Abstract: A DC source 10 connected to an electrode 5 is disposed in a coating chamber which can be evacuated. The electrode is electrically connected to a target 3 which is sputtered and the sputtered particles are deposited on the substrate, while a process gas is introduced in the coating chamber 15, 15a. The target is made of an aluminum-silicon alloy which may contain 0.5 to 2.0 percent silicon and 99.5 to 98.0 percent aluminum in order to improve the adhesive strength and the service life of the layer 2. The substrate may be made of polycarbonate.

Abstract: Apparatus for the coating of substrates in a vacuum chamber is disclosed wherein a rotatable substrate holder bears a plurality of substrate receivers adapted to transport a like number of substrates (26, 26', etc.) step-wise on a circular path from one of two lock stations (8, 9) through an associated coating station (10, 11) and back to the same respective lock station.Each lock station has one transfer device comprising a rotating substrate plate bearing substrate receivers (85, 85', etc. and 86, 86', respectively). Each plate cooperates with four magazines (18, 18', etc. and 19, 19', etc., respectively). Each magazine is equipped with at least two stacks (25, 25', etc., and 27, 27', etc., respectively) of substrates (26, 26', etc.). A rotating device (28, 28', etc. and 29, 29', etc., respectively) cooperates with each of the magazines (18, 18', etc. and 19, 19', etc., respectively) and transports the substrates (26, 26', etc.) between the magazines (18, 18', etc. and 19, 19', etc.