Patents by Inventor Daishi Tokoyama

Daishi Tokoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive-type photosensitive siloxane composition
    Patent number: 9580567
    Abstract: A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 ?/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.
    Type: Grant
    Filed: November 14, 2013
    Date of Patent: February 28, 2017
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Toshiaki Nonaka, Daishi Tokoyama, Takashi Fuke, Yuji Tashiro
  • POSITIVE-TYPE PHOTOSENSITIVE SILOXANE COMPOSITION
    Publication number: 20150291749
    Abstract: A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 ?/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.
    Type: Application
    Filed: November 14, 2013
    Publication date: October 15, 2015
    Inventors: Toshiaki Nonaka, Daishi Tokoyama, Takashi Fuke, Yuji Tashiro