Patents by Inventor Daisuke Ono
Daisuke Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11505866Abstract: According to one embodiment, film formation apparatus includes: a carrying unit that includes a rotation table which circulates and carries a workpiece; a film formation process unit which includes a target formed of a silicon material, and a plasma producer that produces plasma of a sputter gas introduced between the target and the rotation table, and which forms a silicon film on the workpiece by sputtering; and a hydrogenation process unit which includes a process gas introducing unit that introduces a process gas containing a hydrogen gas, and a plasma producer that produces plasma of the process gas, and which performs hydrogenation on the silicon film formed on the workpiece. The carrying unit carries the workpiece so as to alternately pass through the film formation process unit and through the hydrogenation process unit.Type: GrantFiled: April 23, 2020Date of Patent: November 22, 2022Inventors: Daisuke Ono, Akihiko Ito
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Patent number: 11211233Abstract: According to one embodiment, a film formation apparatus includes a chamber having an interior to be vacuumed, a carrying unit which is provided in the chamber, and which carries a workpiece that has a processing target surface in a solid shape along a circular carrying path, a film formation unit that causes a film formation material to be deposited by sputtering on the workpiece that is being carried by the carrying unit to form a film thereon, and a shielding member which has an opening located at a side where the workpiece passes through, and which forms a film formation chamber where the film formation by the film formation unit is performed. A compensation plate that protrudes in the film formation chamber is provided, and the compensation plate has a solid shape along a shape of the processing target surface of the workpiece, and is provided at a position facing the workpiece.Type: GrantFiled: September 27, 2019Date of Patent: December 28, 2021Assignee: SHIBAURA MECHATRONICS CORPORATIONInventor: Daisuke Ono
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Patent number: 11160994Abstract: The present invention makes it possible to reliably verify irradiation with a particle beam in accordance with a selected irradiation technique. A particle beam therapy system includes a charged particle beam generator accelerating the particle beam, an irradiator irradiating a target with the particle beam accelerated by the charged particle beam generator, and a controller controlling the charged particle beam generator and the irradiator. The controller controls the charged particle beam generator and the irradiator so as to irradiate the target with the particle beam through switching between at least two different irradiation techniques, and furthermore, after switching between the two irradiation techniques, controls the charged particle beam generator and the irradiator to perform tentative irradiation with the charged particle beam in accordance with one of the irradiation techniques switched, to verify the particle beam.Type: GrantFiled: January 21, 2020Date of Patent: November 2, 2021Assignee: HITACHI, LTD.Inventors: Daisuke Ono, Yuki Ito
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Patent number: 11004665Abstract: A plasma processing apparatus includes a vacuum container, a conveyance unit including a rotator and circulating and carrying a workpiece through the conveyance path, a cylindrical member having an opening at one end extended in the direction toward the conveyance path, a window member provided at the cylindrical member, and dividing a gas space from the exterior thereof, a supply unit supplying the process gas in the gas space, and an antenna generating inductive coupling plasma on the workpiece. The supply unit supplies the process gas from plural locations where a passing time at which the surface of the rotator passes through a process region is different, and the plasma processing apparatus further includes an adjusting unit individually adjusting the supply amounts of the process gas from the plural locations of the supply unit per a unit time in accordance with the passing time.Type: GrantFiled: March 30, 2018Date of Patent: May 11, 2021Assignee: SHIBAURA MECHATRONICS CORPORATIONInventors: Yoshio Kawamata, Daisuke Ono
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Patent number: 10903059Abstract: A film formation apparatus includes a chamber which has an interior capable of being vacuumed, and which includes a lid that is openable and closable on the upper part of the chamber, a rotation table which is provided in the chamber and which and carries a workpiece in the circular trajectory, a film formation unit that deposits film formation materials by sputtering on the workpiece carried by the rotation table to form films, a shielding member which is provided with an opening at the side which the workpiece passes through, and which forms a film formation room where the film formations by the film formation units are performed, and a support which supports the shielding member, and which is independent relative to the chamber and is independent from the lid.Type: GrantFiled: September 6, 2018Date of Patent: January 26, 2021Assignee: SHIBAURA MECHATRONICS CORPORATIONInventors: Daisuke Ono, Yu Kambe
