Patents by Inventor Damon Genetti
Damon Genetti has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9496159Abstract: Methods and systems for positioning wafers using a dual side-by-side end effector robot are provided. The methods involve performing place moves using dual side-by-side end effector robots with active wafer position correction. According to various embodiments, the methods may be used for placement into a process module, loadlock or other destination by a dual wafer transfer robot. The methods provide nearly double the throughput of a single wafer transfer schemes by transferring two wafers with the same number of moves.Type: GrantFiled: March 3, 2015Date of Patent: November 15, 2016Assignee: Novellus Systems, Inc.Inventors: Damon Genetti, Shawn Hamilton, Rich Blank, James Sheldon Templeton
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Publication number: 20150249028Abstract: Methods and systems for positioning wafers using a dual side-by-side end effector robot are provided. The methods involve performing place moves using dual side-by-side end effector robots with active wafer position correction. According to various embodiments, the methods may be used for placement into a process module, loadlock or other destination by a dual wafer transfer robot. The methods provide nearly double the throughput of a single wafer transfer schemes by transferring two wafers with the same number of moves.Type: ApplicationFiled: March 3, 2015Publication date: September 3, 2015Inventors: Damon Genetti, Shawn Hamilton, Rich Blank, Sheldon Templeton
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Patent number: 9002514Abstract: Methods and systems for positioning wafers using a dual side-by-side end effector robot are provided. The methods involve performing place moves using dual side-by-side end effector robots with active wafer position correction. According to various embodiments, the methods may be used for placement into a process module, loadlock or other destination by a dual wafer transfer robot. The methods provide nearly double the throughput of a single wafer transfer schemes by transferring two wafers with the same number of moves.Type: GrantFiled: November 30, 2007Date of Patent: April 7, 2015Assignee: Novellus Systems, Inc.Inventors: Damon Genetti, Shawn Hamilton, Rich Blank, Sheldon Templeton
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Patent number: 8491248Abstract: Provided are apparatuses and methods disclosed for wafer processing. Specific embodiments include dual wafer handling systems that transfer wafers from storage cassettes to processing modules and back and aspects thereof. Stacked independent loadlocks that allow venting and pumping operations to work in parallel and may be optimized for particle reduction are provided. Also provided are annular designs for radial top down flow during loadlock vent and pumpdown.Type: GrantFiled: September 9, 2011Date of Patent: July 23, 2013Assignee: Novellus Systems, Inc.Inventors: Chris Gage, Shawn Hamilton, Sheldon Templeton, Keith Wood, Damon Genetti
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Patent number: 8489237Abstract: Methods correcting wafer position error are provided. The methods involve measuring wafer position error on a robot during transfer to an intermediate station. This measurement data is then used by a second robot to perform wafer pick moves from the intermediate station with corrections to center the wafer. Wafer position correction may be performed at only one location during the transfer process. Also provided are systems and apparatuses for transferring wafers using an intermediate station.Type: GrantFiled: September 23, 2011Date of Patent: July 16, 2013Assignee: Novellus Systems, Inc.Inventors: Chris Gage, Damon Genetti
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Publication number: 20120014773Abstract: Methods correcting wafer position error are provided. The methods involve measuring wafer position error on a robot, e.g. a dual side-by-side end effector robot, during transfer to an intermediate station. This measurement data is then used by a second robot to perform wafer pick moves from the intermediate station with corrections to center the wafer. Wafer position correction may be performed at only one location during the transfer process. Also provided are systems and apparatuses for transferring wafers using an intermediate station.Type: ApplicationFiled: September 23, 2011Publication date: January 19, 2012Inventors: Chris Gage, Damon Genetti
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Patent number: 8099192Abstract: A method is provided for teaching a transfer robot used in conjunction with a workpiece processing system including a pedestal assembly, a light sensor having an optical input fixedly coupled to the pedestal assembly, a transfer robot having an end effector, and a processing chamber containing the pedestal assembly and light sensor. The method includes the steps of producing light within the processing chamber, moving the end effector over the optical input such that amount of light reaching the light sensor varies in relation to the position of the end effector, and recording the signal gain as the end effector is moved over the optical input. The method also includes the step of establishing from the recorded signal gain a desired position of the end effector relative to the pedestal assembly.Type: GrantFiled: November 6, 2007Date of Patent: January 17, 2012Assignee: Novellus Systems, Inc.Inventors: Damon Genetti, Heinrich Von Bunau, Tarek Radwan, Karen Townsend
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Publication number: 20120003063Abstract: Provided are apparatuses and methods disclosed for wafer processing. Specific embodiments include dual wafer handling systems that transfer wafers from storage cassettes to processing modules and back and aspects thereof. Stacked independent loadlocks that allow venting and pumping operations to work in parallel and may be optimized for particle reduction are provided. Also provided are annular designs for radial top down flow during loadlock vent and pumpdown.Type: ApplicationFiled: September 9, 2011Publication date: January 5, 2012Inventors: Chris Gage, Shawn Hamilton, Sheldon Templeton, Keith Wood, Damon Genetti
