Patents by Inventor Daniel Abraham Elizarrarás Maya
Daniel Abraham Elizarrarás Maya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230094374Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.Type: ApplicationFiled: November 15, 2022Publication date: March 30, 2023Applicant: Dynasol Elastómeros, S.A. de C.V.Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
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Patent number: 11542355Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.Type: GrantFiled: January 13, 2021Date of Patent: January 3, 2023Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
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Publication number: 20210371642Abstract: Dual composition block copolymers made from conjugated diene and monovinyl aromatic monomers in batch organolithium initiated polymerization show advantageous performance in the production of crosslinked microcellular rubber compounds and pressure sensitive hot melt adhesives. The dual composition block copolymers are partially coupled with a coupling agent linking inner monovinyl aromatic blocks. Their un-coupled low molecular weight fraction has greater monovinyl aromatic repeating unit content than their coupled high molecular weight fraction. Crosslinked microcellular rubber articles made from the dual composition block copolymers exhibit lower density, smaller and more homogeneous cell size, higher softness and higher resiliency than prior art block copolymers. Rubber compounding of formulations comprising the dual composition block copolymers proceed at slightly lower torque and slightly lower temperature than with prior art block copolymers.Type: ApplicationFiled: December 10, 2019Publication date: December 2, 2021Applicant: Dynasol Elastómeros, S.A. de C.V.Inventors: Daniel Abraham Elizarrarás Maya, Abel Zúñiga Calles, Gabriel Hernández Zamora, José Luis García Vidales, Jesús Eduardo Ibarra Rodríguez
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Publication number: 20210171696Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.Type: ApplicationFiled: January 13, 2021Publication date: June 10, 2021Applicant: Dynasol Elastómeros, S.A. de C.V.Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
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Patent number: 10899864Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.Type: GrantFiled: September 8, 2017Date of Patent: January 26, 2021Assignee: Dynasol Elastómeros, S.A. de C.V.Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama
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Publication number: 20200199334Abstract: Dual composition block copolymers made from conjugated diene and monovinyl aromatic monomers in batch organolithium initiated polymerization show advantageous performance in the production of crosslinked microcellular rubber compounds and pressure sensitive hot melt adhesives. The block copolymers are partially coupled molecules with a coupling agent linking inner monovinyl aromatic blocks. An un-coupled low molecular weight fraction has greater monovinyl aromatic repeat unit content than a coupled high molecular weight fraction. Crosslinked microcellular rubber articles made from the block copolymers exhibit lower density, smaller and more homogeneous cell size, higher softness and higher resiliency than prior art block copolymers. Rubber compounding of formulations comprising the block copolymers proceed at slightly lower torque and slightly lower temperature than with prior art block copolymers.Type: ApplicationFiled: October 8, 2019Publication date: June 25, 2020Applicant: Dynasol Elastómeros, S.A. de C.V.Inventors: Daniel Abraham Elizarrarás Maya, Abel Zúñiga Calles, Gabriel Hernández Zamora, José Luis García Vidales, Jesús Eduardo Ibarra Rodríguez
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Publication number: 20200048393Abstract: Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and/or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.Type: ApplicationFiled: September 8, 2017Publication date: February 13, 2020Applicant: Dynasol Elastómeros, S.A. de C.V.Inventors: Daniel Abraham Elizarrarás Maya, Christopher J. Hardiman, Sergio Corona Galván, Sergio Alberto Moctezuma Espiricueto, Luis Antonio Rodríguez Guadarrama