Patents by Inventor Daisuke Domon

Daisuke Domon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11548844
    Abstract: A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: January 10, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Domon, Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe
  • Patent number: 11500285
    Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: November 15, 2022
    Assignee: International Business Machines Corporation
    Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
  • Patent number: 11429023
    Abstract: A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
    Type: Grant
    Filed: October 17, 2019
    Date of Patent: August 30, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Domon, Naoya Inoue, Masaki Ohashi, Keiichi Masunaga, Masaaki Kotake
  • Patent number: 11131926
    Abstract: The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.
    Type: Grant
    Filed: June 19, 2018
    Date of Patent: September 28, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takahiro Suzuki, Daisuke Domon, Masaaki Kotake, Keiichi Masunaga, Satoshi Watanabe
  • Patent number: 11124477
    Abstract: A novel sulfonium compound has formula (A). A positive resist composition comprising a polymer and a quencher containing the sulfonium compound is improved in resolution and LER during pattern formation and has storage stability. In formula (A), R1, R2, R3, and R4 are independently a C1-C20 monovalent hydrocarbon group, p is an integer of 0-5, q is an integer of 0-5, and r is an integer of 0-4.
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: September 21, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoya Inoue, Masaki Ohashi, Daisuke Domon, Keiichi Masunaga, Masaaki Kotake
  • Patent number: 11048165
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of brominated indole or brominated indazole carboxylic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: June 29, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Daisuke Domon
  • Patent number: 11036136
    Abstract: An onium salt of arenesulfonic acid having a bridged ring-containing group generates a bulky acid having an appropriate strength and controlled diffusion. When a positive resist composition comprising the onium salt and a base polymer is processed by lithography, a pattern of rectangular profile having high resolution and reduced LER is formed.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: June 15, 2021
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoya Inoue, Satoshi Watanabe, Daisuke Domon
  • Patent number: 10968175
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating a brominated benzene-containing sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: April 6, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Daisuke Domon
  • Publication number: 20200278607
    Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
    Type: Application
    Filed: October 11, 2018
    Publication date: September 3, 2020
    Applicants: International Business Machines Corporation, Shin-Etsu Chemical Co., Ltd.
    Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
  • Publication number: 20200133121
    Abstract: A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
    Type: Application
    Filed: October 17, 2019
    Publication date: April 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daisuke Domon, Naoya Inoue, Masaki Ohashi, Keiichi Masunaga, Masaaki Kotake
  • Publication number: 20200071268
    Abstract: A novel sulfonium compound has formula (A). A positive resist composition comprising a polymer and a quencher containing the sulfonium compound is improved in resolution and LER during pattern formation and has storage stability. In formula (A), R1, R2, R3, and R4 are independently a C1-C20 monovalent hydrocarbon group, p is an integer of 0-5, q is an integer of 0-5, and r is an integer of 0-4.
    Type: Application
    Filed: September 4, 2019
    Publication date: March 5, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoya Inoue, Masaki Ohashi, Daisuke Domon, Keiichi Masunaga, Masaaki Kotake
  • Publication number: 20190361347
    Abstract: A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.
    Type: Application
    Filed: May 21, 2019
    Publication date: November 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daisuke Domon, Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe
  • Publication number: 20190361350
    Abstract: An onium salt of arenesulfonic acid having a bridged ring-containing group generates a bulky acid having an appropriate strength and controlled diffusion. When a positive resist composition comprising the onium salt and a base polymer is processed by lithography, a pattern of rectangular profile having high resolution and reduced LER is formed.
    Type: Application
    Filed: May 23, 2019
    Publication date: November 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoya Inoue, Satoshi Watanabe, Daisuke Domon
  • Patent number: 10377842
    Abstract: A polymer comprising recurring units derived from vinylanthraquinone, recurring units containing a benzene ring having a hydroxyl-bearing tertiary alkyl group bonded thereto, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a negative resist composition having a high resolution and minimal LER.
    Type: Grant
    Filed: May 16, 2017
    Date of Patent: August 13, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Daisuke Domon
  • Patent number: 10345700
    Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
    Type: Grant
    Filed: September 8, 2014
    Date of Patent: July 9, 2019
    Assignees: International Business Machines Corporation, Shin-Etsu Chemical Co., Ltd.
    Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
  • Publication number: 20190113843
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating a brominated benzene-containing sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: September 26, 2018
    Publication date: April 18, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Daisuke Domon
  • Publication number: 20190113842
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of brominated indole or brominated indazole carboxylic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: September 26, 2018
    Publication date: April 18, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Daisuke Domon
  • Patent number: 10191372
    Abstract: A polymer comprising recurring units derived from vinylanthraquinone, recurring units derived from acid labile group-substituted hydroxystyrene, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a positive resist composition having a high resolution and minimal LER.
    Type: Grant
    Filed: May 4, 2017
    Date of Patent: January 29, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Daisuke Domon
  • Publication number: 20190010119
    Abstract: The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.
    Type: Application
    Filed: June 19, 2018
    Publication date: January 10, 2019
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takahiro SUZUKI, Daisuke DOMON, Masaaki KOTAKE, Keiichi MASUNAGA, Satoshi WATANABE
  • Patent number: 9969829
    Abstract: The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.
    Type: Grant
    Filed: January 5, 2017
    Date of Patent: May 15, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Domon, Koji Hasegawa, Keiichi Masunaga, Masaaki Kotake