Patents by Inventor Daju Shiono

Daju Shiono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive resist composition, method for resist pattern formation and compound
    Patent number: 7504196
    Abstract: A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound, which has two or more phenolic hydroxyl groups, a molecular weight of 300 to 2,500, and is represented by a general formula (I) shown below, have been substituted with an acid-dissociable, dissolution-inhibiting group (II) represented by a general formula (II) shown below.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: March 17, 2009
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daju Shiono, Taku Hirayama, Hideo Hada