Patents by Inventor Daisuke Nishide

Daisuke Nishide has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230006315
    Abstract: W1/T1 is equal to or greater than 5, assuming that the width of an electrode body in a direction perpendicular to a winding axis direction and a thickness direction of the electrode body is W1 (mm) and the thickness of the electrode body 3 is T1 (mm).
    Type: Application
    Filed: February 8, 2021
    Publication date: January 5, 2023
    Applicant: SANYO Electric Co., Ltd.
    Inventors: Takashi Hosokawa, Daisuke Nishide
  • Publication number: 20220393252
    Abstract: A technique for suppressing formation of a black region in a wound electrode body is provided. A method for fabricating a nonaqueous electrolyte secondary battery disclosed here includes: an assembly step of constructing a secondary battery assembly including a wound electrode body; and an initial charging step of performing initial charging on the secondary battery assembly. In the initial charging step, the secondary battery assembly is charged at a first charging rate until a negative electrode potential with respect to a lithium metal reference (vs. Li/Li+) of the secondary battery assembly reaches at least 0.5 V, and a remaining gas amount of the wound electrode body at the end of the initial charging step is 58 cc or less.
    Type: Application
    Filed: May 27, 2022
    Publication date: December 8, 2022
    Inventors: Naoto ONODERA, Hideki SANO, Daisuke NISHIDE
  • Publication number: 20220384816
    Abstract: A binder for non-aqueous electrolyte secondary batteries, the binder containing a carboxymethyl cellulose and/or a salt thereof, wherein the carboxymethyl cellulose and/or a salt thereof satisfies the conditions (A) and (B) described below. Condition (A): The degree of carboxymethyl substitution per glucose unit is from 0.5 to 1.5. Condition (B): The viscosity ratio of the viscosity Vb (30 rpm, 23° C.) of an aqueous dispersion thereof having a solid content of 3% (w/v) to the viscosity Va (30 rpm, 23° C.) of an aqueous dispersion thereof having a solid content of 2% (w/v), namely Vr1=Vb/Va satisfies Vr1>3.
    Type: Application
    Filed: January 29, 2021
    Publication date: December 1, 2022
    Applicant: NIPPON PAPER INDUSTRIES CO., LTD.
    Inventors: Takayuki SAKAJIRI, Kazuhiko INOUE, Daisuke NISHIDE
  • Patent number: 11501975
    Abstract: A substrate processing method includes a providing step, a forming step, and an etching step. In the providing step, a substrate including an etching target film, a first mask formed on the etching target film, and a second mask formed to cover at least a part of the first mask is provided. In the forming step, a protective film is formed on a side wall of the second mask by plasma generated from a first gas. In the etching step, the etching target film is etched with plasma generated from a second gas.
    Type: Grant
    Filed: December 24, 2020
    Date of Patent: November 15, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Daisuke Nishide, Takayuki Katsunuma
  • Publication number: 20220320594
    Abstract: Provided is a technique for preventing plastic deformation of a battery case due to restraint during initial charging. A manufacturing method disclosed herein is a manufacturing method of a non-aqueous electrolyte solution secondary battery. This method includes assembling to construct a secondary battery assembly, and initial charging of the secondary battery assembly. In the initial charging, the initial charging is started with the secondary battery assembly restrained or not restrained; when a negative electrode potential of the secondary battery assembly reaches 0.6 V, a restraint force P1 is applied to the secondary battery assembly, wherein the restraint force P1 is greater than a restraint force applied before the negative electrode potential reaches 0.6 V; and the restraint force P1 is applied to the secondary battery assembly until the negative electrode potential reaches at least 0.3 V.
    Type: Application
    Filed: March 23, 2022
    Publication date: October 6, 2022
    Inventors: Daisuke NISHIDE, Azusa NAKANISHI, Hideki SANO, Naoto ONODERA
  • Patent number: 11428225
    Abstract: A multistage compression system uses refrigerant and oil. The multistage compression system includes a low-stage compressor that compresses the refrigerant, a high-stage compressor that further compresses the refrigerant compressed by the low-stage compressor, an oil return pipe that returns the oil discharged by the high-stage compressor to the low-stage compressor, and an oil discharge pipe that discharges the oil in the low-stage compressor. The low-stage compressor includes a compression part that compresses the refrigerant, a motor that drives the compression part, and a container that houses the compression part and the motor. The container forms a high-pressure space storing compressed refrigerant. Inside of the oil return pipe and inside of the oil discharge pipe are connected to the high-pressure space.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: August 30, 2022
    Assignee: Daikin Industries, Ltd.
    Inventors: Daisuke Okamoto, Mikio Kajiwara, Yohei Nishide, Naoto Tomioka, Masaaki Adachi, Yousuke Ohnishi, Akitoshi Ueno, Takuya Horita, Masaaki Takegami
  • Patent number: 11428226
    Abstract: A multistage compression system uses refrigerant and oil. The multistage compression system includes a low-stage compressor that compresses the refrigerant, a high-stage compressor that further compresses the refrigerant compressed by the low-stage compressor, refrigerant pipes that-introduce the refrigerant compressed and discharged by the low-stage compressor into a suction part of the high-stage compressor, a pressure reducing element disposed between the refrigerant pipes, an accumulator disposed between the refrigerant pipes at a downstream side of the pressure reducing element and at an upstream side of the high-stage compressor, and an oil discharge pipe. The oil discharge pipe discharges the oil in the low-stage compressor. The oil discharge pipe connects the low-stage compressor and a portion of the refrigerant pipes. The portion of the refrigerant pipes is on a downstream side of the pressure reducing element and an upstream side of the accumulator.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: August 30, 2022
    Assignee: Daikin Industries, Ltd.
    Inventors: Yousuke Ohnishi, Masaaki Adachi, Mikio Kajiwara, Naoto Tomioka, Yohei Nishide, Daisuke Okamoto
  • Publication number: 20220271347
    Abstract: According to the present disclosure, a secondary battery capable of inhibiting precipitation of metallic lithium is provided. A secondary battery disclosed herein includes a wound electrode body, and a battery case. An insufficiently stacked region is formed in the vicinity of a positive electrode starting end portion in a flat portion of the electrode body. In the insufficiently stacked region, the total number of layers of a positive electrode plate and a negative electrode plate is smaller than in other regions in the flat portion. In addition, in the secondary battery, a protruding portion protruding toward at least a part of the insufficiently stacked region is formed on an inner surface of the battery case. As a result, it is possible to prevent pressing failure in the insufficiently stacked region and inhibit precipitation of metal Li due to a local increase in an inter-electrode distance.
    Type: Application
    Filed: February 17, 2022
    Publication date: August 25, 2022
    Inventors: Yuma KAMIYAMA, Daisuke NISHIDE, Yukihiro MIZONOBE
  • Patent number: 11415342
    Abstract: A multistage compression system uses refrigerant and oil. The multistage compression system includes a low-stage compressor that compresses the refrigerant, a high-stage compressor that further compresses the refrigerant compressed by the low-stage compressor, refrigerant pipes that introduce the refrigerant compressed and discharged by the low-stage compressor into a suction part of the high-stage compressor, an intercooler, and an oil discharge pipe. The intercooler cools the refrigerant discharged by the low-stage compressor before the refrigerant is sucked into the high-stage compressor. The intercooler is disposed between the refrigerant pipes. The oil discharge pipe discharges the oil in the low-stage compressor. The oil discharge pipe connects the low-stage compressor and a portion of the refrigerant pipes. The portion of the refrigerant pipes is on an upstream side of the intercooler.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: August 16, 2022
    Assignee: Daikin Industries, Ltd.
    Inventors: Yousuke Ohnishi, Masaaki Adachi, Mikio Kajiwara, Yohei Nishide, Naoto Tomioka, Daisuke Okamoto, Akitoshi Ueno, Takuya Horita, Masaaki Takegami
  • Publication number: 20220122802
    Abstract: An etching method includes: providing a substrate having a film and a patterned mask on the film; forming a silicon-containing layer including silicon, carbon, and nitrogen on the substrate using a precursor gas containing silicon; and performing a plasma etching on the film. The substrate is placed under a depressurized environment for a time period from a start time point of the step of forming the silicon-containing layer on the substrate to an end time point of the step of performing the plasma etching on the film.
    Type: Application
    Filed: December 29, 2021
    Publication date: April 21, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Daisuke NISHIDE, Toru HISAMATSU, Shinya ISHIKAWA
  • Patent number: 11244804
    Abstract: An etching method includes: providing a substrate having a film and a patterned mask on the film; forming a silicon-containing layer including silicon, carbon, and nitrogen on the substrate using a precursor gas containing silicon; and performing a plasma etching on the film. The substrate is placed under a depressurized environment for a time period from a start time point of the step of forming the silicon-containing layer on the substrate to an end time point of the step of performing the plasma etching on the film.
    Type: Grant
    Filed: January 29, 2020
    Date of Patent: February 8, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Daisuke Nishide, Toru Hisamatsu, Shinya Ishikawa
  • Publication number: 20210202262
    Abstract: A substrate processing method includes a providing step, a forming step, and an etching step. In the providing step, a substrate including an etching target film, a first mask formed on the etching target film, and a second mask formed to cover at least a part of the first mask is provided. In the forming step, a protective film is formed on a side wall of the second mask by plasma generated from a first gas. In the etching step, the etching target film is etched with plasma generated from a second gas.
    Type: Application
    Filed: December 24, 2020
    Publication date: July 1, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Daisuke NISHIDE, Takayuki Katsunuma
  • Publication number: 20210098234
    Abstract: A substrate processing method includes: providing a substrate including a first region and a second region into a chamber; forming a deposit film on the first region and the second region of the substrate by generating a first plasma from a first processing gas, and selectively etching the first region with respect to the second region by generating a second plasma from the second processing gas containing an inert gas. The first processing gas is a mixed gas including a first gas containing carbon atoms and fluorine atoms and a second gas containing silicon atoms.
    Type: Application
    Filed: September 29, 2020
    Publication date: April 1, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takayuki KATSUNUMA, Daisuke NISHIDE
  • Publication number: 20200243298
    Abstract: An etching method includes: providing a substrate having a film and a patterned mask on the film; forming a silicon-containing layer including silicon, carbon, and nitrogen on the substrate using a precursor gas containing silicon; and performing a plasma etching on the film. The substrate is placed under a depressurized environment for a time period from a start time point of the step of forming the silicon-containing layer on the substrate to an end time point of the step of performing the plasma etching on the film.
    Type: Application
    Filed: January 29, 2020
    Publication date: July 30, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Daisuke NISHIDE, Toru HISAMATSU, Shinya ISHIKAWA
  • Patent number: 10600621
    Abstract: A plasma electrode is provided with an electrode plate, a ground plate, and an insulating plate arranged between the electrode plate and the ground plate. Protrusions of the electrode plate are arranged inside through holes of the ground plate and inside through holes of the insulating plate. One of the through hole provided on the center axes of the protrusions and the through hole provided around the through hole discharges a first processing gas to below the ground plate. The other of the through holes exhausts a gas existing below the ground plate. A second flow path around the protrusions supplies a second processing gas supplied via a first flow path to a gap between outer walls of the protrusions and inner walls of the through holes. The second processing gas supplied to the gap is converted into plasma by high frequency power applied to the electrode plate.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: March 24, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Masato Morishima, Katsuhiko Iwabuchi, Takashi Fuse, Madoka Fujimoto, Daisuke Nishide
  • Publication number: 20200072911
    Abstract: An ECU is configured to execute SOC estimation control for estimating an SOC of a battery. The ECU obtains “first voltage” indicating an OCV of the battery in the SOC estimation control. The ECU controls an engine and a PCU such that the battery is charged with an amount of electric power equal to or larger than a prescribed amount, when the first voltage is within a voltage range where hysteresis occurs. The ECU obtains “second voltage” indicating an OCV of the charged battery, and estimates the SOC of the battery from the second voltage.
