Patents by Inventor Daisuke ICHIHARA

Daisuke ICHIHARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma accelerating apparatus and plasma accelerating method
    Patent number: 10436183
    Abstract: A plasma accelerating apparatus includes: a cathode (11) configured to supply electrons to a plasma acceleration region; an anode (12); a power supply (13) configured to apply a voltage between the cathode and the anode; a supply port (14) arranged on an outer circumference side of the cathode to supply a propellant to the plasma acceleration region; and a first magnetic field generator (15) configured to generate a first axial direction magnetic field in the upstream side region of the plasma acceleration region to suppress electrons supplied from the cathode from heading for the anode. Thus, the plasma accelerating apparatus and the plasma accelerating method having high thrust efficiency is provided.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: October 8, 2019
    Assignees: MITSUBISHI HEAVY INDUSTRIES, LTD., NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Takuya Yamazaki, Matsutaka Sasahara, Tomoji Iwasaki, Masaaki Yasui, Akihiro Sasoh, Akira Iwakawa, Daisuke Ichihara, Keisuke Mizutani
  • PLASMA ACCELERATING APPARATUS AND PLASMA ACCELERATING METHOD
    Publication number: 20190010933
    Abstract: A plasma accelerating apparatus includes: a cathode (11) configured to supply electrons to a plasma acceleration region; a anode (12); a power supply (13) configured to apply a voltage between the cathode and the anode; a supply port (14) arranged on an outer circumference side than the cathode to supply a propellant to the plasma acceleration region; and a first magnetic field generator (15) configured to generate a first axial direction magnetic field in the upstream side region of the plasma acceleration region to suppress that the electrons supplied from the cathode head for the anode. Thus, the plasma accelerating apparatus and the plasma accelerating method having high thrust efficiency can be provided.
    Type: Application
    Filed: January 6, 2017
    Publication date: January 10, 2019
    Applicants: MITSUBISHI HEAVY INDUSTRIES, LTD., National University Corporation Nagoya University
    Inventors: Takuya YAMAZAKI, Matsutaka SASAHARA, Tomoji IWASAKI, Masaaki YASUI, Akihiro SASOH, Akira IWAKAWA, Daisuke ICHIHARA, Keisuke MIZUTANI