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Patent number: 10896841Abstract: A film formation apparatus includes a film formation unit which includes a film formation room having an opening at one end, has a target formed of a film formation material in the film formation room, and deposits the film formation material of the target on a surface of a workpiece facing the opening by plasma produced by a sputter gas in the film formation room, and a carrier that carries the workpiece along a predetermined carrying path so that the workpiece repeatedly pass through a facing region which faces the opening of the film formation room and a non-facing region which does not face the opening of the film formation room.Type: GrantFiled: September 27, 2018Date of Patent: January 19, 2021Assignee: SHIBAURA MECHATRONICS CORPORATIONInventor: Daisuke Ono
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Publication number: 20200340117Abstract: According to one embodiment, film formation apparatus includes: a carrying unit that includes a rotation table which circulates and carries a workpiece; a film formation process unit which includes a target formed of a silicon material, and a plasma producer that produces plasma of a sputter gas introduced between the target and the rotation table, and which forms a silicon film on the workpiece by sputtering; and a hydrogenation process unit which includes a process gas introducing unit that introduces a process gas containing a hydrogen gas, and a plasma producer that produces plasma of the process gas, and which performs hydrogenation on the silicon film formed on the workpiece. The carrying unit carries the workpiece so as to alternately pass through the film formation process unit and through the hydrogenation process unit.Type: ApplicationFiled: April 23, 2020Publication date: October 29, 2020Inventors: Daisuke Ono, Akihiko Ito
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Publication number: 20200276454Abstract: The present invention makes it possible to reliably verify irradiation with a particle beam in accordance with a selected irradiation technique. A particle beam therapy system includes a charged particle beam generator accelerating the particle beam, an irradiator irradiating a target with the particle beam accelerated by the charged particle beam generator, and a controller controlling the charged particle beam generator and the irradiator. The controller controls the charged particle beam generator and the irradiator so as to irradiate the target with the particle beam through switching between at least two different irradiation techniques, and furthermore, after switching between the two irradiation techniques, controls the charged particle beam generator and the irradiator to perform tentative irradiation with the charged particle beam in accordance with one of the irradiation techniques switched, to verify the particle beam.Type: ApplicationFiled: January 21, 2020Publication date: September 3, 2020Inventors: Daisuke ONO, Yuki ITO
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Publication number: 20200118803Abstract: According to one embodiment, a film formation apparatus includes a chamber having an interior to be vacuumed, a carrying unit which is provided in the chamber, and which carries a workpiece that has a processing target surface in a solid shape along a circular carrying path, a film formation unit that causes a film formation material to be deposited by sputtering on the workpiece that is being carried by the carrying unit to form a film thereon, and a shielding member which has an opening located at a side where the workpiece passes through, and which forms a film formation chamber where the film formation by the film formation unit is performed. A compensation plate that protrudes in the film formation chamber is provided, and the compensation plate has a solid shape along a shape of the processing target surface of the workpiece, and is provided at a position facing the workpiece.Type: ApplicationFiled: September 27, 2019Publication date: April 16, 2020Inventor: Daisuke ONO
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Patent number: 10583312Abstract: A treatment bed arranged in a tip direction of an irradiation nozzle and constructed movably, a treatment information system that manages prescription data, a treatment control system that receives a target position stored in the treatment information system to cause a main display system to display the target position, a pendant to input a movement command for the treatment bed, the main display system that receives the target position of the treatment bed from the treatment control system and displays an actual position of the treatment bed, and a patient positioning support system that calculates correction values for the target position thereof to provide the correction values to the treatment control system and the pendant are included, wherein the treatment control system sends the target position thereof to the treatment information system at a period shorter than an operation sequence thereof and stores initial values to be sent in advance.Type: GrantFiled: January 24, 2018Date of Patent: March 10, 2020Assignee: Hitachi, Ltd.Inventors: Daisuke Ono, Takayoshi Matsushita, Isao Furuse, Takao Kidani
