Patents by Inventor Damas Limoge

Damas Limoge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11961210
    Abstract: An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.
    Type: Grant
    Filed: February 27, 2023
    Date of Patent: April 16, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Jonathan Lee, Damas Limoge, Matthew C. Putman, John B. Putman, Michael Moskie
  • Patent number: 11953893
    Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.
    Type: Grant
    Filed: June 5, 2023
    Date of Patent: April 9, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Patent number: 11953863
    Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.
    Type: Grant
    Filed: June 5, 2023
    Date of Patent: April 9, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Jonathan Lee, Damas Limoge
  • Patent number: 11955686
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Grant
    Filed: June 28, 2023
    Date of Patent: April 9, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
  • Publication number: 20240085863
    Abstract: A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.
    Type: Application
    Filed: August 31, 2023
    Publication date: March 14, 2024
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Sarah Constantin, Valerie Bordelanne, Damas Limoge, Jonathan Lee
  • Patent number: 11894596
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Grant
    Filed: August 7, 2023
    Date of Patent: February 6, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
  • Patent number: 11889797
    Abstract: A controlled growth system is provided herein. The controlled growth system includes a controlled growth environment, a controller, a sensor, and a computing system. The controlled growth environment is configured to grow a biologic. The controller is in communication with the controlled growth environment. The controller is configured to manage process parameters of the controlled growth environment. The sensor is configured to monitor the biologic during a growth process. The computing system is in communication with the sensor and the controller. The computing system is programmed to perform operations for achieving a desired final quality metric for the biologic.
    Type: Grant
    Filed: June 3, 2021
    Date of Patent: February 6, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Damas Limoge, Vadim Pinskiy, Parker Musselman
  • Publication number: 20240019817
    Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.
    Type: Application
    Filed: June 5, 2023
    Publication date: January 18, 2024
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Jonathan Lee, Damas Limoge
  • Publication number: 20230391016
    Abstract: Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.
    Type: Application
    Filed: August 21, 2023
    Publication date: December 7, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Vadim Pinskiy, Matthew C. Putman, Damas Limoge, Aswin Raghav Nirmaleswaran
  • Publication number: 20230387564
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Application
    Filed: August 7, 2023
    Publication date: November 30, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
  • Publication number: 20230367301
    Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.
    Type: Application
    Filed: July 24, 2023
    Publication date: November 16, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Publication number: 20230359730
    Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.
    Type: Application
    Filed: June 28, 2023
    Publication date: November 9, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
  • Publication number: 20230344105
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Application
    Filed: June 28, 2023
    Publication date: October 26, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
  • Patent number: 11784386
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Grant
    Filed: August 5, 2022
    Date of Patent: October 10, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
  • Publication number: 20230315071
    Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.
    Type: Application
    Filed: June 5, 2023
    Publication date: October 5, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Patent number: 11747772
    Abstract: A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.
    Type: Grant
    Filed: September 12, 2022
    Date of Patent: September 5, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Sarah Constantin, Valerie Bordelanne, Damas Limoge, Jonathan Lee
  • Patent number: 11731368
    Abstract: Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: August 22, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Vadim Pinskiy, Matthew C. Putman, Damas Limoge, Aswin Raghav Nirmaleswaran
  • Patent number: 11709483
    Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: July 25, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Patent number: 11693956
    Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.
    Type: Grant
    Filed: August 23, 2021
    Date of Patent: July 4, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
  • Publication number: 20230206405
    Abstract: An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.
    Type: Application
    Filed: February 27, 2023
    Publication date: June 29, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Jonathan Lee, Damas Limoge, Matthew C. Putman, John B. Putman, Michael Moskie