Patents by Inventor Dandan Shi

Dandan Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11979121
    Abstract: A sense amplifier circuit includes: a charge module configured to charge a set signal node and a reset signal node according to a clock signal; and a sense module configured to sense and amplify a differential input signal according to the clock signal; where, the sense module includes a first amplification circuit, a second amplification circuit, and a cross hopping transfer circuit cross-connected between the first amplification circuit and the second amplification circuit. The cross hopping transfer circuit is configured to transfer a valid signal of a newly started amplification circuit to another amplification circuit if sensing is completed and the differential input signal hops, such that a set signal/reset signal remains unchanged. A flip-flop includes the sense amplifier circuit.
    Type: Grant
    Filed: January 10, 2023
    Date of Patent: May 7, 2024
    Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.
    Inventors: Dandan Shi, Qifan Gong
  • Patent number: 11957752
    Abstract: The present invention relates to the technical field of photosensitizers, and particularly to a near-infrared nano-photosensitizer and a preparation method and use thereof. The near-infrared nano-photosensitizer in the present invention is modified by conjugation extension of the boron dipyrromethene core, achieving absorption and emission spectra close to the near-infrared region. A polyfluoroalkyl group and a polyethylene glycol group are introduced to the boron dipyrromethene structure to obtain an amphiphilic photosensitizer. By means of the strong fluorine-fluorine interaction between the polyfluoroalkyl group and the hydrophilic interaction of the polyethylene glycol group, a nano-photosensitive micelle with an ultra-low CMC value is ultimately constructed. Boron dipyrromethene is induced by fluorine-fluorine interaction to undergo J-aggregation, causing the maximum absorption peak to red-shift to the near-infrared region, beneficial to the deep phototherapy of tumors.
    Type: Grant
    Filed: January 25, 2022
    Date of Patent: April 16, 2024
    Assignee: SOOCHOW UNIVERSITY
    Inventors: Zhengqing Guo, Hui He, Mengke Shi, Han Xu, Dandan Ji, Yangyang Huang, Qiujin He
  • Publication number: 20240014789
    Abstract: The present disclosure provides a sense amplifier circuit and a flip-flop. The sense amplifier circuit includes: a charge module configured to charge a set signal node and a reset signal node according to a clock signal; and a sense module configured to sense and amplify a differential input signal according to the clock signal; where, the sense module includes a first amplification circuit, a second amplification circuit, and a cross hopping transfer circuit cross-connected between the first amplification circuit and the second amplification circuit. The cross hopping transfer circuit is configured to transfer a valid signal of a newly started amplification circuit to another amplification circuit if sensing is completed and the differential input signal hops, such that a set signal/reset signal remains unchanged.
    Type: Application
    Filed: January 10, 2023
    Publication date: January 11, 2024
    Inventors: Dandan SHI, Qifan Gong
  • Patent number: 11081408
    Abstract: Aspects of the disclosure provide a method for wafer warpage control. The method includes forming a filling structure in a slit opening on a wafer. Further, the method includes measuring a warpage parameter of the wafer, and determining a thermal profile to adjust a warpage parameter into a target range based on the warpage parameter. Then, the method includes performing a process having the determined thermal profile to adjust the warpage parameter into the target range.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: August 3, 2021
    Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
    Inventors: Dandan Shi, Ming Hu, Shijin Luo, Zhiliang Xia, Zhi Zhang
  • Publication number: 20210111079
    Abstract: Aspects of the disclosure provide a method for wafer warpage control. The method includes forming a filling structure in a slit opening on a wafer. Further, the method includes measuring a warpage parameter of the wafer, and determining a thermal profile to adjust a warpage parameter into a target range based on the warpage parameter. Then, the method includes performing a process having the determined thermal profile to adjust the warpage parameter into the target range.
    Type: Application
    Filed: January 8, 2020
    Publication date: April 15, 2021
    Applicant: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
    Inventors: Dandan Shi, Ming Hu, Shijin Luo, Zhiliang Xia, Zhi Zhang