are a method and system for measuring hydrogen peroxide concentration in sample water collected from a prescribed position in a water treatment process and includes: collecting the sample water; measuring a concentration of a dissolved oxygen in the sample water or a treated water obtained by treating the sample water with the hydrogen peroxide decomposing device by first and second dissolved oxygen concentration measuring analyzers to obtain a corrected value that is a difference between the two dissolved oxygen concentration values; measuring the concentration of the dissolved oxygen in the sample and treated water by the first and second dissolved oxygen concentration measuring analyzers, respectively, and obtaining a measured value that is a difference between the dissolved oxygen concentration values; and calculating a corrected concentration of hydrogen peroxide from the measured value obtained during the measured value obtaining and the corrected value obtained during the corrected value obtai

Abstract: A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.

Abstract: A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.

Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 ?g/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 M?·cm.

Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 ?g/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 M?·cm.

Abstract: A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid to a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.

Abstract: A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid to a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.

Abstract: Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.

Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 ?g/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 M?·cm.

Abstract: A water-soluble lithium salt is added as a tracer substance along with a water treatment chemical to water to be treated. The concentration of lithium ions is electrochemically or optically measured using a lithium ion sensitive substance, so as to perform concentration control of the water treatment chemical added to water to be treated. An ion selective electrode, ion selective field effect transistor, or ion optode may be employed to perform the electrochemical or optical measurement using a lithium ion sensitive substance.

Abstract: A water-soluble lithium salt is added as a tracer substance along with a water treatment chemical to water to be treated. The concentration of lithium ions is electrochemically or optically measured using a lithium ion sensitive substance, so as to perform concentration control of the water treatment chemical added to water to be treated. An ion selective electrode, ion selective field effect transistor, or ion optode may be employed to perform the electrochemical or optical measurement using a lithium ion sensitive substance.

Abstract: A carrier (A) of thermoplastic polymer is mixed and contacted with photocatalytic particles (B) preferably in a rotary heating drum to fusion-bond the particles (B) to surface portions of the carrier (A) in such a manner that multiple particles (B) are stacked in directions perpendicular to the surfaces of the carrier (A), whereby a photocatalyst-bearing material can be produced, which is capable of exhibiting a high photocatalysis for a long period of time. When water is the object of treatment, the specific gravity of the photocatalyst-bearing material is preferably 0.7 to 1.3, especially preferably 0.9 to 1.1.