Abstract: To provide a charged particle radiation apparatus including a soundproof cover that highly realizes both suppression of image defects due to a specific frequency and improvement in quake resistance. A charged particle radiation apparatus including a box-shaped soundproof cover having a plurality of wall surfaces, the soundproof cover including a plurality of columnar bodies forming a frame of the box shape body and a box-shaped acoustic energy absorbing structure provided in a connecting part of the plurality of columnar bodies and attached to support at least the two columnar bodies, is proposed.

Abstract: To provide a charged particle radiation apparatus including a soundproof cover that highly realizes both suppression of image defects due to a specific frequency and improvement in quake resistance. A charged particle radiation apparatus including a box-shaped soundproof cover having a plurality of wall surfaces, the soundproof cover including a plurality of columnar bodies forming a frame of the box shape body and a box-shaped acoustic energy absorbing structure provided in a connecting part of the plurality of columnar bodies and attached to support at least the two columnar bodies, is proposed.

Abstract: In a liquid crystal display device that uses a TFT, a contact hole is formed to connect an image signal line. An organic film is formed so as to cover the image signal line, and a common electrode, which is a transparent electrode, is formed on the organic film. An interlayer insulating film is formed on the common electrode. A through hole is formed in the interlayer insulating film, and the diameter of the through hole is greater than the diameter of the contact hole.

Abstract: In a liquid crystal display device that uses a TFT, a contact hole is formed to connect an image signal line. An organic film is formed so as to cover the image signal line, and a common electrode, which is a transparent electrode, is formed on the organic film. An interlayer insulating film is formed on the common electrode. A through hole is formed in the interlayer insulating film, and the diameter of the through hole is greater than the diameter of the contact hole.

Abstract: In a liquid crystal display device that uses a TFT, a contact hole is formed to connect an image signal line. An organic film is formed so as to cover the image signal line, and a common electrode, which is a transparent electrode, is formed on the organic film. An interlayer insulating film is formed on the common electrode. A through hole is formed in the interlayer insulating film, and the diameter of the through hole is greater than the diameter of the contact hole.

Abstract: A liquid crystal display device capable of preventing the occurrence of crack in a capacitor insulating film due to laser marking is provided.

Abstract: In a liquid crystal display device that uses a TFT, a contact hole is formed to connect an image signal line. An organic film is formed so as to cover the image signal line, and a common electrode, which is a transparent electrode, is formed on the organic film. An interlayer insulating film is formed on the common electrode. A through hole is formed in the interlayer insulating film, and the diameter of the through hole is greater than the diameter of the contact hole.

Abstract: In a liquid crystal display device that uses a top gate TFT, a contact hole is formed to connect to an image signal line. An inorganic passivation film and an organic passivation film are formed in this order so as to cover the TFT, on which a common electrode is formed. Then, an interlayer insulating film is formed on the common electrode. A through hole for gas release is formed in the interlayer insulating film. The diameter of the through hole is greater than the diameter of the contact hole, so as to be able to easily release gas from the organic passivation film, and to prevent the interlayer insulating film from peeling off.

Abstract: A liquid crystal display device capable of preventing the occurrence of crack in a capacitor insulating film due to laser marking is provided.

Abstract: A liquid crystal display device capable of preventing the occurrence of crack in a capacitor insulating film due to laser marking is provided.

Abstract: In a liquid crystal display device that uses a top gate TFT, a contact hole is formed to connect to an image signal line. An inorganic passivation film and an organic passivation film are formed in this order so as to cover the TFT, on which a common electrode is formed. Then, an interlayer insulating film is formed on the common electrode. A through hole for gas release is formed in the interlayer insulating film. The diameter of the through hole is greater than the diameter of the contact hole, so as to be able to easily release gas from the organic passivation film, and to prevent the interlayer insulating film from peeling off.

Abstract: A liquid crystal display device capable of preventing the occurrence of crack in a capacitor insulating film due to laser marking is provided.

Abstract: A laser light is projected to a thin film deposited on a transparent substrate, and measurement is performed on the entire measurement area of the substrate, and transmission intensity is measured by a transmission light intensity monitor and reflection light intensity is measured by a reflection light intensity monitor at the same points and at the same number of points on the substrate. From the value of “A=1?(R+T)” where R represents reflectivity and T is transmissivity, film thickness is measured and evaluated from the relation of the value A with film thickness. By this procedure, film thickness can be determined on 10,000 substrates or more per minute and film thickness of thin film can be measured over the entire substrate surface.

Abstract: A laser light is projected to a thin film deposited on a transparent substrate, and measurement is performed on the entire measurement area of the substrate, and transmission intensity is measured by a transmission light intensity monitor and reflection light intensity is measured by a reflection light intensity monitor at the same points and at the same number of points on the substrate. From the value of “A=1?(R+T)” where R represents reflectivity and T is transmissivity, film thickness is measured and evaluated from the relation of the value A with film thickness. By this procedure, film thickness can be determined on 10,000 substrates or more per minute and film thickness of thin film can be measured over the entire substrate surface.

Abstract: The generation of a projecting intensity distribution in an irradiation laser beam used for forming a polycrystalline semiconductor film is prevented by irradiating the laser beam onto an amorphous semiconductor film to crystallize it while it is being scanned. A dog-ear removing filter for eliminating diffracted light that occurs at boundaries of lenses and acts as a cause of development of dog-ears in the light intensity distribution is disposed in an optical system to cause the light intensity distribution in the irradiation laser beam to be uniform. As a result, by removing the dog ear distributions, the necessity for making the light intensity distribution of the laser beam blur is eliminated, and, consequently, a distribution of high energy efficiency can be maintained and the throughput is improved.