Patents by Inventor Daisuke KAYAKUBO

Daisuke KAYAKUBO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230364174
    Abstract: In an aspect, the present disclosure provides a method for producing an extract composition by which polyphenols such as apigenin and/or essential oil components such as spiro-ether can be efficiently extracted from harvested herbaceous plants. An aspect of the present disclosure is directed to a method for producing an extract composition, including processes (1) and (2) below: (1) applying an oxidative stress to a harvested herbaceous plant and preserving it; and (2) obtaining an extract from the herbaceous plant that has undergone the process (1).
    Type: Application
    Filed: September 30, 2021
    Publication date: November 16, 2023
    Applicant: Kao Corporation
    Inventors: Haruhiko DOI, Daisuke KAYAKUBO, Yuka YAMAZAWA
  • Patent number: 11028343
    Abstract: In one aspect, provided is a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition having excellent cleaning properties against ceria and being capable of reducing a temporal change in the solubility of ceria. In one aspect, the present disclosure relates to a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition containing a component A, a component B, a component C, and a component D, the component A being sulfuric acid; the component B being ascorbic acid; the component C being at least one of thiourea and dithiothreitol and the component D being water.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: June 8, 2021
    Assignee: KAO CORPORATION
    Inventors: Daisuke Kayakubo, Jun Naganuma
  • Publication number: 20210130739
    Abstract: In one aspect, provided is a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition having excellent cleaning properties against ceria and being capable of reducing a temporal change in the solubility of ceria. In one aspect, the present disclosure relates to a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition containing a component A, a component B, a component C, and a component D, the component A being sulfuric acid; the component B being ascorbic acid; the component C being at least one of thiourea and dithiothreitol; and the component D being water.
    Type: Application
    Filed: December 22, 2017
    Publication date: May 6, 2021
    Applicant: KAO CORPORATION
    Inventors: Daisuke KAYAKUBO, Jun NAGANUMA