Patents by Inventor Dan Barnard

Dan Barnard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11933767
    Abstract: The present disclosure provides methods and systems for the characterization of a potential microtexture region (MTR) of a sample, component, or the like. The methods may include determining a threshold width of spatial correlation coefficient and/or a threshold spatial correlation coefficient slope for an actual MTR, characterizing a potential MTR as an actual MTR or a defect, characterizing an actual MTR as an acceptable MTR or not, and/or characterizing various components with potential MTRs as defective or not. The characterization may include calculating a width of spatial correlation coefficient and/or a spatial correlation coefficient slope of the potential MTR and comparing the width of spatial correlation coefficient to a threshold width of spatial correlation coefficient and/or comparing the spatial correlation coefficient slope to a threshold spatial correlation coefficient slope for the potential MTR to be characterized as an actual MTR or a defect (crack).
    Type: Grant
    Filed: September 2, 2022
    Date of Patent: March 19, 2024
    Assignees: RTX CORPORATION, IOWA STATE UNIVERSITY RESEARCH FOUNDATION, INC.
    Inventors: Yong Tian, Ronald Roberts, Dan Barnard
  • Publication number: 20230003694
    Abstract: The present disclosure provides methods and systems for the characterization of a potential microtexture region (MTR) of a sample, component, or the like. The methods may include determining a threshold width of spatial correlation coefficient and/or a threshold spatial correlation coefficient slope for an actual MTR, characterizing a potential MTR as an actual MTR or a defect, characterizing an actual MTR as an acceptable MTR or not, and/or characterizing various components with potential MTRs as defective or not. The characterization may include calculating a width of spatial correlation coefficient and/or a spatial correlation coefficient slope of the potential MTR and comparing the width of spatial correlation coefficient to a threshold width of spatial correlation coefficient and/or comparing the spatial correlation coefficient slope to a threshold spatial correlation coefficient slope for the potential MTR to be characterized as an actual MTR or a defect (crack).
    Type: Application
    Filed: September 2, 2022
    Publication date: January 5, 2023
    Applicant: RAYTHEON TECHNOLOGIES CORPORATION
    Inventors: Yong Tian, Ronald Roberts, Dan Barnard
  • Patent number: 11467133
    Abstract: The present disclosure provides methods and systems for the characterization of a potential microtexture region (MTR) of a sample, component, or the like. The methods may include determining a threshold width of spatial correlation coefficient and/or a threshold spatial correlation coefficient slope for an actual MTR, characterizing a potential MTR as an actual MTR or a defect, characterizing an actual MTR as an acceptable MTR or not, and/or characterizing various components with potential MTRs as defective or not. The characterization may include calculating a width of spatial correlation coefficient and/or a spatial correlation coefficient slope of the potential MTR and comparing the width of spatial correlation coefficient to a threshold width of spatial correlation coefficient and/or comparing the spatial correlation coefficient slope to a threshold spatial correlation coefficient slope for the potential MTR to be characterized as an actual MTR or a defect (crack).
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: October 11, 2022
    Assignees: Raytheon Technologies Corporation, Iowa State University Research Foundation, Inc.
    Inventors: Yong Tian, Ronald Roberts, Dan Barnard
  • Publication number: 20210072197
    Abstract: The present disclosure provides methods and systems for the characterization of a potential microtexture region (MTR) of a sample, component, or the like. The methods may include determining a threshold width of spatial correlation coefficient and/or a threshold spatial correlation coefficient slope for an actual MTR, characterizing a potential MTR as an actual MTR or a defect, characterizing an actual MTR as an acceptable MTR or not, and/or characterizing various components with potential MTRs as defective or not. The characterization may include calculating a width of spatial correlation coefficient and/or a spatial correlation coefficient slope of the potential MTR and comparing the width of spatial correlation coefficient to a threshold width of spatial correlation coefficient and/or comparing the spatial correlation coefficient slope to a threshold spatial correlation coefficient slope for the potential MTR to be characterized as an actual MTR or a defect (crack).
    Type: Application
    Filed: March 13, 2020
    Publication date: March 11, 2021
    Applicant: UNITED TECHNOLOGIES CORPORATION
    Inventors: Yong Tian, Ronald Roberts, Dan Barnard