Patents by Inventor Daniel Abraham Elizarrarás Maya

Daniel Abraham Elizarrarás Maya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230094374
    Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.
    Type: Application
    Filed: November 15, 2022
    Publication date: March 30, 2023
    Applicant: Dynasol Elastómeros, S.A. de C.V.
    Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
  • Patent number: 11542355
    Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.
    Type: Grant
    Filed: January 13, 2021
    Date of Patent: January 3, 2023
    Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
  • Publication number: 20210371642
    Abstract: Dual composition block copolymers made from conjugated diene and monovinyl aromatic monomers in batch organolithium initiated polymerization show advantageous performance in the production of crosslinked microcellular rubber compounds and pressure sensitive hot melt adhesives. The dual composition block copolymers are partially coupled with a coupling agent linking inner monovinyl aromatic blocks. Their un-coupled low molecular weight fraction has greater monovinyl aromatic repeating unit content than their coupled high molecular weight fraction. Crosslinked microcellular rubber articles made from the dual composition block copolymers exhibit lower density, smaller and more homogeneous cell size, higher softness and higher resiliency than prior art block copolymers. Rubber compounding of formulations comprising the dual composition block copolymers proceed at slightly lower torque and slightly lower temperature than with prior art block copolymers.
    Type: Application
    Filed: December 10, 2019
    Publication date: December 2, 2021
    Applicant: Dynasol Elastómeros, S.A. de C.V.
    Inventors: Daniel Abraham Elizarrarás Maya, Abel Zúñiga Calles, Gabriel Hernández Zamora, José Luis García Vidales, Jesús Eduardo Ibarra Rodríguez
  • Publication number: 20210171696
    Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.
    Type: Application
    Filed: January 13, 2021
    Publication date: June 10, 2021
    Applicant: Dynasol Elastómeros, S.A. de C.V.
    Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
  • Patent number: 10899864
    Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: January 26, 2021
    Assignee: Dynasol Elastómeros, S.A. de C.V.
    Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
  • Publication number: 20200199334
    Abstract: Dual composition block copolymers made from conjugated diene and monovinyl aromatic monomers in batch organolithium initiated polymerization show advantageous performance in the production of crosslinked microcellular rubber compounds and pressure sensitive hot melt adhesives. The block copolymers are partially coupled molecules with a coupling agent linking inner monovinyl aromatic blocks. An un-coupled low molecular weight fraction has greater monovinyl aromatic repeat unit content than a coupled high molecular weight fraction. Crosslinked microcellular rubber articles made from the block copolymers exhibit lower density, smaller and more homogeneous cell size, higher softness and higher resiliency than prior art block copolymers. Rubber compounding of formulations comprising the block copolymers proceed at slightly lower torque and slightly lower temperature than with prior art block copolymers.
    Type: Application
    Filed: October 8, 2019
    Publication date: June 25, 2020
    Applicant: Dynasol Elastómeros, S.A. de C.V.
    Inventors: Daniel Abraham Elizarrarás Maya, Abel Zúñiga Calles, Gabriel Hernández Zamora, José Luis García Vidales, Jesús Eduardo Ibarra Rodríguez
  • Publication number: 20200048393
    Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.
    Type: Application
    Filed: September 8, 2017
    Publication date: February 13, 2020
    Applicant: Dynasol Elastómeros, S.A. de C.V.
    Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama