Patents by Inventor Daisuke MINOSHIMA

Daisuke MINOSHIMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning apparatus, substrate cleaning method, and control method of substrate cleaning apparatus
    Patent number: 10985037
    Abstract: Various examples regarding substrate cleaning apparatus and methods, and related apparatus and method are disclosed. According to one embodiment, provided is a substrate cleaning apparatus including: a substrate holding and rotating module; an elongated cleaning member configured to come into contact with the substrate while the substrate is held and rotated by the substrate holding and rotating module; and a first nozzle and a second nozzle, both of which are arranged on an identical side with respect to a longitudinal direction of the cleaning member, wherein the first nozzle is operably adjusted to supply liquid more forcefully than liquid from the second nozzle, and the first nozzle is arranged so that the liquid from the first nozzle is reached to a first area located closer to the first nozzle than the cleaning member in the substrate.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: April 20, 2021
    Assignee: EBARA CORPORATION
    Inventors: Daisuke Minoshima, Masayoshi Imai
  • SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND CONTROL METHOD OF SUBSTRATE CLEANING APPARATUS
    Publication number: 20180294171
    Abstract: Various examples regarding substrate cleaning apparatus and methods, and related apparatus and method are disclosed. According to one embodiment, provided is a substrate cleaning apparatus including: a substrate holding and rotating module; an elongated cleaning member configured to come into contact with the substrate while the substrate is held and rotated by the substrate holding and rotating module; and a first nozzle and a second nozzle, both of which are arranged on an identical side with respect to a longitudinal direction of the cleaning member, wherein the first nozzle is operably adjusted to supply liquid more forcefully than liquid from the second nozzle, and the first nozzle is arranged so that the liquid from the first nozzle is reached to a first area located closer to the first nozzle than the cleaning member in the substrate.
    Type: Application
    Filed: April 3, 2018
    Publication date: October 11, 2018
    Inventors: Daisuke MINOSHIMA, Masayoshi IMAI