Abstract: Integrated circuit (IC) devices having gate-all-around (GAA) transistors. An IC device may include adjacent GAA transistors with gate electrodes having different gate dielectric stacks separated by a dielectric wall. The gate dielectric stacks may include inner gate dielectric layers on nanoribbon channels and outer gate dielectric layers on the inner gate dielectric layers. The inner gate dielectric layers of the adjacent transistors may have different thicknesses or material compositions. The outer gate dielectric layers of the adjacent transistors may have different thicknesses or material compositions. The dielectric wall between gate electrodes and gate dielectric stacks may enable independent processing of the transistors gates by dividing the nanoribbon channels into separate gate tubs.

Abstract: Integrated circuit (IC) devices having gate-all-around transistors. An IC device may include a dielectric wall separating first and second source or drain bodies in first and second transistors, and the transistors may have first and second stacks of nanoribbons at different (e.g., offset) heights and coupled with the first and second source or drain bodies. The nanoribbons in the first and second nanoribbon stacks may have different thicknesses. The dielectric wall may enable independent processing of the first and second nanoribbon stacks.

Abstract: Integrated circuit (IC) devices having shared, dual-metal gates for complementary transistors. An IC device includes a shared gate structure over first and second stacks of nanoribbons with complementary conductivities and a substrate, and the gate structure includes first, second, and third gate metals with the first gate metal over and around the nanoribbons in the first stack, the second gate metal over and around the nanoribbons in the second stack, and the third gate metal around and between the nanoribbons in the first stack, between the first and second stacks, in contact with both the first and second gate metals, and extending beyond the first metal over the substrate. The first gate metal may act as a temple for selective deposition of the third gate metal. The second gate metal may be conformally deposited over the nanoribbons in the second stack and on the third gate metal.

Abstract: Integrated circuit (IC) devices having shared, dual-metal gates for complementary transistors. An IC device includes a shared gate structure over first and second stacks of nanoribbons with complementary conductivities and a substrate, and the gate structure includes first, second, and third gate metals with the first gate metal over and around the nanoribbons in the first stack, the second gate metal over and around the nanoribbons in the second stack, and the third gate metal around and between the nanoribbons in the first stack, between the first and second stacks, in contact with both the first and second gate metals, and extending beyond the first metal over the substrate. The first gate metal may act as a temple for selective deposition of the third gate metal. The second gate metal may be conformally deposited over the nanoribbons in the second stack and on the third gate metal.

Abstract: An integrated circuit (IC) device includes n- and p-type transistors with and without threshold voltage shifts using a common dopant material in a gate dielectric. The IC device includes at least four threshold voltage for each of n- and p-type transistors. Besides volumeless doping of gate dielectrics, work function metals are used in both n- and p-type transistors. A single dipole dopant may be concurrently introduced into and through similar gate dielectrics in both n- and p-type transistors to achieve consistent threshold voltage shifts with minimal process variation.

Abstract: Transistor structures comprising a gate electrode, or “gate,” that is self-aligned to underlying channel material. A mask material employed for patterning the channel material is further employed to define a cap of mask material having a larger width that protects a portion of gate material during a gate etch. The cap is therefore self-aligned to the channel material so that an amount by which a gate material extends laterally beyond the channel material is ensured to be symmetrical about a centerline of the channel material.

Abstract: Integrated circuit (IC) static random-access memory (SRAM) comprising pass-gate transistors and pull-down transistors having different threshold voltages (Vt). A pass-gate transistor with a higher Vt than the pull-down transistor, may reduce read instability of a bit-cell, and/or reduce overhead associated with read assist circuitry coupled to the bit-cell. In some examples, a different amount of a dipole dopant source material is deposited as part of the gate insulator for the pull-down transistor than for the pass-gate transistor, reducing the Vt of the pull-down transistor accordingly. In some examples, an N-dipole dopant source material is removed from the pass-gate transistor prior to a drive/activation anneal is performed. After drive/activation, the N-dipole dopant source material may be removed from the pull-down transistor and a same gate metal deposited over both the pass-gate and pull-down transistors.