Patents by Inventor Danela WHITE

Danela WHITE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post chemical mechanical polishing formulations and method of use
    Patent number: 10351809
    Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
    Type: Grant
    Filed: January 5, 2016
    Date of Patent: July 16, 2019
    Assignee: Entegris, Inc.
    Inventors: Elizabeth Thomas, Donald Frye, Jun Liu, Michael White, Danela White, Chao-Yu Wang
  • POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE
    Publication number: 20180037852
    Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
    Type: Application
    Filed: January 5, 2016
    Publication date: February 8, 2018
    Inventors: Elizabeth THOMAS, Donald FRYE, Jun LIU, Michael WHITE, Danela WHITE, Chao-Yu WANG