Patents by Inventor Daisuke Hiramaru

Daisuke Hiramaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190119650
    Abstract: The present invention is a method in which stem cells for which a differentiation state is unknown or cells that are differentiation-induced from the stem cells are use as test cells, and a differentiation state of the test cells is evaluated based on an abundance of a predetermined indicator substance in a culture supernatant of the test cells. The indicator substance is at least one compound selected from a group that consists of ornithine, 2-aminoadipic acid, deoxycytidine, glutamic acid, tryptophan, asparagine, alanine, cystine, hypoxanthine, uridine, aspartic acid, arginine, 2-hydroxybutyric acid, 2-hydroxyisovaleric acid, 3-hydroxyisovaleric acid, urea, 4-hydroxybenzoic acid, 4-aminobenzoic acid, ribonic acid, kynurenine, crystathionine, threonic acid, pyruvic acid, putrescine, ascorbic acid, riboflavin, serine, cysteine, orotic acid, and citric acid.
    Type: Application
    Filed: March 16, 2016
    Publication date: April 25, 2019
    Applicants: SHIMADZU CORPORATION, TOKYO ELECTRON LIMITED
    Inventors: Takashi SUZUKI, Daisuke HIRAMARU, Masatoshi TAKAHASHI, Kentaro TOMITA, Kunitada HATABAYASHI, Kenichi KAGAWA, Shigenori OZAKI
  • Patent number: 8871433
    Abstract: The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps. A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42).
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: October 28, 2014
    Assignees: Kyoto University, Kagawa University
    Inventors: Takaaki Suzuki, Hidetoshi Kotera, Isaku Kanno, Daisuke Hiramaru
  • Publication number: 20120214104
    Abstract: The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps. A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42).
    Type: Application
    Filed: October 14, 2010
    Publication date: August 23, 2012
    Applicants: KAGAWA UNIVERSITY, KYOTO UNIVERSITY
    Inventors: Takaaki Suzuki, Hidetoshi Kotera, Isaku Kanno, Daisuke Hiramaru