Patents by Inventor Daisuke TOMIDA

Daisuke TOMIDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10501865
    Abstract: A first object of the present invention is to provide a method for efficiently growing a nitride single crystal even under low pressure conditions. The present invention relates to a method for producing a nitride single crystal, comprising growing a nitride crystal on the surface of a seed crystal having a hexagonal crystal structure by setting a pressure in a reaction vessel having the seed crystal, a nitrogen-containing solvent, a mineralizer containing a fluorine atom, and a raw material placed therein to 5 to 200 MPa and performing control so that the nitrogen-containing solvent is in at least either a supercritical state or a subcritical state.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: December 10, 2019
    Assignees: Mitsubishi Chemical Corporation, Tohoku University, The Japan Steel Works, Ltd.
    Inventors: Tohru Ishiguro, Quanxi Bao, Chiaki Yokoyama, Daisuke Tomida, Shigefusa Chichibu, Rinzo Kayano, Mutsuo Ueda, Makoto Saito, Yuji Kagamitani
  • Publication number: 20180187328
    Abstract: A first object of the present invention is to provide a method for efficiently growing a nitride single crystal even under low pressure conditions. The present invention relates to a method for producing a nitride single crystal, comprising growing a nitride crystal on the surface of a seed crystal having a hexagonal crystal structure by setting a pressure in a reaction vessel having the seed crystal, a nitrogen-containing solvent, a mineralizer containing a fluorine atom, and a raw material placed therein to 5 to 200 MPa and performing control so that the nitrogen-containing solvent is in at least either a supercritical state or a subcritical state.
    Type: Application
    Filed: March 1, 2018
    Publication date: July 5, 2018
    Applicants: Mitsubishi Chemical Corporation, Tohoku University, The Japan Steel Works, Ltd.
    Inventors: Tohru Ishiguro, Quanxi Bao, Chiaki Yokoyama, Daisuke Tomida, Shigefusa Chichibu, Rinzo Kayano, Mutsuo Ueda, Makoto Saito, Yuji Kagamitani
  • Patent number: 9976229
    Abstract: A first object of the present invention is to provide a method for efficiently growing a nitride single crystal even under low pressure conditions. The present invention relates to a method for producing a nitride single crystal, comprising growing a nitride crystal on the surface of a seed crystal having a hexagonal crystal structure by setting a pressure in a reaction vessel having the seed crystal, a nitrogen-containing solvent, a mineralizer containing a fluorine atom, and a raw material placed therein to 5 to 200 MPa and performing control so that the nitrogen-containing solvent is in at least either a supercritical state or a subcritical state.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: May 22, 2018
    Assignees: MITSUBISHI CHEMICAL CORPORATION, TOHOKU UNIVERSITY, THE JAPAN STEEL WORKS, LTD.
    Inventors: Tohru Ishiguro, Quanxi Bao, Chiaki Yokoyama, Daisuke Tomida, Shigefusa Chichibu, Rinzo Kayano, Mutsuo Ueda, Makoto Saito, Yuji Kagamitani
  • Publication number: 20150023862
    Abstract: A first object of the present invention is to provide a method for efficiently growing a nitride single crystal even under low pressure conditions. The present invention relates to a method for producing a nitride single crystal, comprising growing a nitride crystal on the surface of a seed crystal having a hexagonal crystal structure by setting a pressure in a reaction vessel having the seed crystal, a nitrogen-containing solvent, a mineralizer containing a fluorine atom, and a raw material placed therein to 5 to 200 MPa and performing control so that the nitrogen-containing solvent is in at least either a supercritical state or a subcritical state.
    Type: Application
    Filed: September 29, 2014
    Publication date: January 22, 2015
    Applicants: Mitsubishi Chemical Corporation, Tohoku University, The Japan Steel Works, Ltd.
    Inventors: Toru ISHIGURO, Quanxi BAO, Chiaki YOKOYAMA, Daisuke TOMIDA, Shigefusa CHICHIBU, Rinzo KAYANO, Mutsuo UEDA, Makoto SAITO, Yuji KAGAMITANI