Patents by Inventor Dana Truong

Dana Truong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8859196
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: October 14, 2014
    Assignee: Affymetrix, Inc.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Richard P. Rava, Martin J. Goldberg
  • Patent number: 8114584
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: February 14, 2012
    Assignee: Affymetrix, Inc.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Rich P. Rava, Martin J. Goldberg
  • Publication number: 20120035083
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: October 18, 2011
    Publication date: February 9, 2012
    Applicant: AFFYMETRIX, INC.
    Inventors: Mark O. Trulson, Martin J. Goldberg, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Richard P. Rava, Dana Truong
  • Publication number: 20110003716
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: July 8, 2010
    Publication date: January 6, 2011
    Applicant: Affymetrix, INC.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Richard P. Rava, Martin J. Goldberg
  • Patent number: 7790389
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Grant
    Filed: January 16, 2008
    Date of Patent: September 7, 2010
    Assignee: Affymetrix, Inc.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Richard P. Rava, Martin J. Goldberg
  • Publication number: 20080119371
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: January 16, 2008
    Publication date: May 22, 2008
    Applicant: Affymetrix, Inc.
    Inventors: Mark TRULSON, Glenn McGall, Bei-Shen Sywe, Lisa Kajisa, Dana Truong
  • Publication number: 20050280826
    Abstract: The present invention provides methods to inspect biomolecules on a solid support using a reflectance measuring tool. In one embodiment of the invention, in-process methods are provided that analyzes wafers after specific steps of the microarray manufacturing process. In another embodiment, probe defects from handling or particulates during manufacturing of microarrays are detected by analyzing wafers and chips.
    Type: Application
    Filed: June 1, 2005
    Publication date: December 22, 2005
    Applicant: Affymetrix, INC.
    Inventors: Lisa Kajisa, Dana Truong
  • Publication number: 20030235824
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: June 20, 2002
    Publication date: December 25, 2003
    Applicant: Affymetrix, INC.
    Inventors: Mark Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong