Patents by Inventor Daisuke OBA
Daisuke OBA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20260317897Abstract: A substrate processing method includes: (A) preparing a substrate; (B) forming, on a surface of the substrate, a metal-containing film that contains oxygen, a first ligand, and a second ligand, the first ligand and the second ligand having different thermal reactivities; (C) heat-treating the metal-containing film; and (D) irradiating the metal-containing film with extreme ultraviolet rays under a predetermined pattern, to form an exposed part irradiated with the extreme ultraviolet rays and an unexposed part not irradiated with the extreme ultraviolet rays in the metal-containing film.Type: ApplicationFiled: June 2, 2026Publication date: October 15, 2026Inventors: Daisuke OBA, Nobuo MATSUKI, Yoshinori MORISADA
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Publication number: 20260264106Abstract: A substrate-processing method includes a) forming a flowable oligomer on a substrate, the flowable oligomer containing carbon; and b) exposing the substrate to a plasma of a modification gas containing carbon and hydrogen, thereby modifying the flowable oligomer and forming a carbon-containing film.Type: ApplicationFiled: April 23, 2026Publication date: September 10, 2026Inventors: Daisuke OBA, Nobuo Matsuki, Yoshinori Morisada
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Patent number: 12654198Abstract: A substrate-processing method includes a) forming a flowable oligomer on a substrate, the flowable oligomer containing carbon; and b) exposing the substrate to a plasma of a modification gas containing carbon and hydrogen, thereby modifying the flowable oligomer and forming a carbon-containing film.Type: GrantFiled: October 18, 2024Date of Patent: June 16, 2026Assignee: Tokyo Electron LimitedInventors: Daisuke Oba, Nobuo Matsuki, Yoshinori Morisada
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Patent number: 12648374Abstract: A method of forming an insulating film includes supplying a precursor gas to a substrate to generate a fluidic oligomer by plasma polymerization and deposit the fluidic oligomer on the substrate, performing a plasma process on the substrate after the depositing the fluidic oligomer, so that at least a part of the fluidic oligomer is hydrogen-terminated while maintaining fluidity of the fluidic oligomer, and subsequently performing an annealing process, which includes a plasma process, on the substrate to form the insulating film.Type: GrantFiled: February 20, 2023Date of Patent: June 2, 2026Assignee: Tokyo Electron LimitedInventors: Daisuke Oba, Nobuo Matsuki, Yoshinori Morisada
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Publication number: 20260110092Abstract: A substrate processing method is provided and includes forming a laminated structure film over a substrate, the laminated structure film including a metal-containing layer and a halogen-containing layer that are laminated; irradiating the laminated structure film with extreme ultraviolet light in a predetermined pattern to form, in the laminated structure film, an exposed portion irradiated with the extreme ultraviolet light and an unexposed portion not irradiated with the extreme ultraviolet light; and selectively removing the exposed portion of the laminated structure film.Type: ApplicationFiled: December 17, 2025Publication date: April 23, 2026Inventors: Nobuo MATSUKI, Daisuke OBA, Yoshinori MORISADA
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Publication number: 20250329564Abstract: Provided is a non-transitory computer-readable storage medium, an analysis method, and an analyzer that can check a processing state for each processing step in a processing recipe. A non-transitory computer-readable storage medium causes a computer to execute processing of acquiring time series data including measured values measured by a sensor provided in a processing apparatus for processing a substrate according to one or a plurality of processing steps, calculating, for each processing step, based on a plurality of pieces of the time series data acquired when substrates are processed, an indicator value indicating a deviation in measured values among the substrates in a period in which each processing step is executed, and outputting a relationship between each processing step and the indicator value.Type: ApplicationFiled: July 3, 2025Publication date: October 23, 2025Applicant: Tokyo Electron LimitedInventors: Daisuke OBA, Takahiro NAKAMURA, Masaki KITSUNEZUKA, Tsutomu MURATA, Norifumi OHMI
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Publication number: 20250279266Abstract: A method of removing an organometallic polymer film deposited inside a processing chamber is provided. The method includes: a) supplying a first etching gas to the processing chamber, and forming the first etching gas into a plasma; and b) allowing the organometallic polymer film to react with the plasma to vaporize and remove the organometallic polymer film. The first etching gas includes a hydrogen gas, a carbon-containing gas, and a nitrogen-containing gas.Type: ApplicationFiled: February 20, 2025Publication date: September 4, 2025Inventors: Nobuo MATSUKI, Daisuke OBA
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Publication number: 20250171890Abstract: An embedding method of embedding a film in a recess of a substrate is provided. The embedding method includes: (a) preparing a substrate having a recess on a mounting table arranged in a chamber of a substrate processing apparatus; (b) forming a flowable film in the recess; and (c) performing a first modification on the flowable film with a plasma generated by supplying RF power to the mounting table.Type: ApplicationFiled: February 24, 2023Publication date: May 29, 2025Inventors: Isao GUNJI, Daisuke OBA, Hiroyuki IKUTA, Yoshinori MORISADA
