Patents by Inventor Dan Enloe

Dan Enloe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrostatic pellicle system for a mask
    Patent number: 6921613
    Abstract: The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer. The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.
    Type: Grant
    Filed: March 22, 2004
    Date of Patent: July 26, 2005
    Assignee: Intel Corporation
    Inventor: Dan Enloe
  • Method of keeping contaminants away from a mask with electrostatic forces
    Patent number: 6803159
    Abstract: The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer. The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: October 12, 2004
    Assignee: Intel Corporation
    Inventor: Dan Enloe
  • Electrostatic pellicle system for a mask
    Publication number: 20040180271
    Abstract: The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer.
    Type: Application
    Filed: March 22, 2004
    Publication date: September 16, 2004
    Inventor: Dan Enloe
  • Electrostatic pellicle system for a mask
    Publication number: 20030186131
    Abstract: The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 2, 2003
    Inventor: Dan Enloe