Abstract: A smoking storage device has an elongate housing with a top end and a bottom end. The smoking storage device includes storage for a vape cap. The smoking storage device includes an elongate housing having a top end and a bottom end, the top end having openings into a lighter receiving chamber, a pipe receiving chamber, and a smoking product receiving chamber. A cap chamber is formed in the elongate housing for receiving the vape cap. The cap chamber includes a means for removably engaging the vape cap within the cap receiving chamber.

Abstract: A smoking storage device has an elongate housing with a top end and a bottom end, the top end having openings into a lighter receiving chamber, a pipe receiving chamber, and a smoking product receiving chamber, and wherein the bottom end is closed. The lighter receiving chamber is sized and shaped to receive a lighter, the pipe receiving chamber is adapted to receive and store an elongate smoking pipe, and the smoking product receiving chamber is adapted to receive and store a smoking product. An overcap is pivotally mounted adjacent the top end of the elongate rigid housing pivots between a closed position and an open position.

Abstract: A vape device has a main housing that includes a storage chamber adapted for receiving a quantity of vape product, and a heating chamber having a heating chamber opening for receiving the vape product, and a heater for heating the vape product. An upper slide unit is mounted on a top end of the main housing has a mouthpiece connected to a cooling chamber with a plurality of baffles, that leads to a vape inlet. An ejection mechanism can eject vape product from the storage chamber. The upper slide unit slides between retracted position wherein the ejection mechanism may be used to eject some of the vape product through the storage opening, and a closed position wherein the vape product is pushed through the heating chamber opening and into the heating chamber, where it is heated and vaporized.

Abstract: A game control system is adapted for tracking game statistics such as balls, strikes, and outs, and for operably controlling a scoreboard for displaying this information, and a pitch clock. The system has a device housing that is sized and shaped to be readily hand-held, and which includes an input device for entering game statistics. The device housing contains a transceiver device operably connected with a power source, the transceiver device enabling communication with the scoreboard and the pitch clock. The device housing further includes a pitch clock display that displays the time remaining on the pitch clock, and a pitch clock reset button which enables a reset of the pitch clock display, and also the pitch clock, during the course of the game.

Abstract: A wireless play communication system enables communications between a coach and a player. The system includes a coach communication device mounted in a first carrying device that is adapted to be carried by the coach, and a player communication device mounted in a second carrying device that is adapted to be carried by the player. An input mechanism of the coach communication device enables a coach to input a signal. Actuation of a pitch plus button functions to transmit the signal from the coach communication device to the player communication device, while also updating a pitch tracker which tracks the number of pitches thrown by the player. The pitch count is displayed on a pitch count display.

Abstract: One embodiment of the present invention provides a system that calculates etch proximity-correction during an OPC (Optical Proximity Correction) process. During operation, the system receives a layout for an integrated circuit. Next, the system selects a target point on an edge in the layout. The system then creates a list of edges within an ambit of the target point. Next, the system removes edges from the list that are not visible from the target point. The system then computes a line integral of a statistical function over the remaining edges in the list, wherein the line integral of the statistical function models the etch proximity effects correlated with positions of the edges visible from the target point. Next, the calculated etch proximity-correction is applied to an area in proximity to the target point.

Abstract: One embodiment of the present invention provides a system that calculates etch proximity-correction during an OPC (Optical Proximity Correction) process. During operation, the system receives a layout for an integrated circuit. Next, the system selects a target point on an edge in the layout. The system then casts a plurality of rays from the target point, and constructs a plurality of pie-wedges based on the cast rays. The system then computes a surface integral of a statistical function over the pie-wedges, wherein the surface integral of the statistical function models the etch bias at the target point. Next, the calculated etch proximity-correction is applied to an area in proximity to the target point.

Abstract: One embodiment of the present invention provides a system that calculates etch proximity-correction during an OPC (Optical Proximity Correction) process. During operation, the system receives a layout for an integrated circuit. Next, the system selects a target point on an edge in the layout. The system then casts a plurality of rays from the target point, and constructs a plurality of pie-wedges based on the cast rays. The system then computes a surface integral of a statistical function over the pie-wedges, wherein the surface integral of the statistical function models the etch bias at the target point. Next, the calculated etch proximity-correction is applied to an area in proximity to the target point.

Abstract: One embodiment of the present invention provides a system that calculates etch proximity-correction during an OPC (Optical Proximity Correction) process. During operation, the system receives a layout for an integrated circuit. Next, the system selects a target point on an edge in the layout. The system then creates a list of edges within an ambit of the target point. Next, the system removes edges from the list that are not visible from the target point. The system then computes a line integral of a statistical function over the remaining edges in the list, wherein the line integral of the statistical function models the etch proximity effects correlated with positions of the edges visible from the target point. Next, the calculated etch proximity-correction is applied to an area in proximity to the target point.