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Patent number: 10446427Abstract: A conveyance system includes a track, ceiling conveyance vehicles, and a conveyance controller configured or programmed to output a conveyance instruction for a FOUP to the ceiling conveyance vehicles. When a first FOUP on a downstream port is waiting for collection, the conveyance controller waits without outputting a conveyance instruction instructing collection of the first FOUP until any of the conveyance vehicles conveying a second FOUP to an upstream port has been recognized until a waiting time set in advance has elapsed since the first FOUP changed to a state waiting for collection and outputs the conveyance instruction instructing collection of the first FOUP when the waiting time has elapsed since a point in time when the first FOUP changed to the state waiting for collection.Type: GrantFiled: October 13, 2016Date of Patent: October 15, 2019Assignee: MURATA MACHINERY, LTD.Inventors: Osamu Honda, Keiji Yamada, Takashi Nozawa, Daisuke Ono
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Patent number: 10354902Abstract: A conveyance system includes a track, ceiling conveyance vehicles, storage apparatuses, and a conveyance controller configured or programmed to control operations of the ceiling conveyance vehicles and a local vehicle in accordance with an operation mode. The storage apparatus includes a storage plate and the local vehicle that transfer a FOUP between the storage plate and an apparatus port. The conveyance controller switches the operation mode among a first mode prohibiting transfer from the apparatus port to the storage plate by the local vehicle, a second mode prohibiting transfer to the storage plate by any of the ceiling conveyance vehicles and transfer from the storage plate to the apparatus port by the local vehicle, and a third mode that does not restrict transfer by the local vehicle.Type: GrantFiled: October 13, 2016Date of Patent: July 16, 2019Assignee: MURATA MACHINERY, LTD.Inventors: Osamu Honda, Keiji Yamada, Daisuke Ono, Takashi Nozawa
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Patent number: 10260145Abstract: A film formation apparatus includes a chamber that is a sealed container in which a target formed of a film formation material is placed, and into which the workpiece is carried, a gas discharging unit discharging a gas in the sealed container for a predetermined time period after the workpiece is carried into the chamber to obtain a base pressure, and a sputter gas introducing unit introducing a sputter gas containing oxygen to the interior of the chamber having undergone the discharging and becoming the base pressure. The sputter gas introducing unit decreases an oxygen partial pressure in the sputter gas to be introduced in the chamber in accordance with an increase in the base pressure due to an increase of the film formation material sticking to the interior of the chamber.Type: GrantFiled: March 17, 2017Date of Patent: April 16, 2019Assignee: Shibaura Mechatronics CorporationInventor: Daisuke Ono
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Publication number: 20190103300Abstract: A film formation apparatus includes a film formation unit which includes a film formation room having an opening at one end, has a target formed of a film formation material in the film formation room, and deposits the film formation material of the target on a surface of a workpiece facing the opening by plasma produced by a sputter gas in the film formation room, and a carrier that carries the workpiece along a predetermined carrying path so that the workpiece repeatedly pass through a facing region which faces the opening of the film formation room and a non-facing region which does not face the opening of the film formation room.Type: ApplicationFiled: September 27, 2018Publication date: April 4, 2019Inventor: Daisuke ONO
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Publication number: 20190074167Abstract: A film formation apparatus includes a chamber which has an interior capable of being vacuumed, and which includes a lid that is openable and closable on the upper part of the chamber, a rotation table which is provided in the chamber and which and carries a workpiece in the circular trajectory, a film formation unit that deposits film formation materials by sputtering on the workpiece carried by the rotation table to form films, a shielding member which is provided with an opening at the side which the workpiece passes through, and which forms a film formation room where the film formations by the film formation units are performed, and a support which supports the shielding member, and which is independent relative to the chamber and is independent from the lid.Type: ApplicationFiled: September 6, 2018Publication date: March 7, 2019Inventors: Daisuke ONO, Yu KAMBE
