Patents by Inventor Daisuke Simokawa

Daisuke Simokawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Liquid coating method, liquid coating apparatus, and computer-readable storage medium
    Patent number: 10201826
    Abstract: Disclosed is a liquid coating method. The method executes processes of: coating a coating liquid in a spiral form on a surface of a substrate by ejecting the coating liquid from the ejection nozzle while moving the ejection nozzle in a predetermined direction between the rotary axis and a peripheral edge of the substrate during rotation of the substrate; making a linear velocity at an ejection position of the coating liquid from the ejection nozzle substantially constant by reducing a number of rotations of the substrate as the ejection position is positioned closer to the peripheral edge of the substrate; and making an ejection flow rate of the coating liquid ejected from the ejection nozzle substantially constant by changing a gap between the ejection port of the ejection nozzle and the surface of the substrate based on a flow rate of the coating liquid before ejection from the ejection nozzle.
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: February 12, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Katsunori Ichino, Takayuki Ishii, Kouzou Kawahara, Daisuke Simokawa, Kazuyuki Tashiro
  • LIQUID COATING METHOD, LIQUID COATING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM
    Publication number: 20150352587
    Abstract: Disclosed is a liquid coating method. The method executes processes of: coating a coating liquid in a spiral form on a surface of a substrate by ejecting the coating liquid from the ejection nozzle while moving the ejection nozzle in a predetermined direction between the rotary axis and a peripheral edge of the substrate during rotation of the substrate; making a linear velocity at an ejection position of the coating liquid from the ejection nozzle substantially constant by reducing a number of rotations of the substrate as the ejection position is positioned closer to the peripheral edge of the substrate; and making an ejection flow rate of the coating liquid ejected from the ejection nozzle substantially constant by changing a gap between the ejection port of the ejection nozzle and the surface of the substrate based on a flow rate of the coating liquid before ejection from the ejection nozzle.
    Type: Application
    Filed: June 3, 2015
    Publication date: December 10, 2015
    Inventors: Katsunori Ichino, Takayuki Ishii, Kouzou Kawahara, Daisuke Simokawa, Kazuyuki Tashiro