Patents by Inventor Daisuke Motomura

Daisuke Motomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240158959
    Abstract: A woven fabric for airbags has a high quality that can suppress generation of creases during refining, heat setting, and coating steps to be performed after weaving, has an excellent uniform applicability, and can suppress misalignment during cutting. A woven fabric for airbags consists of synthetic fibers, wherein a ratio of a selvedge flare amount R represented by equation (1) is 5.0% or less S=?k=1n(Wk×Hk)/2 R=S/(200×F)×100??(1) wherein, S=selvedge flare amount, in cm2, Wk=selvedge flare width, in cm, Hk=selvedge flare depth, in cm, n is the number of selvedge flares, R is a ratio of a selvedge flare amount, in %, and F is a base fabric width, in cm.
    Type: Application
    Filed: February 18, 2022
    Publication date: May 16, 2024
    Inventors: Yuta Suganuma, Hiroki Motomura, Daisuke Yokoi, Yusuke Egawa
  • Patent number: 11084941
    Abstract: Provided are an underfill material capable of realizing low-pressure mounting and voidless mounting, and a method for manufacturing a semiconductor device using the same. The underfill material includes a main composition containing an acrylic polymer, an acrylic monomer, and a maleimide compound, and the acrylic polymer is contained in a range of 10 parts by mass or more and 60 parts by mass or less in 100 parts by mass of the main composition, and the maleimide compound is contained in a range of 20 parts by mass or more and 70 parts by mass or less in 100 parts by mass of the main composition. Low-pressure mounting and the voidless mounting can be realized.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: August 10, 2021
    Assignee: DEXERIALS CORPORATION
    Inventor: Daisuke Motomura
  • Publication number: 20200109292
    Abstract: Provided are an underfill material capable of realizing low-pressure mounting and voidless mounting, and a method for manufacturing a semiconductor device using the same. The underfill material includes a main composition containing an acrylic polymer, an acrylic monomer, and a maleimide compound, and the acrylic polymer is contained in a range of 10 parts by mass or more and 60 parts by mass or less in 100 parts by mass of the main composition, and the maleimide compound is contained in a range of 20 parts by mass or more and 70 parts by mass or less in 100 parts by mass of the main composition. Low-pressure mounting and the voidless mounting can be realized.
    Type: Application
    Filed: November 18, 2019
    Publication date: April 9, 2020
    Applicant: DEXERIALS CORPORATION
    Inventor: Daisuke MOTOMURA
  • Patent number: 9228116
    Abstract: A thermosetting resin composition has good storage properties at room temperature and an unreacted epoxy resin etc. are less likely to exude therefrom during heat compression molding. The thermosetting resin composition contains an acrylic copolymer including an epoxy group-containing (meth)acrylate unit, an epoxy resin, and a curing agent for an epoxy resin. In this thermosetting resin composition, epoxy groups in at least the acrylic copolymer are partially cross-linked with an amine compound and a thiol compound having 2 to 4 thiol groups per molecule, and the curing agent for an epoxy resin is an organic acid dihydrazide.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: January 5, 2016
    Assignee: DEXERIALS CORPORATION
    Inventor: Daisuke Motomura
  • Publication number: 20150111035
    Abstract: A thermosetting resin composition has good storage properties at room temperature and an unreacted epoxy resin etc. are less likely to exude therefrom during heat compression molding. The thermosetting resin composition contains an acrylic copolymer including an epoxy group-containing (meth)acrylate unit, an epoxy resin, and a curing agent for an epoxy resin. In this thermosetting resin composition, epoxy groups in at least the acrylic copolymer are partially cross-linked with an amine compound and a thiol compound having 2 to 4 thiol groups per molecule, and the curing agent for an epoxy resin is an organic acid dihydrazide.
    Type: Application
    Filed: May 28, 2013
    Publication date: April 23, 2015
    Applicant: Dexerials Corporation
    Inventor: Daisuke Motomura
  • Patent number: 8158640
    Abstract: A novel compound of the formula (I): wherein R1 is alkoxycarbonyl or the like, R2 is alkyl or the like; R3 is hydrogen or the like; R4 is alkylene or the like; R5 is optionally substituted heterocyclic group; R6, R7, R8 and R9 are independently hydrogen; alkyl, alkoxy, or the like; R10 is optionally substituted aromatic ring, or the like; or a pharmaceutically acceptable salt thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP).
    Type: Grant
    Filed: October 25, 2010
    Date of Patent: April 17, 2012
    Assignee: Mitsubishi Tanabe Pharma Corporation
    Inventors: Hitoshi Kubota, Masakatsu Sugahara, Mariko Furukawa, Mayumi Takano, Daisuke Motomura
  • Publication number: 20110039828
    Abstract: A novel compound of the formula (I): wherein R1 is alkoxycarbonyl or the like, R2 is alkyl or the like; R3 is hydrogen or the like; R4 is alkylene or the like; R5 is optionally substituted heterocyclic group; R6, R7, R8 and R9 are independently hydrogen; alkyl, alkoxy, or the like; R10 is optionally substituted aromatic ring, or the like; or a pharmaceutically acceptable salt thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP).
    Type: Application
    Filed: October 25, 2010
    Publication date: February 17, 2011
    Inventors: Hitoshi KUBOTA, Masakatsu Sugahara, Mariko Furukawa, Mayumi Takano, Daisuke Motomura
  • Patent number: 7872126
    Abstract: A novel compound of the formula (I): wherein R1 is alkoxycarbonyl or the like, R2 is alkyl or the like; R3 is hydrogen or the like; R4 is alkylene or the like; R5 is optionally substituted heterocyclic group; R6, R7, R8 and R9 are independently hydrogen; alkyl, alkoxy, or the like; R10 is optionally substituted aromatic ring, or the like; or a pharmaceutically acceptable salt thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP).
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: January 18, 2011
    Assignee: Mitsubishi Tanabe Pharma Corporation
    Inventors: Hitoshi Kubota, Masakatsu Sugahara, Mariko Furukawa, Mayumi Takano, Daisuke Motomura
  • Publication number: 20070082896
    Abstract: A novel compound of the formula (I): wherein R1 is alkoxycarbonyl or the like, R2 is alkyl or the like; R3 is hydrogen or the like; R4 is alkylene or the like; R5 is optionally substituted heterocyclic group; R6, R7, R8 and R9 are independently hydrogen; alkyl, alkoxy, or the like; R10 is optionally substituted aromatic ring, or the like; or a pharmaceutically acceptable salt thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP).
    Type: Application
    Filed: September 27, 2006
    Publication date: April 12, 2007
    Inventors: Hitoshi Kubota, Masakatsu Sugahara, Mariko Furukawa, Mayumi Takano, Daisuke Motomura