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Patent number: 10190009Abstract: An aqueous black ink composition that contains a colorant represented by formula (1) and one or more colorants (B-a) to (B-t). The ink composition is stable even when stored for a long period of time, has a low chroma and tint-free neutral black-to-gray color even when printing a deep color or light color, has a high printed image density, exhibits no change in hue when printed on different media, and produces a black recorded image having particularly excellent recorded image color development properties, light resistance, ozone gas resistance and moisture resistance.Type: GrantFiled: August 8, 2014Date of Patent: January 29, 2019Assignee: NIPPON KAYAKU KABUSHIKI KAISHAInventors: Daisuke Ono, Yumi Shiratori, Yasuaki Ishiguro
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Publication number: 20180358252Abstract: A conveyance system includes a track, ceiling conveyance vehicles, and a conveyance controller configured or programmed to output a conveyance instruction for a FOUP to the ceiling conveyance vehicles. When a first FOUP on a downstream port is waiting for collection the conveyance controller waits without outputting a conveyance instruction instructing collection of the first FOUP until any of the conveyance vehicles conveying a second FOUP to an upstream port has been recognized until a waiting time set in advance has elapsed since the first FOUP changed to the state waiting for collection and outputs the conveyance instruction instructing collection of the first FOUP when the waiting time has elapsed since a point in time when the first FOUP changed to the state waiting for collection.Type: ApplicationFiled: October 13, 2016Publication date: December 13, 2018Inventors: Osamu HONDA, Keiji YAMADA, Takashi NOZAWA, Daisuke ONO
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Publication number: 20180350646Abstract: A conveyance system includes a track, ceiling conveyance vehicles, storage apparatuses, and a conveyance controller configured or programmed to control operations of the ceiling conveyance vehicles and a local vehicle in accordance with an operation mode. The storage apparatus includes a storage plate and the local vehicle that transfer a FOUP between the storage plate and an apparatus port. The conveyance controller switches the operation mode among a first mode prohibiting transfer from the apparatus port to the storage plate by the local vehicle, a second mode prohibiting transfer to the storage plate by any of the ceiling conveyance vehicles and transfer from the storage plate to the apparatus port by the local vehicle, and a third mode that does not restrict transfer by the local vehicle.Type: ApplicationFiled: October 13, 2016Publication date: December 6, 2018Inventors: Osamu HONDA, Keiji YAMADA, Daisuke ONO, Takashi NOZAWA
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Publication number: 20180286644Abstract: A plasma processing apparatus includes a vacuum container, a conveyance unit including a rotator and circulating and carrying a workpiece through the conveyance path, a cylindrical member having an opening at one end extended in the direction toward the conveyance path, a window member provided at the cylindrical member, and dividing a gas space from the exterior thereof, a supply unit supplying the process gas in the gas space, and an antenna generating inductive coupling plasma on the workpiece. The supply unit supplies the process gas from plural locations where a passing time at which the surface of the rotator passes through a process region is different, and the plasma processing apparatus further includes an adjusting unit individually adjusting the supply amounts of the process gas from the plural locations of the supply unit per a unit time in accordance with the passing time.Type: ApplicationFiled: March 30, 2018Publication date: October 4, 2018Inventors: Yoshio KAWAMATA, Daisuke ONO
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Publication number: 20180264287Abstract: A treatment bed arranged in a tip direction of an irradiation nozzle and constructed movably, a treatment information system that manages prescription data, a treatment control system that receives a target position stored in the treatment information system to cause a main display system to display the target position, a pendant to input a movement command for the treatment bed, the main display system that receives the target position of the treatment bed from the treatment control system and displays an actual position of the treatment bed, and a patient positioning support system that calculates correction values for the target position thereof to provide the correction values to the treatment control system and the pendant are included, wherein the treatment control system sends the target position thereof to the treatment information system at a period shorter than an operation sequence thereof and stores initial values to be sent in advance.Type: ApplicationFiled: January 24, 2018Publication date: September 20, 2018Inventors: Daisuke ONO, Takayoshi MATSUSHITA, Isao FURUSE, Takao KIDANI