Patents by Inventor Dan Prager

Dan Prager has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical metrology model optimization for process control
    Publication number: 20070225851
    Abstract: To evaluate the adequacy of a profile model, an initial profile model is selected. The profile model includes profile model parameters to be measured in implementing types of process control to be used in controlling a fabrication process. A measurement of profile model parameters is obtained using a first metrology tool and the profile model. A measurement of the profile model parameters is obtained using a second metrology tool and the profile model. Statistical metric criteria are calculated based on the measurements of the profile model parameters obtained using the first and second metrology tools. When the calculated statistical metric criteria are not within matching requirements, the profile model is revised. When the calculated statistical metric criteria are within matching requirements, the profile model or the revised profile model is stored.
    Type: Application
    Filed: May 21, 2007
    Publication date: September 27, 2007
    Applicant: Timbre Technologies, Inc.
    Inventors: Dan Prager, Jason Ferns, Lawrence Lane, Dan Engelhard
  • Optical metrology model optimization for process control
    Patent number: 7221989
    Abstract: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.
    Type: Grant
    Filed: June 20, 2006
    Date of Patent: May 22, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Dan Prager, Jason Ferns, Lawrence Lane, Dan Engelhard
  • Optical metrology model optimization for process control
    Publication number: 20060247816
    Abstract: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.
    Type: Application
    Filed: June 20, 2006
    Publication date: November 2, 2006
    Applicant: Tokyo Electron Limited
    Inventors: Dan Prager, Jason Ferns, Lawrence Lane, Dan Engelhard
  • Optical metrology model optimization for process control
    Patent number: 7065423
    Abstract: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: June 20, 2006
    Assignee: Timbre Technologies, Inc.
    Inventors: Dan Prager, Jason Ferns, Lawrence Lane, Dan Engelhard
  • Optical metrology model optimization for process control
    Publication number: 20060009872
    Abstract: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.
    Type: Application
    Filed: July 8, 2004
    Publication date: January 12, 2006
    Applicant: Timbre Technologies, Inc.
    Inventors: Dan Prager, Jason Ferns, Lawrence Lane, Dan Engelhard