    Type: Application
    Filed: September 4, 2019
    Publication date: March 5, 2020
    Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, Panasonic Corporation
    Inventors: Tatsuya KOGA, Hiroki Nagai, Mina Nishigaki, Daisuke Nishide, Ryushiro Tokunaga
  • Patent number: 10388945
    Abstract: A nonaqueous electrolyte secondary battery includes a positive electrode including a positive electrode mix layer, a negative electrode, and a nonaqueous electrolyte. The positive electrode mix layer contains a lithium transition metal oxide containing zirconium (Zr) and also contains a phosphate compound. The nonaqueous electrolyte contains a linear carboxylate. According to this configuration, the nonaqueous electrolyte secondary battery, which has excellent low-temperature output characteristics, can be provided. Thus, the nonaqueous electrolyte secondary battery is, for example, a power supply for driving a mobile data terminal such as a mobile phone, a notebook personal computer, a smartphone, or a tablet terminal and is particularly suitable for applications needing high energy density. Furthermore, the nonaqueous electrolyte secondary battery is conceivably used for high-output applications such as electric vehicles (EVs), hybrid electric vehicles (HEVs), and electric tools.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: August 20, 2019
    Assignee: SANYO Electric Co., Ltd.
    Inventors: Daisuke Nishide, Atsushi Fukui
  • Patent number: 10378104
    Abstract: A carbon nanotube producing method, which is capable of realizing a low resistant depth-wise wiring. An acetylene gas is first supplied as a carbon-containing gas and subsequently, an ethylene gas is supplied as the carbon-containing gas such that carbon nanotubes are produced.
    Type: Grant
    Filed: May 11, 2016
    Date of Patent: August 13, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Daisuke Nishide, Takashi Matsumoto, Munehito Kagaya
  • Patent number: 10374205
    Abstract: It is an object of the present invention to improve the low-temperature output characteristics of a nonaqueous electrolyte secondary battery. A nonaqueous electrolyte secondary battery according to an embodiment includes an electrode assembly having a structure in which a positive electrode and a negative electrode are stacked with a porous separator provided therebetween. The positive electrode contains tungsten and a phosphate compound. The separator contains a material having higher oxidation resistance than a polyethylene and has a pore distribution peak sharpness index of 40 or more in the range of 0.01 ?m to 10 ?m as calculated using formula 1: formula 1: pore distribution peak sharpness index=(peak value of Log differential pore volume)/(difference between maximum pore size and minimum pore size at position corresponding to ½ peak value of Log differential pore volume).
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: August 6, 2019
    Assignee: SANYO Electric Co., Ltd.
    Inventors: Fumiharu Niina, Daisuke Nishide, Atsushi Fukui
  • Publication number: 20190108984
    Abstract: A plasma electrode is provided with an electrode plate, a ground plate, and an insulating plate arranged between the electrode plate and the ground plate. Protrusions of the electrode plate are arranged inside through holes of the ground plate and inside through holes of the insulating plate. One of the through hole provided on the center axes of the protrusions and the through hole provided around the through hole discharges a first processing gas to below the ground plate. The other of the through holes exhausts a gas existing below the ground plate. A second flow path around the protrusions supplies a second processing gas supplied via a first flow path to a gap between outer walls of the protrusions and inner walls of the through holes. The second processing gas supplied to the gap is converted into plasma by high frequency power applied to the electrode plate.
    Type: Application
    Filed: March 7, 2017
    Publication date: April 11, 2019
    Inventors: Masato MORISHIMA, Katsuhiko IWABUCHI, Takashi FUSE, Madoka FUJIMOTO, Daisuke NISHIDE