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Patent number: 8060252Abstract: Methods correcting wafer position error are provided. The methods involve measuring wafer position error on a robot, e.g. a dual side-by-side end effector robot, during transfer to an intermediate station. This measurement data is then used by a second robot to perform wafer pick moves from the intermediate station with corrections to center the wafer. Wafer position correction may be performed at only one location during the transfer process. Also provided are systems and apparatuses for transferring wafers using an intermediate station.Type: GrantFiled: November 30, 2007Date of Patent: November 15, 2011Assignee: Novellus Systems, Inc.Inventors: Chris Gage, Damon Genetti
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Patent number: 8033769Abstract: Provided are apparatuses and methods disclosed for wafer processing. Specific embodiments include dual wafer handling systems that transfer wafers from storage cassettes to processing modules and back and aspects thereof. Stacked independent loadlocks that allow venting and pumping operations to work in parallel and may be optimized for particle reduction are provided. Also provided are annular designs for radial top down flow during loadlock vent and pumpdown.Type: GrantFiled: November 30, 2007Date of Patent: October 11, 2011Assignee: Novellus Systems, Inc.Inventors: Chris Gage, Shawn Hamilton, Sheldon Templeton, Keith Wood, Damon Genetti
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Publication number: 20090143911Abstract: Methods correcting wafer position error are provided. The methods involve measuring wafer position error on a robot, e.g. a dual side-by-side end effector robot, during transfer to an intermediate station. This measurement data is then used by a second robot to perform wafer pick moves from the intermediate station with corrections to center the wafer. Wafer position correction may be performed at only one location during the transfer process. Also provided are systems and apparatuses for transferring wafers using an intermediate station.Type: ApplicationFiled: November 30, 2007Publication date: June 4, 2009Inventors: Chris Gage, Damon Genetti
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Publication number: 20090142163Abstract: Methods and systems for positioning wafers using a dual side-by-side end effector robot are provided. The methods involve performing place moves using dual side-by-side end effector robots with active wafer position correction. According to various embodiments, the methods may be used for placement into a process module, loadlock or other destination by a dual wafer transfer robot. The methods provide nearly double the throughput of a single wafer transfer schemes by transferring two wafers with the same number of moves.Type: ApplicationFiled: November 30, 2007Publication date: June 4, 2009Inventors: Damon Genetti, Shawn Hamilton, Rich Blank, Sheldon Templeton
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Publication number: 20090142167Abstract: Provided are apparatuses and methods disclosed for wafer processing. Specific embodiments include dual wafer handling systems that transfer wafers from storage cassettes to processing modules and back and aspects thereof. Stacked independent loadlocks that allow venting and pumping operations to work in parallel and may be optimized for particle reduction are provided. Also provided are annular designs for radial top down flow during loadlock vent and pumpdown.Type: ApplicationFiled: November 30, 2007Publication date: June 4, 2009Inventors: Chris Gage, Shawn Hamilton, Sheldon Templeton, Keith Wood, Damon Genetti
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Publication number: 20090118862Abstract: A method is provided for teaching a transfer robot used in conjunction with a workpiece processing system including a pedestal assembly, a light sensor having an optical input fixedly coupled to the pedestal assembly, a transfer robot having an end effector, and a processing chamber containing the pedestal assembly and light sensor. The method includes the steps of producing light within the processing chamber, moving the end effector over the optical input such that amount of light reaching the light sensor varies in relation to the position of the end effector, and recording the signal gain as the end effector is moved over the optical input. The method also includes the step of establishing from the recorded signal gain a desired position of the end effector relative to the pedestal assembly.Type: ApplicationFiled: November 6, 2007Publication date: May 7, 2009Applicant: NOVELLUS SYSTEMS, INC.Inventors: Damon GENETTI, Heinrich VON BUNAU, Tarek RADWAN, Karen TOWNSEND
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Patent number: 6934606Abstract: In one embodiment, a wafer-handling robot in a wafer processing system is automatically calibrated by determining an orientation of the robot relative to a chassis of the wafer processing system, determining hand-off coordinates of a load port in the wafer processing system, and determining hand-off coordinates of a load lock in the wafer processing system. Also disclosed is a calibration fixture for automatically calibrating the wafer-handling robot to the load port.Type: GrantFiled: June 20, 2003Date of Patent: August 23, 2005Assignee: Novellus Systems, Inc.Inventors: Damon Genetti, Wayne Tang, Mikhail Bojinov, Stephan Minard
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Patent number: 6405101Abstract: Disclosed is a system and method for detecting the position of a wafer with respect to a calibrated reference position. In one embodiment of the invention, sensors are used to detect the edges of the wafer as the wafer is being passed over the sensors. This wafer detection information is then used to calculate the amount by which the wafer is off-centered such that corrections can be made before the wafer is placed onto a destination location.Type: GrantFiled: November 5, 1999Date of Patent: June 11, 2002Assignee: Novellus Systems, Inc.Inventors: William R. Johanson, Craig Stevens, Steve Kleinke, Damon Genetti