Patents by Inventor Daisuke Ishimaru

Daisuke Ishimaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10655619
    Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: May 19, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takashi Sasa, Daisuke Ishimaru, Takahiro Okubo, Tomoyuki Yumoto, Tomohiko Muta
  • Patent number: 10570117
    Abstract: Phenylimidazole compounds of formula (1) shown below and pharmaceutically acceptable salts thereof: Also disclosed are a pharmaceutical composition and a lipoprotein lipase activator, each containing one of the phenylimidazole compounds.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: February 25, 2020
    Assignee: Otsuka Pharmaceutical Factory, Inc.
    Inventors: Koushi Iwata, Tadao Shibutani, Satoshi Kido, Daisuke Mori, Hidenori Yoshioka, Hikaru Nakata, Akiko Ishimaru
  • Patent number: 10518199
    Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: December 31, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Takashi Sasa, Daisuke Ishimaru, Katsuya Hashimoto, Hideo Shite, Shinya Wakamizu, Kazuhiko Kimura
  • Patent number: 10268116
    Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: April 23, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
  • Publication number: 20180074407
    Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
    Type: Application
    Filed: November 17, 2017
    Publication date: March 15, 2018
    Applicant: Tokyo Electron Limited
    Inventors: Kousuke YOSHIHARA, Koji TAKAYANAGI, Toshinobu FURUSHO, Takashi SASA, Daisuke ISHIMARU
  • Publication number: 20180065065
    Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.
    Type: Application
    Filed: September 6, 2017
    Publication date: March 8, 2018
    Inventors: Takashi SASA, Daisuke ISHIMARU, Katsuya HASHIMOTO, Hideo SHITE, Shinya WAKAMIZU, Kazuhiko KIMURA
  • Patent number: 9846363
    Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: December 19, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Koji Takayanagi, Toshinobu Furusho, Takashi Sasa, Daisuke Ishimaru
  • Patent number: 9778571
    Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: October 3, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Takashi Sasa, Daisuke Ishimaru
  • Publication number: 20160115952
    Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.
    Type: Application
    Filed: October 21, 2015
    Publication date: April 28, 2016
    Inventors: Takashi Sasa, Daisuke Ishimaru, Takahiro Okubo, Tomoyuki Yumoto, Tomohiko Muta
  • Publication number: 20150140485
    Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.
    Type: Application
    Filed: November 20, 2014
    Publication date: May 21, 2015
    Inventors: Takashi SASA, Daisuke ISHIMARU
  • Publication number: 20150125793
    Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
    Type: Application
    Filed: October 30, 2014
    Publication date: May 7, 2015
    Inventors: Kousuke YOSHIHARA, Koji TAKAYANAGI, Toshinobu FURUSHO, Takashi SASA, Daisuke ISHIMARU
  • Patent number: 8707893
    Abstract: A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: April 29, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Masatoshi Deguchi, Hideo Funakoshi, Toshichika Takei, Norifumi Sato, Wataru Kiyota, Daisuke Ishimaru, Shinichi Machidori, Ikuo Sunaka, Shigenori Kamei
  • Publication number: 20120135148
    Abstract: A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.
    Type: Application
    Filed: November 18, 2011
    Publication date: May 31, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masatoshi Deguchi, Hideo Funakoshi, Toshichika Takei, Norifumi Sato, Wataru Kiyota, Daisuke Ishimaru, Shinichi Machidori, Ikuo Sunaka, Shigenori Kamei