Patents by Inventor Dan Arnzen

Dan Arnzen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Selective SAC etch process
    Patent number: 6403488
    Abstract: A method for plasma etching, comprising etching a structure with a plasma prepared from a gas mixture comprising: (i) an etching gas, and (ii) a strained cyclic (hydro)fluorocarbon gas, has a high etch selectivity of oxide versus nitride, and is particularly useful in a SAC etch process.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: June 11, 2002
    Assignee: Cypress Semiconductor Corp.
    Inventors: Chan-Lon Yang, Dan Arnzen, Jim Nulty