Patents by Inventor Daisuke Hanai

Daisuke Hanai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090143443
    Abstract: The present invention is directed to novel cyclic amine compounds represented by the formula [I]: wherein R1 represents, but is not limited to, a hydroxyl, a halogen atom, a cyano group, a nitro group, a formyl group, a C1-6 alkyl group, a C2-6 alkenyl group, a C2-6 alkynyl group, a C1-6 haloalkyl group, a C1-6 haloalkenyl group, a C1-6 alkylcarbonyl group, among other substituents; R2 represents a halogen atom, a nitro group, a C1-6 alkyl group, a C1-6 alkoxy group, a C1-6 haloalkyl group, a five or six membered heterocyclic group having at least one hetero atom selected from an oxygen atom, a nitrogen atom, and a sulfur atom, k represents 0 or an integer of 1 to 4; R3, R31, R4, R41, R5, R51, and R7 each independently represents a hydrogen atom, a C1-6 alkyl group, a C1-6 alkoxycarbonyl group, or a C1-6 alkoxy group, and, both R3 and R4, may be bound together to form a saturated ring, X represents an oxygen atom, a sulfur atom, a sulfinyl group, or a sulfonyl group, a salt or an N-oxide of the chemica
    Type: Application
    Filed: December 11, 2008
    Publication date: June 4, 2009
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Isami Hamamoto, Jun Takahashi, Makio Yano, Daisuke Hanai, Takao Iwasa
  • Patent number: 7485727
    Abstract: A chemical compound represented by the formula [I]: (wherein R1 represents a hydroxyl group or the like, m represents 0 or an integer of 1 to 5, R2 represents a halogen atom or the like, k represents 0 or an integer of 1 to 4, R3, R31, R4, R41, R5, R51, R6, R61, and R7 each independently represents a hydrogen atom or the like, but both R3 and R4, or both R5 and R6, are bound together to form an azabicyclooctane core or an azabicyclononane core, X represents an oxygen atom or the like, and n represents 1), a salt, an N-oxide of the chemical compound represented by formula [I], and a pest control agent containing the formula [I] as its active constituent.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: February 3, 2009
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Isami Hamamoto, Jun Takahashi, Makio Yano, Daisuke Hanai, Takao Iwasa
  • Publication number: 20080319003
    Abstract: A chemical compound represented by the formula [I]: (wherein R1 represents a hydroxyl group or the like, m represents 0 or an integer of 1 to 5, R2 represents a halogen atom or the like, k represents 0 or an integer of 1 to 4, R3, R31, R4, R41, R5, R51, R6, R61, and R7 each independently represents a hydrogen atom or the like, X represents an oxygen atom or the like, and n represents 1), a salt, an N-oxide of the chemical compound represented by formula [I], and a pest control agent containing the formula [I] as its active constituent.
    Type: Application
    Filed: June 19, 2008
    Publication date: December 25, 2008
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Isami Hamamoto, Jun Takahashi, Makio Yano, Daisuke Hanai, Takao Iwasa
  • Publication number: 20080045569
    Abstract: A chemical compound represented by the formula [I]: (wherein R1 represents a hydroxyl group or the like, m represents 0 or an integer of 1 to 5, R2 represents a halogen atom or the like, k represents 0 or an integer of 1 to 4, R3, R31, R4, R41, R5, R51, R6, R61, and R7 each independently represents a hydrogen atom or the like, X represents an oxygen atom or the like, and n represents 0 or 1), a salt, an N-oxide of the chemical compound represented by formula [I], and a pest control agent containing the formula [I] as its active constituent.
    Type: Application
    Filed: March 30, 2005
    Publication date: February 21, 2008
    Applicant: Nippon Soda Co., Ltd.
    Inventors: Isami Hamamoto, Jun Takahashi, Makio Yano, Daisuke Hanai, Takao Iwasa
  • Publication number: 20070163621
    Abstract: An object is to provide a cleaning member for semiconductor apparatus which can easily remove, without fail, foreign matters adherent to inner parts of a semiconductor apparatus, can bear a clearly readable mark for lot management, and can be prevented from generating particles upon contact with the holding part of a wafer case. A cleaning member for semiconductor apparatus, characterized in that the cleaning member comprises a wafer 1 and formed on at least one side thereof a cleaning layer 2 made of a heat-resistant resin formed by thermally curing a poly(amic acid), and that the cleaning layer 2 has a part 12 where a wafer surface is exposed; and in particular a cleaning member for semiconductor apparatus having the constitution described above wherein that part 12 in the cleaning layer 2 in which a wafer surface is exposed is a part where the cleaning layer has been removed throughout the whole circular area having a given width ranging from the peripheral edge of the wafer toward the center thereof.
    Type: Application
    Filed: March 7, 2005
    Publication date: July 19, 2007
    Applicant: Nitto Denko Corporation
    Inventors: Hitoshi Ishizaka, Daisuke Uenda, Daisuke Hanai
  • Patent number: 6987112
    Abstract: The present invention is directed to compounds represented by Formula (1); wherein A, R, X, Y and n are as defined in the description, the salts thereof, and insecticide/acaricide compositions characterized by comprising one or more of said compounds and/or said salts as the active ingredients.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: January 17, 2006
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Yasushi Shibata, Renpei Hatano, Takao Iwasa, Satoru Makita, Daisuke Hanai, Masao Yamaguchi, Naomi Ichikawa
  • Publication number: 20040072826
    Abstract: The present invention is directed to compounds represented by Formula (1); 1
    Type: Application
    Filed: October 8, 2003
    Publication date: April 15, 2004
    Inventors: Yasushi Shibata, Renpei Hatano, Takao Iwasa, Satoru Makita, Daisuke Hanai, Masao Yamaguchi, Naomi Ichikawa