Patents by Inventor Daisuke Nagahama

Daisuke Nagahama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230314380
    Abstract: An immersion probe includes a front plate having a circular shape in a plan view. A surface of the front plate that faces an object to be inspected is formed as a concave surface that is curved so as to be gradually depressed toward the center. Radii of curvature of a first imaginary contact line and a second imaginary contact line orthogonal to each other at the center of the concave surface and extending so as to curve along the concave surface are defined as a first radius of curvature and a second radius of curvature, respectively. The first radius of curvature and the second radius of curvature are different from each other. When an ultrasonic wave is emitted in a solvent, the ultrasonic wave focuses at two points.
    Type: Application
    Filed: March 30, 2023
    Publication date: October 5, 2023
    Inventors: Daisuke Nagahama, Motoki Okuno, Yasuyuki Tanimura
  • Patent number: 8961646
    Abstract: There is provided a nickel alloy having an excellent creep strength as well as high-temperature oxidation resistance. The nickel alloy of the present invention comprises, by mass percent, Cr in a range of 11.5 to 11.9%, Co in a range of 25 to 29%, Mo in a range of 3.4 to 3.7%, W in a range of 1.9 to 2.1%, Ti in a range of 3.9 to 4.4%, Al in a range of 2.9 to 3.2%, C in a range of 0.02 to 0.03%, B in a range of 0.01 to 0.03%, Zr in a range of 0.04 to 0.06%, Ta in a range of 2.1 to 2.2%, Hf in a range of 0.3 to 0.4%, and Nb in a range of 0.5 to 0.8%, the balance being Ni and unavoidable impurities, and contains carbides and borides precipitating in crystal grains and at grain boundaries.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: February 24, 2015
    Assignees: Honda Motor Co., Ltd., National Institute for Materials Science
    Inventors: Yuefeng Gu, Tadaharu Yokokawa, Toshiharu Kobayashi, Toshio Osada, Junzo Fujioka, Hiroshi Harada, Daisuke Nagahama, Yusuke Kikuchi
  • Publication number: 20130167687
    Abstract: There is provided a nickel alloy having an excellent creep strength as well as high-temperature oxidation resistance. The nickel alloy of the present invention comprises, by mass percent, Cr in a range of 11.5 to 11.9%, Co in a range of 25 to 29%, Mo in a range of 3.4 to 3.7%, W in a range of 1.9 to 2.1%, Ti in a range of 3.9 to 4.4%, Al in a range of 2.9 to 3.2%, C in a range of 0.02 to 0.03%, B in a range of 0.01 to 0.03%, Zr in a range of 0.04 to 0.06%, Ta in a range of 2.1 to 2.2%, Hf in a range of 0.3 to 0.4%, and Nb in a range of 0.5 to 0.8%, the balance being Ni and unavoidable impurities, and contains carbides and borides precipitating in crystal grains and at grain boundaries.
    Type: Application
    Filed: November 9, 2011
    Publication date: July 4, 2013
    Applicants: NATIONAL INSTITUTE FOR MATERIALS SCIENCE, HONDA MOTOR CO., LTD.
    Inventors: Yuefeng Gu, Tadaharu Yokokawa, Toshiharu Kobayashi, Toshio Osada, Junzo Fujioka, Hiroshi Harada, Daisuke Nagahama, Yusuke Kikuchi
  • Publication number: 20100014888
    Abstract: The present invention relates to an electrophotographic photosensitive member 2 including a conductive body 20, a photoconductive layer 22 formed on the conductive body 20 using amorphous silicon, and a surface layer 23 formed on the photoconductive layer using amorphous silicon. The present invention further relates to an image forming apparatus provided with the electrophotographic photosensitive member 2. The photoconductive layer 22 has a mean roughness Ra of not more than 10 nm per 10 ?m square. The surface layer 23, without undergoing grinding process, has a mean roughness Ra of not more than 10 nm per 10 ?m square.
    Type: Application
    Filed: May 26, 2006
    Publication date: January 21, 2010
    Applicant: KYOCERA CORPORATION
    Inventors: Akihiko Ikeda, Daigorou Ookubo, Tetsuya Kawakami, Takashi Nakamura, Masamitsu Sasahara, Daisuke Nagahama, Tomomi Fukaya
  • Publication number: 20090078566
    Abstract: The present invention relates to a method of forming a deposited film including a first step for setting a deposited film forming target (10) into a reaction chamber (4), a second step for filling the reaction chamber (10) with a reaction gas and a third step for applying pulse DC voltage between a first conductor (3) and a second conductor (40) spaced from each other in the reaction chamber (10). The present invention further relates to a deposited film forming device for performing the above method. Preferably, in the third step, potential difference between the first conductor (3) and the second conductor (40) is set to not less than 50V and not more than 3000V, and pulse frequency of the pulse DC voltage applied to the first and second conductors (3, 40) is set to not more than 300kHz. Duty ratio of the pulse DC voltage is set to not less than 20% and not more than 90%.
    Type: Application
    Filed: June 1, 2006
    Publication date: March 26, 2009
    Applicant: KYOCERA CORPORATION
    Inventors: Akihiko Ikeda, Daigorou Ookubo, Tetsuya Kawakami, Takashi Nakamura, Masamitsu Sasahara, Daisuke Nagahama, Tomomi Fukaya