Patents by Inventor Daisuke Ishimaru
Daisuke Ishimaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11759870Abstract: According to one implementation, an end mill for orbital drilling includes: a shank; a first cutting edge formed in a peripheral portion of the shank; and a second cutting edge formed in a bottom portion of the shank. At least a chamfered edge is formed on a first ridgeline between a first rake face and a first flank of the first cutting edge.Type: GrantFiled: April 14, 2020Date of Patent: September 19, 2023Assignee: SUBARU CORPORATIONInventor: Daisuke Ishimaru
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Patent number: 11333142Abstract: There is disclosed a hollow tube body used for a liquid feeding member and deformable by pressurization, wherein: an axial cross-section of the tube body has two opposing long side parts and two opposing short side parts; four corner portions formed by the long side parts and the short side parts each have a shape curved to protrude outward; each of the long side parts has a recessed part recessed inward and continuing from the corner portions; and a portion other than the corner portions of each of the short side parts is in a flat shape.Type: GrantFiled: January 29, 2020Date of Patent: May 17, 2022Assignee: Tokyo Electron LimitedInventors: Daisuke Ishimaru, Katsuya Hashimoto, Yasuhiro Takaki
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Publication number: 20210020464Abstract: A substrate processing apparatus includes a discharge part including a nozzle configured to discharge a processing liquid onto a substrate; a liquid feeder configured to feed the processing liquid to the discharge part; a replenishment part configured to replenish the liquid feeder with the processing liquid to be fed to the discharge part; a connector including a switching valve configured to open/close a flow path between the replenishment part and the liquid feeder; a filter configured to remove foreign matters contained in the processing liquid; a replenishment preparation part configured to open the switching valve after reducing a pressure difference between the inside of the replenishment part and the liquid feeder; and a replenishment controller configured to start replenishment of the processing liquid from the replenishment part to the liquid feeder in a state in which the switching valve is opened by the replenishment preparation part.Type: ApplicationFiled: July 16, 2020Publication date: January 21, 2021Inventors: Masayuki KAJIWARA, Katsunori ICHINO, Daisuke ISHIMARU, Takuya TAJIRI, Atsushi YAMAMOTO, Masato IMAMURA, Tomohiko MUTA, Tetsuro IRIYAMA, Takeaki SAKAMOTO, Hiroki OKAGUCHI, Kenji ADACHI
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Publication number: 20200406377Abstract: According to one implementation, an end mill for orbital drilling includes: a shank; a first cutting edge formed in a peripheral portion of the shank; and a second cutting edge formed in a bottom portion of the shank. At least a chamfered edge is formed on a first ridgeline between a first rake face and a first flank of the first cutting edge.Type: ApplicationFiled: April 14, 2020Publication date: December 31, 2020Applicant: SUBARU CORPORATIONInventor: Daisuke ISHIMARU
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Publication number: 20200256330Abstract: There is disclosed a hollow tube body used for a liquid feeding member and deformable by pressurization, wherein: an axial cross-section of the tube body has two opposing long side parts and two opposing short side parts; four corner portions formed by the long side parts and the short side parts each have a shape curved to protrude outward; each of the long side parts has a recessed part recessed inward and continuing from the corner portions; and a portion other than the corner portions of each of the short side parts is in a flat shape.Type: ApplicationFiled: January 29, 2020Publication date: August 13, 2020Inventors: Daisuke ISHIMARU, Katsuya HASHIMOTO, Yasuhiro TAKAKI
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Patent number: 10655619Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.Type: GrantFiled: October 21, 2015Date of Patent: May 19, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Takashi Sasa, Daisuke Ishimaru, Takahiro Okubo, Tomoyuki Yumoto, Tomohiko Muta
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Patent number: 10518199Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.Type: GrantFiled: September 6, 2017Date of Patent: December 31, 2019Assignee: Tokyo Electron LimitedInventors: Takashi Sasa, Daisuke Ishimaru, Katsuya Hashimoto, Hideo Shite, Shinya Wakamizu, Kazuhiko Kimura
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Patent number: 10268116Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.Type: GrantFiled: November 17, 2017Date of Patent: April 23, 2019Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
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Publication number: 20180074407Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.Type: ApplicationFiled: November 17, 2017Publication date: March 15, 2018Applicant: Tokyo Electron LimitedInventors: Kousuke YOSHIHARA, Koji TAKAYANAGI, Toshinobu FURUSHO, Takashi SASA, Daisuke ISHIMARU
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Publication number: 20180065065Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.Type: ApplicationFiled: September 6, 2017Publication date: March 8, 2018Inventors: Takashi SASA, Daisuke ISHIMARU, Katsuya HASHIMOTO, Hideo SHITE, Shinya WAKAMIZU, Kazuhiko KIMURA
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Patent number: 9846363Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.Type: GrantFiled: October 30, 2014Date of Patent: December 19, 2017Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
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Patent number: 9778571Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.Type: GrantFiled: November 20, 2014Date of Patent: October 3, 2017Assignee: Tokyo Electron LimitedInventors: Takashi Sasa, Daisuke Ishimaru
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Publication number: 20160115952Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.Type: ApplicationFiled: October 21, 2015Publication date: April 28, 2016Inventors: Takashi Sasa, Daisuke Ishimaru, Takahiro Okubo, Tomoyuki Yumoto, Tomohiko Muta
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Publication number: 20150140485Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.Type: ApplicationFiled: November 20, 2014Publication date: May 21, 2015Inventors: Takashi SASA, Daisuke ISHIMARU
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Publication number: 20150125793Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.Type: ApplicationFiled: October 30, 2014Publication date: May 7, 2015Inventors: Kousuke YOSHIHARA, Koji TAKAYANAGI, Toshinobu FURUSHO, Takashi SASA, Daisuke ISHIMARU
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Patent number: 8707893Abstract: A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.Type: GrantFiled: November 18, 2011Date of Patent: April 29, 2014Assignee: Tokyo Electron LimitedInventors: Masatoshi Deguchi, Hideo Funakoshi, Toshichika Takei, Norifumi Sato, Wataru Kiyota, Daisuke Ishimaru, Shinichi Machidori, Ikuo Sunaka, Shigenori Kamei
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Publication number: 20120135148Abstract: A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.Type: ApplicationFiled: November 18, 2011Publication date: May 31, 2012Applicant: TOKYO ELECTRON LIMITEDInventors: Masatoshi Deguchi, Hideo Funakoshi, Toshichika Takei, Norifumi Sato, Wataru Kiyota, Daisuke Ishimaru, Shinichi Machidori, Ikuo Sunaka, Shigenori Kamei