Abstract: A liquid crystal display device includes a first substrate and a second substrate disposed in opposition. The first substrate includes gate lines, data lines, pixel electrodes, and an insulating film being superimposed, in plan view, over the gate lines, the data lines, and the pixel electrodes. The second substrate includes a first colored portion transmitting light of a first color, a second colored portion transmitting light of a second color, and a light-shielding portion disposed in a boundary area between the first colored portion and the second colored portion, for blocking transmittance of light of the first color and light of the second color. The insulating film includes a first portion overlapping, in plan view, the first colored portion or the second colored portion, and a second portion overlapping, in plan view, the light-shielding portion and being of thicker film thickness than the first portion.

Abstract: A liquid crystal display device includes a first substrate and a second substrate disposed in opposition. The first substrate includes gate lines, data lines, pixel electrodes, and an insulating film being superimposed, in plan view, over the gate lines, the data lines, and the pixel electrodes. The second substrate includes a first colored portion transmitting light of a first color, a second colored portion transmitting light of a second color, and a light-shielding portion disposed in a boundary area between the first colored portion and the second colored portion, for blocking transmittance of light of the first color and light of the second color. The insulating film includes a first portion overlapping, in plan view, the first colored portion or the second colored portion, and a second portion overlapping, in plan view, the light-shielding portion and being of thicker film thickness than the first portion.

Abstract: The present invention provides a method of manufacturing an active element substrate aimed at reducing the production costs of an interlayer insulating film made from a spin-on glass material, for example. In the method of manufacturing an active element substrate, an interlayer insulating film is formed using a printing method that employs a plate. The plate includes: a main pattern that overlaps with signal lines that enclose openings; and fine line patterns that reduce, in the widthwise direction of the signal lines, the inclination of the edges of the printed pattern printed by the main pattern.

Abstract: The present invention provides a method of manufacturing an active element substrate aimed at reducing the production costs of an interlayer insulating film made from a spin-on glass material, for example. In the method of manufacturing an active element substrate, an interlayer insulating film is formed using a printing method that employs a plate. The plate includes: a main pattern that overlaps with signal lines that enclose openings; and fine line patterns that reduce, in the widthwise direction of the signal lines, the inclination of the edges of the printed pattern printed by the main pattern.

Abstract: An active matrix substrate of a display device of the present invention includes a glass substrate (30), a plurality of connection terminals (41) formed on the surface of the glass substrate and arranged in parallel with one another at an equal interval, and an interlayer insulating film (38) covering the plurality of connection terminals. The edge of the interlayer insulating film is so formed that tips of the plurality of connection terminals are exposed. An opening (50) is formed along the edge of the interlayer insulating film between two adjacent connection terminals. It is possible to avoid formation of pixel electrode material residue near the edge of the interlayer insulating film when a pixel electrode is formed by photo-etching through the formation of a pixel electrode material layer and a photosensitive resist layer on the interlayer insulating film.

Abstract: An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes a step of performing position correction of the photomask by performing, on a front side of the photomask relatively moved in a moving direction, image recognition of a pattern prearranged on the substrate such as a line and a black matrix and by correcting deviation of the photomask with respect to the pattern, and a step of checking the position correction of the photomask by performing image recognition of a reference mark arranged on the photomask and by determining whether or not the position correction of the photomask is accurately performed in the step of performing the position correction of the photomask.

Abstract: An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes a step of performing position correction of the photomask by performing, on a front side of the photomask relatively moved in a moving direction, image recognition of a pattern prearranged on the substrate such as a line and a black matrix and by correcting deviation of the photomask with respect to the pattern, and a step of checking the position correction of the photomask by performing image recognition of a reference mark arranged on the photomask and by determining whether or not the position correction of the photomask is accurately performed in the step of performing the position correction of the photomask.

Abstract: An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes a step of performing position correction of the photomask by performing, on a front side of the photomask relatively moved in a moving direction, image recognition of a pattern prearranged on the substrate such as a line and a black matrix and by correcting deviation of the photomask with respect to the pattern, and a step of checking the position correction of the photomask by performing image recognition of a reference mark arranged on the photomask and by determining whether or not the position correction of the photomask is accurately performed in the step of performing the position correction of the photomask.

Abstract: An active matrix substrate of a display device of the present invention comprises a glass substrate, a plurality of connection terminals (41) formed on the surface of the glass substrate and arranged in parallel with one another at an equal interval, and an interlayer insulating film (38) covering the plurality of connection terminals. The edge of the interlayer insulating film is so formed that tips of the plurality of connection terminals are exposed. A notch (42) is formed along the edge of the interlayer insulating film between two adjacent connection terminals. The notch has a stepped portion (46) comprising the first face (43), which is the bottom face of the notch, the second face (44), which is at a higher level than the first face, and a sloped face (45), which continues from the first face to the second face.

Abstract: An active matrix substrate of a display device of the present invention includes a glass substrate (30), a plurality of connection terminals (41) formed on the surface of the glass substrate and arranged in parallel with one another at an equal interval, and an interlayer insulating film (38) covering the plurality of connection terminals. The edge of the interlayer insulating film is so formed that tips of the plurality of connection terminals are exposed. An opening (50) is formed along the edge of the interlayer insulating film between two adjacent connection terminals. It is possible to avoid formation of pixel electrode material residue near the edge of the interlayer insulating film when a pixel electrode is formed by photo-etching through the formation of a pixel electrode material layer and a photosensitive resist layer on the interlayer insulating film.

Abstract: An active matrix substrate of a display device of the present invention includes a glass substrate (30), a plurality of connection terminals (41) formed on the surface of the glass substrate and arranged in parallel with one another at an equal interval, and an interlayer insulating film (38) covering the plurality of connection terminals. The edge of the interlayer insulating film is so formed that tips of the plurality of connection terminals are exposed. A plurality of openings (58) are formed along the edge of the interlayer insulating film between two adjacent connection terminals. Each opening extends from a region between two adjacent connection terminals towards and over one of the two adjacent connection terminals.

Abstract: An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes a step of performing position correction of the photomask by performing, on a front side of the photomask relatively moved in a moving direction, image recognition of a pattern prearranged on the substrate such as a line and a black matrix and by correcting deviation of the photomask with respect to the pattern, and a step of checking the position correction of the photomask by performing image recognition of a reference mark arranged on the photomask and by determining whether or not the position correction of the photomask is accurately performed in the step of performing the position correction of the photomask.