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Publication number: 20250166990Abstract: A method of forming an insulating film includes supplying a precursor gas to a substrate to generate a fluidic oligomer by plasma polymerization and deposit the fluidic oligomer on the substrate, performing a plasma process on the substrate after the depositing the fluidic oligomer, so that at least a part of the fluidic oligomer is hydrogen-terminated while maintaining fluidity of the fluidic oligomer, and subsequently performing an annealing process, which includes a plasma process, on the substrate to form the insulating film.Type: ApplicationFiled: February 20, 2023Publication date: May 22, 2025Inventors: Daisuke OBA, Nobuo MATSUKI, Yoshinori MORISADA
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Publication number: 20250144667Abstract: A substrate-processing method includes a) forming a flowable oligomer on a substrate, the flowable oligomer containing carbon; and b) exposing the substrate to a plasma of a modification gas containing carbon and hydrogen, thereby modifying the flowable oligomer and forming a carbon-containing film.Type: ApplicationFiled: October 18, 2024Publication date: May 8, 2025Inventors: Daisuke OBA, Nobuo MATSUKI, Yoshinori MORISADA
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Publication number: 20240321571Abstract: A method of forming an insulating film on a substrate having a recess, includes preparing the substrate inside a chamber of a processing apparatus, forming a flowable oligomer film on the substrate by supplying a processing gas containing a raw material gas and a diluent gas into the chamber and generating a flowable oligomer by plasma polymerization, controlling an interior of the chamber to have a pressure equal to or lower than a vapor pressure of the flowable oligomer to partially vaporize and remove the flowable oligomer film, and forming the insulating film in the recess by supplying energy to the substrate to cure the flowable oligomer.Type: ApplicationFiled: March 19, 2024Publication date: September 26, 2024Inventors: Daisuke OBA, Masafumi ISHIDA, Nobuo MATSUKI, Yoshinori MORISADA
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Publication number: 20240087883Abstract: A method for forming a silicon-containing film in a recess formed on a surface of a substrate, the method includes: (a) forming a flowable film in the recess by exposing the substrate, which is adjusted to a first temperature, to plasma generated from a processing gas including a halogen-containing silane: and (b) curing the flowable film by thermally processing the substrate at a second temperature higher than the first temperature.Type: ApplicationFiled: January 11, 2022Publication date: March 14, 2024Inventors: Nobuo MATSUKI, Yoshinori MORISADA, Daisuke OBA
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Patent number: 9964046Abstract: A fuel system includes a centrifugal pump which pressurizes and delivers fuel that is supplied to an aircraft engine, and a transmission which connects the engine and the centrifugal pump to each other, is able to regulate a gear ratio and which modifies and transmits a rotational speed of rotational power that is output from the engine to the centrifugal pump.Type: GrantFiled: March 3, 2016Date of Patent: May 8, 2018Assignee: IHI CorporationInventor: Daisuke Oba
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Patent number: 9677477Abstract: A fuel system includes: a constant-volume pump and a centrifugal pump increasing the pressure of fuel to be supplied to an engine for aviation and discharging the fuel; an operation controller configured to select in accordance with the operation state of the engine, one of a constant-volume pump-using mode of increasing the pressure of fuel using the constant-volume pump and a centrifugal pump-using mode of increasing it using the centrifugal pump; and a speed changer connecting the engine and the centrifugal pump, changing the rotational speed of rotational power output from the engine and transmitting the rotational power to the centrifugal pump, and being capable of adjusting the speed-changing ratio of the rotational speed.Type: GrantFiled: March 18, 2016Date of Patent: June 13, 2017Assignee: IHI CorporationInventor: Daisuke Oba
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Publication number: 20160201564Abstract: A fuel system includes: a constant-volume pump and a centrifugal pump increasing the pressure of fuel to be supplied to an engine for aviation and discharging the fuel; an operation controller configured to select in accordance with the operation state of the engine, one of a constant-volume pump-using mode of increasing the pressure of fuel using the constant-volume pump and a centrifugal pump-using mode of increasing it using the centrifugal pump; and a speed changer connecting the engine and the centrifugal pump, changing the rotational speed of rotational power output from the engine and transmitting the rotational power to the centrifugal pump, and being capable of adjusting the speed-changing ratio of the rotational speed.Type: ApplicationFiled: March 18, 2016Publication date: July 14, 2016Applicant: IHI CorporationInventor: Daisuke OBA
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Publication number: 20160186670Abstract: A fuel system includes a centrifugal pump which pressurizes and delivers fuel that is supplied to an aircraft engine, and a transmission which connects the engine and the centrifugal pump to each other, is able to regulate a gear ratio and which modifies and transmits a rotational speed of rotational power that is output from the engine to the centrifugal pump.Type: ApplicationFiled: March 3, 2016Publication date: June 30, 2016Applicant: IHI CorporationInventor: Daisuke OBA