Patents by Inventor Dan Doron

Dan Doron has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Diamond conditioning of soft chemical mechanical planarization/polishing (CMP) polishing pads
    Publication number: 20060183410
    Abstract: Conditioning of chemical mechanical planarization (CMP) using conventional diamond-embedded abrasive strips are well suited to condition conventional “hard” polishing but not soft polishing pads because the diamonds not only remove waste material, but they also damage the polishing surface of the pad. Embodiments of the present invention condition soft polishing pads using diamond strips without damaging the soft polishing pad.
    Type: Application
    Filed: April 12, 2006
    Publication date: August 17, 2006
    Inventors: Barak Yardeni, Boaz Eldad, Philip Slutsky, Dan Doron
  • Diamond conditioning of soft chemical mechanical planarization/polishing (CMP) polishing pads
    Publication number: 20040192178
    Abstract: Conditioning of chemical mechanical planarization (CMP) using conventional diamond-embedded abrasive strips are well suited to condition conventional “hard” polishing but not soft polishing pads because the diamonds not only remove waste material, but they also damage the polishing surface of the pad. Embodiments of the present invention condition soft polishing pads using diamond strips without damaging the soft polishing pad.
    Type: Application
    Filed: March 28, 2003
    Publication date: September 30, 2004
    Inventors: Barak Yardeni, Boaz Eldad, Philip Slutsky, Dan Doron