Abstract: A deposition device for a display device includes: a chamber, a deposition source in the chamber, a stage on the deposition source; a mask structure on the stage; a substrate tray on the mask structure; a magnet plate on the substrate tray; a transport track passing through a first gate of the chamber and a second gate of the chamber and disposed inside the chamber and outside the chamber, a first carrier transporting the mask structure along the transport track; and a second carrier transporting the substrate tray along the transport track.

Abstract: An embodiment relates to a device for changing a position of a carrier for manufacturing a display device. The device includes: a driving object disposed under a transport unit for transporting the carrier in which a substrate and a substrate tray are accommodated; a first rotating object connected to a first side of the driving object; a second rotating object connected to a second side of the driving object, opposite to the first side; a connecting portion connecting the first rotating object and the second rotating object to each other; and a support member on the connecting portion.

Abstract: A substrate processing apparatus and a substrate processing method are disclosed. A substrate processing method includes loading a substrate into a first load-lock chamber, loading the substrate and a carrier into a coupling chamber including a first transferer, seating the substrate on a first stage connected to the first transferer, transferring the carrier in a first direction using the first transferer and coupling the carrier with the substrate seated on the first stage concurrently, and unloading the substrate and the carrier from the coupling chamber.

Abstract: An alignment apparatus according to the embodiments includes a plate, first to fourth connectors, first to third supports, a first driver, and a first holder. The first holder is configured to hold a tray on which a substrate is accommodated. The alignment apparatus may adjust a position and an angle of the tray in six degrees of freedom to more precisely align a mask and the substrate with each other.

Abstract: A vacuum processing apparatus including: a plurality of transport chambers arranged in order along a first direction; a plurality of process chambers connected to the transport chambers along a second direction that is perpendicular to the first direction; and a position conversion chamber connected to a first transport chamber among the transport chambers. The transport chambers include a rotational movement stage that rotates about a rotation axis that is perpendicular to the first direction and the second direction, and moves along a plane formed by the first direction and the second direction.

Abstract: A vacuum processing apparatus including: a plurality of transport chambers arranged in order along a first direction; a plurality of process chambers connected to the transport chambers along a second direction that is perpendicular to the first direction; and a position conversion chamber connected to a first transport chamber among the transport chambers. The transport chambers include a rotational movement stage that rotates about a rotation axis that is perpendicular to the first direction and the second direction, and moves along a plane formed by the first direction and the second direction.

Abstract: An ultrasonic probe including a unit that changes a quantity of light emitted on a subject.

Abstract: The present invention provides a lithography apparatus that forms a pattern on a substrate, the apparatus comprising a base, a stage configured to hold the substrate and be movable above the base with the stage supported by the base, a patterning device configured to perform patterning on the substrate held by the stage, a chamber housing the base and the stage, and supporting the patterning device, a detector configured to obtain information of relative positions between the patterning device and the base, a driving device configured to move the base, and a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.

Abstract: A processing apparatus configured to conduct a prescribed processing on an object to be processed in a specific environment, the processing apparatus comprising: a chamber configured to have an aperture and an interior accommodated to a specific environment; a mechanism of which at least a portion is contained within the chamber interior, while a remaining portion passes through the aperture without contacting the chamber; at least one support member configured to support the mechanism; a sealing member that configures a boundary of the specific environment and an atmospheric environment by connecting one end to the aperture and connecting the other end to the support member; and a rotary member configured to allow relative rotation around a vertical axis between the support member and a structure that supports the support member.

Abstract: The present invention provides a lithography apparatus that forms a pattern on a substrate, the apparatus comprising a base, a stage configured to hold the substrate and be movable above the base with the stage supported by the base, a patterning device configured to perform patterning on the substrate held by the stage, a chamber housing the base and the stage, and supporting the patterning device, a detector configured to obtain information of relative positions between the patterning device and the base, a driving device configured to move the base, and a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.

Abstract: A processing apparatus configured to conduct a prescribed processing on an object to be processed in a specific environment, the processing apparatus comprising: a chamber configured to have an aperture and an interior accommodated to a specific environment; a mechanism of which at least a portion is contained within the chamber interior, while a remaining portion passes through the aperture without contacting the chamber; at least one support member configured to support the mechanism; a sealing member that configures a boundary of the specific environment and an atmospheric environment by connecting one end to the aperture and connecting the other end to the support member; and a rotary member configured to allow relative rotation around a vertical axis between the support member and a structure that supports the support member.