Abstract: The present application discloses a button battery. The button battery includes a case, a positive electrode powder piece, and a current collector. The case includes a positive electrode case and a negative electrode case interconnected. The positive electrode case and the negative electrode case are connected to define a cavity. The positive electrode powder piece is disposed in the cavity. The current collector is disposed in the cavity, the current collector and the positive electrode powder piece are stacked, and at least a part of the current collector is embedded into the positive electrode powder piece. A side of current collector away from the positive electrode powder piece is contacted with a bottom of the positive electrode case.

Abstract: Provided are a lithium primary button cell, a preparation method thereof, and an electronic device. The lithium primary button cell includes a cell housing (10) and a cell core assembly located within the cell housing (10). The cell core assembly includes a negative electrode (3), a negative electrode modification film (4), separators (5, 6), and a positive electrode (7) that are stacked sequentially. The surface of one side of the negative electrode (3) facing the negative electrode modification film (4) is formed with a concave groove (9) into which the negative electrode modification film (4) is tightly embedded. In the present application, the structure and materials of the lithium primary button cell are optimized so that the lithium primary button cell can have excellent discharging performance and good stability and reliability.

Abstract: A method for fast precise optical calibration on a photolithography system, including: determining a fitting relationship for a spot width corresponding to a point light source based on distribution of field strength generated by the point light source at an exit plane of a focusing element; determining, based on the fitting relationship, a first correspondence between the spot width and a parameter for exposing a photoresist, where the spot width in the first correspondence is for optical microscopy; determining a first spot-width dataset for the point light source based on an optical microscopic image of a spot-mapping pattern on a surface of the photoresist; determining, based on the first spot-width dataset, a second correspondence between the spot width and the parameter; and determining the first correspondence as a means for determining the parameter, when the first correspondence and the second correspondence meet a preset condition.

Abstract: An analytical method and an analytical apparatus for quantitatively calculating line edge roughness of plasmon super diffraction photolithography. The method includes: determining a theoretical point spread function of a light source based on field intensity distribution of the light source at an exit plane of a focusing element of the plasmon super diffraction photolithography; determining multiple transverse widths of spots in a spot-mapping pattern based on the spot-mapping pattern; determining actual point spread functions corresponding to the multiple transverse widths, based on the theoretical point spread function and the multiple transverse widths; and establishing an analytical equation of line edge roughness of the plasmon super diffraction photolithography based on the variation due to line edge roughness, an exposure dose of each line pattern, the near-field photoresist contrast, and the logarithmic slope of each line pattern.

Abstract: A method for fast precise optical calibration on a photolithography system, including: determining a fitting relationship for a spot width corresponding to a point light source based on distribution of field strength generated by the point light source at an exit plane of a focusing element; determining, based on the fitting relationship, a first correspondence between the spot width and a parameter for exposing a photoresist, where the spot width in the first correspondence is for optical microscopy; determining a first spot-width dataset for the point light source based on an optical microscopic image of a spot-mapping pattern on a surface of the photoresist; determining, based on the first spot-width dataset, a second correspondence between the spot width and the parameter; and determining the first correspondence as a means for determining the parameter, when the first correspondence and the second correspondence meet a preset condition.