Patents by Inventor Dana Durham

Dana Durham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound
    Patent number: 5399456
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
    Type: Grant
    Filed: November 19, 1992
    Date of Patent: March 21, 1995
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
    Patent number: 5256522
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.
    Type: Grant
    Filed: December 30, 1991
    Date of Patent: October 26, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
    Patent number: 5217840
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
    Type: Grant
    Filed: May 25, 1990
    Date of Patent: June 8, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate
    Patent number: 5039594
    Abstract: The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a solvent mixture comprising propylene glycol alkyl ether and propylene glycol alkyl ether acetate, onto a substrate, drying, exposing to imaging energy and developing.
    Type: Grant
    Filed: June 6, 1990
    Date of Patent: August 13, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham
  • Method of producing an image reversal negative photoresist having a photo-labile blocked imide
    Patent number: 5019488
    Abstract: A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.
    Type: Grant
    Filed: April 24, 1990
    Date of Patent: May 28, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Donald C. Mammato, Sangya Jain, Dana Durham, Mark A. Spak, Douglas A. Usifer, Michael McFarland
  • Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
    Patent number: 4983490
    Abstract: The invention provides a mixture suitable for treating a photographic composition which comprises from about 1 to about 10 parts by weight of a propylene glycol alkyl ether and from about 1 to about 10 parts by weight of a propylene glycol alkyl ether acetate.
    Type: Grant
    Filed: May 15, 1989
    Date of Patent: January 8, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham
  • Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
    Patent number: 4948697
    Abstract: The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a solvent mixture comprising propylene glycol alkyl ether and propylene glycol alkyl ether acetate, onto a substrate, drying, exposing to imaging energy and developing.
    Type: Grant
    Filed: July 5, 1989
    Date of Patent: August 14, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham
  • Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
    Patent number: 4931381
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
    Type: Grant
    Filed: November 8, 1988
    Date of Patent: June 5, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
    Patent number: 4929536
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.
    Type: Grant
    Filed: November 8, 1988
    Date of Patent: May 29, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
    Patent number: 4806458
    Abstract: The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.
    Type: Grant
    Filed: August 27, 1987
    Date of Patent: February 21, 1989
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham
  • Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
    Patent number: 4692398
    Abstract: The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.
    Type: Grant
    Filed: October 28, 1985
    Date of Patent: September 8, 1987
    Assignee: American Hoechst Corporation
    Inventor: Dana Durham
  • Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist
    Patent number: 4588670
    Abstract: A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.
    Type: Grant
    Filed: February 28, 1985
    Date of Patent: May 13, 1986
    Assignee: American Hoechst Corporation
    Inventors: Michael Kelly, Donald C. Mammato, Dana Durham, Sangya Jain, Lawrence Crane